GB689123A - Production of finely divided titanium dioxide - Google Patents
Production of finely divided titanium dioxideInfo
- Publication number
- GB689123A GB689123A GB24467/50A GB2446750A GB689123A GB 689123 A GB689123 A GB 689123A GB 24467/50 A GB24467/50 A GB 24467/50A GB 2446750 A GB2446750 A GB 2446750A GB 689123 A GB689123 A GB 689123A
- Authority
- GB
- United Kingdom
- Prior art keywords
- aluminium
- titanium chloride
- alumina
- silicon
- decomposition
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 title abstract 3
- 239000004408 titanium dioxide Substances 0.000 title 1
- XJDNKRIXUMDJCW-UHFFFAOYSA-J titanium tetrachloride Chemical compound Cl[Ti](Cl)(Cl)Cl XJDNKRIXUMDJCW-UHFFFAOYSA-J 0.000 abstract 5
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 abstract 4
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 abstract 4
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 abstract 3
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 abstract 3
- 229910052801 chlorine Inorganic materials 0.000 abstract 3
- 239000000460 chlorine Substances 0.000 abstract 3
- 238000000354 decomposition reaction Methods 0.000 abstract 3
- 239000007789 gas Substances 0.000 abstract 3
- 239000001301 oxygen Substances 0.000 abstract 3
- 229910052760 oxygen Inorganic materials 0.000 abstract 3
- 150000003377 silicon compounds Chemical class 0.000 abstract 3
- UGFAIRIUMAVXCW-UHFFFAOYSA-N Carbon monoxide Chemical compound [O+]#[C-] UGFAIRIUMAVXCW-UHFFFAOYSA-N 0.000 abstract 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 abstract 2
- 239000004411 aluminium Substances 0.000 abstract 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 abstract 2
- 229910052782 aluminium Inorganic materials 0.000 abstract 2
- 150000001399 aluminium compounds Chemical class 0.000 abstract 2
- VSCWAEJMTAWNJL-UHFFFAOYSA-K aluminium trichloride Chemical compound Cl[Al](Cl)Cl VSCWAEJMTAWNJL-UHFFFAOYSA-K 0.000 abstract 2
- 229910002091 carbon monoxide Inorganic materials 0.000 abstract 2
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 abstract 2
- 239000000203 mixture Substances 0.000 abstract 2
- 239000000377 silicon dioxide Substances 0.000 abstract 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 abstract 1
- 235000008733 Citrus aurantifolia Nutrition 0.000 abstract 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 abstract 1
- YGYAWVDWMABLBF-UHFFFAOYSA-N Phosgene Chemical compound ClC(Cl)=O YGYAWVDWMABLBF-UHFFFAOYSA-N 0.000 abstract 1
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 abstract 1
- 235000011941 Tilia x europaea Nutrition 0.000 abstract 1
- HSFWRNGVRCDJHI-UHFFFAOYSA-N alpha-acetylene Natural products C#C HSFWRNGVRCDJHI-UHFFFAOYSA-N 0.000 abstract 1
- 229940077746 antacid containing aluminium compound Drugs 0.000 abstract 1
- 230000005587 bubbling Effects 0.000 abstract 1
- 229960004424 carbon dioxide Drugs 0.000 abstract 1
- 229910002090 carbon oxide Inorganic materials 0.000 abstract 1
- HEDRZPFGACZZDS-UHFFFAOYSA-N chloroform Substances ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 abstract 1
- 239000003085 diluting agent Substances 0.000 abstract 1
- 125000002534 ethynyl group Chemical group [H]C#C* 0.000 abstract 1
- 150000004820 halides Chemical class 0.000 abstract 1
- 239000001257 hydrogen Substances 0.000 abstract 1
- 229910052739 hydrogen Inorganic materials 0.000 abstract 1
- 239000011261 inert gas Substances 0.000 abstract 1
- 239000004571 lime Substances 0.000 abstract 1
- 239000007788 liquid Substances 0.000 abstract 1
- 239000011541 reaction mixture Substances 0.000 abstract 1
- 229910052990 silicon hydride Inorganic materials 0.000 abstract 1
- CZDYPVPMEAXLPK-UHFFFAOYSA-N tetramethylsilane Chemical compound C[Si](C)(C)C CZDYPVPMEAXLPK-UHFFFAOYSA-N 0.000 abstract 1
- JLTRXTDYQLMHGR-UHFFFAOYSA-N trimethylaluminium Chemical compound C[Al](C)C JLTRXTDYQLMHGR-UHFFFAOYSA-N 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01G—COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
- C01G23/00—Compounds of titanium
- C01G23/04—Oxides; Hydroxides
- C01G23/047—Titanium dioxide
- C01G23/07—Producing by vapour phase processes, e.g. halide oxidation
Abstract
Pigmentary rutile titanium dioxide is produced by decomposing at 1000-1600 DEG C vaporized titanium chloride with gases containing free oxygen in the presence of a volatile silicon compound and a volatile aluminium compound in amounts sufficient to yield a product containing 0.01-5 per cent silica and 0.01-5 per cent alumina produced by decomposition. The ratio alumina/silica should be in the range 3-1 : 1. Suitable aluminium compounds are the halides or trimethyl aluminium. Silicon compounds are silicon-tetra-or-hexachloride, -tetrabromide, -chloroform, or -tetraethylester, chloro-methylsilicane, dimethylsilicane, tetramethyl silicane, silicon hydride &c. The aluminium and silicon compounds may be added to the liquid titanium chloride to be vaporized, e.g. by bubbling oxygen therethrough; alternatively, aluminium chloride may be separately sublimed, e.g. by passing chlorine, with or without diluent gas, over aluminium shavings or a mixture of alumina and carbon, or carbon monoxide and chlorine, or phosgene, over alumina, the vapours being added to the titanium chloride vapours. The titanium chloride should be mixed with at least 50 per cent, up to a surplus, of oxygen for its decomposition. Inert gas may be present. The reaction mixture should be heated above 135 DEG C, up to 500 DEG C. The feed rate should be 1-50 metres/sec. Decomposition is effected in the presence of an auxiliary flame produced by burning methane, acetylene, hydrogen &c., or, preferably, carbon monoxide. Examples disclose burners consisting of concentric tubes, the titanium chloride mixture supply tube being surrounded by, and in some cases also surrounding, the supply tubes for the auxiliary flame-producing gases. The product may be subjected to evacuation to remove chlorine and hydrochloric acid, and neutralized with a small amount of lime. Specifications 567,093, 661,685, 673,782, 686,568 and 686,570 are referred to.
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CH689123X | 1949-10-08 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| GB689123A true GB689123A (en) | 1953-03-18 |
Family
ID=4529110
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| GB24467/50A Expired GB689123A (en) | 1949-10-08 | 1950-10-06 | Production of finely divided titanium dioxide |
Country Status (1)
| Country | Link |
|---|---|
| GB (1) | GB689123A (en) |
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2957753A (en) * | 1958-11-05 | 1960-10-25 | American Cyanamid Co | Titanium dioxide from titanium tetrachloride |
| US5536487A (en) * | 1995-02-27 | 1996-07-16 | Kronos, Inc. | Process for the use of rutile promoter and control additives in the manufacture of titanium dioxide by the chloride process |
| WO2001081480A2 (en) | 2000-04-27 | 2001-11-01 | E.I. Dupont De Nemours And Company | Process for making durable titanium dioxide pigment by vapor phase deposition |
| JP2005132716A (en) * | 2003-09-11 | 2005-05-26 | E I Du Pont De Nemours & Co | Plasma synthesis of metal oxide nanoparticle |
| US7795330B2 (en) | 2004-04-27 | 2010-09-14 | E. I. Du Pont De Nemours And Company | Preparation of organic additive-treated, pyrogenic silica-encapsulated titanium dioxide particles |
| US7799124B2 (en) | 2005-04-07 | 2010-09-21 | E.I. Du Pont De Nemours And Company | Process for treating inorganic particles via sintering of sinterable material |
-
1950
- 1950-10-06 GB GB24467/50A patent/GB689123A/en not_active Expired
Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2957753A (en) * | 1958-11-05 | 1960-10-25 | American Cyanamid Co | Titanium dioxide from titanium tetrachloride |
| US5536487A (en) * | 1995-02-27 | 1996-07-16 | Kronos, Inc. | Process for the use of rutile promoter and control additives in the manufacture of titanium dioxide by the chloride process |
| WO2001081480A2 (en) | 2000-04-27 | 2001-11-01 | E.I. Dupont De Nemours And Company | Process for making durable titanium dioxide pigment by vapor phase deposition |
| US6852306B2 (en) | 2000-04-27 | 2005-02-08 | E. I. Du Pont De Nemours And Company | Process for making durable rutile titanium dioxide pigment by vapor phase deposition of surface treatments |
| US7029648B2 (en) | 2000-04-27 | 2006-04-18 | E. I. Du Pont De Nemours And Company | Process for making durable rutile titanium dioxide pigment by vapor phase deposition of surface treatment |
| JP2005132716A (en) * | 2003-09-11 | 2005-05-26 | E I Du Pont De Nemours & Co | Plasma synthesis of metal oxide nanoparticle |
| US7795330B2 (en) | 2004-04-27 | 2010-09-14 | E. I. Du Pont De Nemours And Company | Preparation of organic additive-treated, pyrogenic silica-encapsulated titanium dioxide particles |
| US7799124B2 (en) | 2005-04-07 | 2010-09-21 | E.I. Du Pont De Nemours And Company | Process for treating inorganic particles via sintering of sinterable material |
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