GB815365A - Improvements relating to photoconductive materials and devices - Google Patents
Improvements relating to photoconductive materials and devicesInfo
- Publication number
- GB815365A GB815365A GB26240/55A GB2624055A GB815365A GB 815365 A GB815365 A GB 815365A GB 26240/55 A GB26240/55 A GB 26240/55A GB 2624055 A GB2624055 A GB 2624055A GB 815365 A GB815365 A GB 815365A
- Authority
- GB
- United Kingdom
- Prior art keywords
- firing
- mass
- fired
- minutes
- flux
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- YKYOUMDCQGMQQO-UHFFFAOYSA-L cadmium dichloride Chemical compound Cl[Cd]Cl YKYOUMDCQGMQQO-UHFFFAOYSA-L 0.000 abstract 6
- 229910052980 cadmium sulfide Inorganic materials 0.000 abstract 5
- 238000010304 firing Methods 0.000 abstract 5
- 230000004907 flux Effects 0.000 abstract 4
- NLXLAEXVIDQMFP-UHFFFAOYSA-N Ammonia chloride Chemical compound [NH4+].[Cl-] NLXLAEXVIDQMFP-UHFFFAOYSA-N 0.000 abstract 3
- CJOBVZJTOIVNNF-UHFFFAOYSA-N cadmium sulfide Chemical compound [Cd]=S CJOBVZJTOIVNNF-UHFFFAOYSA-N 0.000 abstract 3
- 239000010949 copper Substances 0.000 abstract 3
- 239000013078 crystal Substances 0.000 abstract 3
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 abstract 2
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 abstract 2
- 239000005864 Sulphur Substances 0.000 abstract 2
- 235000019270 ammonium chloride Nutrition 0.000 abstract 2
- AQCDIIAORKRFCD-UHFFFAOYSA-N cadmium selenide Chemical compound [Cd]=[Se] AQCDIIAORKRFCD-UHFFFAOYSA-N 0.000 abstract 2
- 239000000203 mixture Substances 0.000 abstract 2
- 239000000843 powder Substances 0.000 abstract 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 abstract 2
- BKQMNPVDJIHLPD-UHFFFAOYSA-N OS(=O)(=O)[Se]S(O)(=O)=O Chemical compound OS(=O)(=O)[Se]S(O)(=O)=O BKQMNPVDJIHLPD-UHFFFAOYSA-N 0.000 abstract 1
- 239000004020 conductor Substances 0.000 abstract 1
- 238000001816 cooling Methods 0.000 abstract 1
- 229910052802 copper Inorganic materials 0.000 abstract 1
- ORTQZVOHEJQUHG-UHFFFAOYSA-L copper(II) chloride Chemical compound Cl[Cu]Cl ORTQZVOHEJQUHG-UHFFFAOYSA-L 0.000 abstract 1
- 150000004820 halides Chemical class 0.000 abstract 1
- 229910052742 iron Inorganic materials 0.000 abstract 1
- 238000002844 melting Methods 0.000 abstract 1
- 230000008018 melting Effects 0.000 abstract 1
- 238000002156 mixing Methods 0.000 abstract 1
- 238000005245 sintering Methods 0.000 abstract 1
- 238000005406 washing Methods 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
- G03G5/00—Recording members for original recording by exposure, e.g. to light, to heat, to electrons; Manufacture thereof; Selection of materials therefor
- G03G5/02—Charge-receiving layers
- G03G5/04—Photoconductive layers; Charge-generation layers or charge-transporting layers; Additives therefor; Binders therefor
- G03G5/08—Photoconductive layers; Charge-generation layers or charge-transporting layers; Additives therefor; Binders therefor characterised by the photoconductive material being inorganic
- G03G5/087—Photoconductive layers; Charge-generation layers or charge-transporting layers; Additives therefor; Binders therefor characterised by the photoconductive material being inorganic and being incorporated in an organic bonding material
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/34—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies not provided for in groups H01L21/0405, H01L21/0445, H01L21/06, H01L21/16 and H01L21/18 with or without impurities, e.g. doping materials
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/34—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies not provided for in groups H01L21/0405, H01L21/0445, H01L21/06, H01L21/16 and H01L21/18 with or without impurities, e.g. doping materials
- H01L21/46—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/428
- H01L21/479—Application of electric currents or fields, e.g. for electroforming
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/02—Semiconductor bodies ; Multistep manufacturing processes therefor
- H01L29/12—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by the materials of which they are formed
- H01L29/22—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by the materials of which they are formed including, apart from doping materials or other impurities, only AIIBVI compounds
- H01L29/227—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by the materials of which they are formed including, apart from doping materials or other impurities, only AIIBVI compounds further characterised by the doping material
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/08—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof in which radiation controls flow of current through the device, e.g. photoresistors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/18—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- General Physics & Mathematics (AREA)
- Physics & Mathematics (AREA)
- Power Engineering (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Computer Hardware Design (AREA)
- Manufacturing & Machinery (AREA)
- Electromagnetism (AREA)
- Chemical & Material Sciences (AREA)
- Inorganic Chemistry (AREA)
- Ceramic Engineering (AREA)
- Inorganic Compounds Of Heavy Metals (AREA)
- Photoreceptors In Electrophotography (AREA)
Abstract
A photo-conductive material for use in photoelectric cells (see Group XXXVI) is made by mixing cadmium sulphide, selenide or sulphoselenide with a flux, firing above the melting point of the flux and washing out the crystals from the resulting product, firing the washed crystals to sinter them into a mass, breaking up the mass into powder without grinding and finally firing the powder in a third firing below the sintering temperature at least part of which is carried out under atmospheric pressure in the presence of sulphur. In a specific example 100 grams of cadmium sulphide or selenide or a mixture of the two is mixed with 10 grams of cadmium chloride, 1 gram of ammonium chloride 0.7 ml. of 0.1 mol. copper chloride and 25 ml. water and the mixture dried at 150 DEG C. for 15 hours, broken up and fired at 600 DEG C. for 20 minutes. The fired mass, consisting of CdS crystals impregnated with Cu and Cl is soaked and washed in water to remove most of the CdCl2, then moistened with a solution containing equal parts of 0.1 mol. CdCl2 and 1 mol. NH4Cl and passed through a 325-mesh sieve. It is then fired at 600 DEG C. for 20 minutes and the sintered mass resulting is grated through a 50-mesh sieve, and is fired in the presence of sulphur vapour for 10 minutes at 500 DEG C. and for a further 10 minutes in vacuo. After cooling it is passed through a 325-mesh sieve. Ag or another monovalent iron may replace Cu. In a further embodiment cadmium sulphide is crystallized from a mass comprising 10 per cent by weight of a molten flux containing a halide and the flux leached out. Cu is added and diffused into the CdS in a second firing.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US541623XA | 1954-09-27 | 1954-09-27 | |
US472354A US2876202A (en) | 1954-12-01 | 1954-12-01 | Photoconducting powders and method of preparation |
Publications (1)
Publication Number | Publication Date |
---|---|
GB815365A true GB815365A (en) | 1959-06-24 |
Family
ID=45868996
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB26240/55A Expired GB815365A (en) | 1954-09-27 | 1955-09-13 | Improvements relating to photoconductive materials and devices |
Country Status (4)
Country | Link |
---|---|
JP (1) | JPS324768B1 (en) |
BE (1) | BE541623A (en) |
DE (1) | DE1043536B (en) |
GB (1) | GB815365A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB2183089A (en) * | 1985-09-25 | 1987-05-28 | Sharp Kk | Process for producing photoelectric conversion film |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE874181C (en) * | 1940-04-27 | 1953-04-20 | Patra Patent Treuhand | Process for the production of a photoelectrically active compound |
DE861450C (en) * | 1940-05-17 | 1953-01-05 | Patra Patent Treuhand | Photoelectric resistance cell |
DE861295C (en) * | 1940-06-08 | 1952-12-29 | Patra Patent Treuhand | Process for applying photoelectric, small-crystalline materials for the production of photoelectrically sensitive resistors |
DE903971C (en) * | 1941-01-15 | 1954-02-11 | Telefunken Gmbh | Photoresistors, for example for remote image transmission by means of secondary emission from photoresistors and processes for their production |
DE870300C (en) * | 1942-10-11 | 1953-03-12 | Patra Patent Treuhand | Process for the production of highly sensitive photoresistors |
-
1955
- 1955-09-13 GB GB26240/55A patent/GB815365A/en not_active Expired
- 1955-09-26 DE DER17490A patent/DE1043536B/en active Pending
- 1955-09-27 BE BE541623A patent/BE541623A/en unknown
- 1955-09-27 JP JP2566155A patent/JPS324768B1/ja active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB2183089A (en) * | 1985-09-25 | 1987-05-28 | Sharp Kk | Process for producing photoelectric conversion film |
Also Published As
Publication number | Publication date |
---|---|
BE541623A (en) | 1959-08-28 |
JPS324768B1 (en) | 1957-07-10 |
DE1043536B (en) | 1958-11-13 |
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