GB708970A - Process for the preparation of finely divided metal oxides and silicon dioxide - Google Patents
Process for the preparation of finely divided metal oxides and silicon dioxideInfo
- Publication number
- GB708970A GB708970A GB159/52A GB15952A GB708970A GB 708970 A GB708970 A GB 708970A GB 159/52 A GB159/52 A GB 159/52A GB 15952 A GB15952 A GB 15952A GB 708970 A GB708970 A GB 708970A
- Authority
- GB
- United Kingdom
- Prior art keywords
- oxygen
- chloride
- mixture
- per cent
- gas
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 229910044991 metal oxide Inorganic materials 0.000 title abstract 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 title 2
- 150000004706 metal oxides Chemical class 0.000 title 1
- 235000012239 silicon dioxide Nutrition 0.000 title 1
- 239000000377 silicon dioxide Substances 0.000 title 1
- 239000007789 gas Substances 0.000 abstract 11
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 abstract 8
- 239000001301 oxygen Substances 0.000 abstract 8
- 229910052760 oxygen Inorganic materials 0.000 abstract 8
- 239000000203 mixture Substances 0.000 abstract 7
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 abstract 4
- UGFAIRIUMAVXCW-UHFFFAOYSA-N Carbon monoxide Chemical compound [O+]#[C-] UGFAIRIUMAVXCW-UHFFFAOYSA-N 0.000 abstract 4
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 abstract 4
- 229910002091 carbon monoxide Inorganic materials 0.000 abstract 4
- 239000001257 hydrogen Substances 0.000 abstract 4
- 229910052739 hydrogen Inorganic materials 0.000 abstract 4
- 238000006243 chemical reaction Methods 0.000 abstract 3
- FDNAPBUWERUEDA-UHFFFAOYSA-N silicon tetrachloride Chemical compound Cl[Si](Cl)(Cl)Cl FDNAPBUWERUEDA-UHFFFAOYSA-N 0.000 abstract 3
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 abstract 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 abstract 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 abstract 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 abstract 2
- 239000004411 aluminium Substances 0.000 abstract 2
- 229910052782 aluminium Inorganic materials 0.000 abstract 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 abstract 2
- 238000002485 combustion reaction Methods 0.000 abstract 2
- QMEZUZOCLYUADC-UHFFFAOYSA-N hydrate;dihydrochloride Chemical compound O.Cl.Cl QMEZUZOCLYUADC-UHFFFAOYSA-N 0.000 abstract 2
- 150000002431 hydrogen Chemical class 0.000 abstract 2
- 239000002184 metal Substances 0.000 abstract 2
- 229910052757 nitrogen Inorganic materials 0.000 abstract 2
- 239000011541 reaction mixture Substances 0.000 abstract 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 abstract 2
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 abstract 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical group [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 abstract 1
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 abstract 1
- 230000015572 biosynthetic process Effects 0.000 abstract 1
- 229910002092 carbon dioxide Inorganic materials 0.000 abstract 1
- 239000001569 carbon dioxide Substances 0.000 abstract 1
- 239000003034 coal gas Substances 0.000 abstract 1
- 238000000354 decomposition reaction Methods 0.000 abstract 1
- 230000007812 deficiency Effects 0.000 abstract 1
- 238000004821 distillation Methods 0.000 abstract 1
- 239000011261 inert gas Substances 0.000 abstract 1
- 229910052742 iron Inorganic materials 0.000 abstract 1
- 229910001338 liquidmetal Inorganic materials 0.000 abstract 1
- 238000004519 manufacturing process Methods 0.000 abstract 1
- 239000000463 material Substances 0.000 abstract 1
- 229910052751 metal Inorganic materials 0.000 abstract 1
- 230000004048 modification Effects 0.000 abstract 1
- 238000012986 modification Methods 0.000 abstract 1
- 239000003921 oil Substances 0.000 abstract 1
- 239000003208 petroleum Substances 0.000 abstract 1
- LIVNPJMFVYWSIS-UHFFFAOYSA-N silicon monoxide Chemical class [Si-]#[O+] LIVNPJMFVYWSIS-UHFFFAOYSA-N 0.000 abstract 1
- 229910052814 silicon oxide Inorganic materials 0.000 abstract 1
- 238000000859 sublimation Methods 0.000 abstract 1
- 230000008022 sublimation Effects 0.000 abstract 1
- 239000010936 titanium Substances 0.000 abstract 1
- 229910052719 titanium Inorganic materials 0.000 abstract 1
- XJDNKRIXUMDJCW-UHFFFAOYSA-J titanium tetrachloride Chemical compound Cl[Ti](Cl)(Cl)Cl XJDNKRIXUMDJCW-UHFFFAOYSA-J 0.000 abstract 1
- 229910052726 zirconium Inorganic materials 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/113—Silicon oxides; Hydrates thereof
- C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
- C01B33/18—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof
- C01B33/181—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof by a dry process
- C01B33/183—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof by a dry process by oxidation or hydrolysis in the vapour phase of silicon compounds such as halides, trichlorosilane, monosilane
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B13/00—Oxygen; Ozone; Oxides or hydroxides in general
- C01B13/14—Methods for preparing oxides or hydroxides in general
- C01B13/20—Methods for preparing oxides or hydroxides in general by oxidation of elements in the gaseous state; by oxidation or hydrolysis of compounds in the gaseous state
- C01B13/22—Methods for preparing oxides or hydroxides in general by oxidation of elements in the gaseous state; by oxidation or hydrolysis of compounds in the gaseous state of halides or oxyhalides
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01G—COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
- C01G23/00—Compounds of titanium
- C01G23/04—Oxides; Hydroxides
- C01G23/047—Titanium dioxide
- C01G23/07—Producing by vapour phase processes, e.g. halide oxidation
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2004/00—Particle morphology
- C01P2004/60—Particles characterised by their size
- C01P2004/62—Submicrometer sized, i.e. from 0.1-1 micrometer
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2006/00—Physical properties of inorganic compounds
- C01P2006/60—Optical properties, e.g. expressed in CIELAB-values
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2006/00—Physical properties of inorganic compounds
- C01P2006/80—Compositional purity
- C01P2006/82—Compositional purity water content
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Life Sciences & Earth Sciences (AREA)
- Environmental & Geological Engineering (AREA)
- General Life Sciences & Earth Sciences (AREA)
- Geology (AREA)
- Silicon Compounds (AREA)
- Inorganic Compounds Of Heavy Metals (AREA)
Abstract
<PICT:0708970/III/1> In the production of metal or silicon oxides by decomposing a mixture of metal or silicon chloride vapour and oxygen - containing gases, in which the mixture is ignited to a flame with the aid of an auxiliary flame produced by separately introduced gases, the moisture content of the gas current which first comes into contact with the outflowing reaction mixture is maintained below the limit above which a crust formation takes place at the contact zone within 12 hours. The permissible moisture content varies with the nature of the chloride being decomposed, the discharge velocity of the gases, their temperature &c. but is always less than 1 per cent. by volume, and may be 0.01 per cent. Suitable combustible gases are hydrogen, carbon monoxide, coal gas, petroleum or oil vapour, or mixtures thereof. Carbon monoxide is especially suitable, yielding no hydrochloric acid, but its combustion can only be effected in the presence of 0.01 per cent. water vapour, or more depending on the gas velocities, the burner area etc.; to this end water vapour, or hydrogen, or hydrogen-containing combustible material is added to the carbon monoxide or oxygen-containing gas, whichever is not led into immediate contact with the chloride reaction mixture. The latter is produced by introducing oxygen-containing gases into the distillation or sublimation chamber, the mixture being then preheated, or by atomizing heated liquid metal chloride under pressure with the oxygen-containing gas. Pure oxygen may be used, or it may be admixed with nitrogen, carbon dioxide &c. The inert gas may alternatively be introduced into the reaction chamber between the chloride-oxygen mixture and the flame-producing gas, its moisture content being subject to the above considerations. The reaction may contain from a deficiency up to 20-50 per cent. of oxygen for the combustion of the chloride. Suitable burners consist of concentric tubes, the chloride-oxygen mixture passing through one tube and the combustible gases passing through outer, and in some cases also inner, concentric tubes. In a modification shown in Fig. 5, oxygen with a hydrogen and moisture content of 0.1 per cent. by volume each passes through the central tube 13, a mixture of titanium chloride, oxygen and nitrogen with a small content of aluminium and silicon chlorides through all of the tubes 14, carbon monoxide with a moisture content of 0.001 per cent. by volume through the free space between tubes 15, 13, and oxygen through the space between tubes 16, 15. The temperature of the reaction chamber is maintained at 1200 DEG C. The decomposition of titanium, zirconium, iron, aluminium and silicon chlorides, is indicated. Specification 661,685 is referred to.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CH708970X | 1951-02-07 |
Publications (1)
Publication Number | Publication Date |
---|---|
GB708970A true GB708970A (en) | 1954-05-12 |
Family
ID=4530605
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB159/52A Expired GB708970A (en) | 1951-02-07 | 1952-01-02 | Process for the preparation of finely divided metal oxides and silicon dioxide |
Country Status (5)
Country | Link |
---|---|
BE (1) | BE508951A (en) |
CH (1) | CH295398A (en) |
DE (1) | DE948415C (en) |
FR (1) | FR1054385A (en) |
GB (1) | GB708970A (en) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0262561A2 (en) * | 1986-09-29 | 1988-04-06 | Mitsubishi Jushi Engineering Co., Ltd. | Method of burning waste gases from semiconductor-manufacturing processes and an apparatus for burning the waste gases |
FR2612606A1 (en) * | 1987-03-18 | 1988-09-23 | Air Liquide | METHOD AND DEVICE FOR DESTRUCTION OF TOXIC GASEOUS EFFLUENTS |
EP0311317A2 (en) * | 1987-10-06 | 1989-04-12 | Toyo Sanso Co., Ltd. | Combustion method for specific exhaust gases containing deleterious substances |
WO2007127232A2 (en) * | 2006-04-28 | 2007-11-08 | Cabot Corporation | Process for the production of fumed silica |
Families Citing this family (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE1151337B (en) * | 1957-11-15 | 1963-07-11 | Pittsburgh Plate Glass Co | Process for the production of titanium dioxide pigments |
DE2849851C3 (en) * | 1978-11-17 | 1981-11-05 | Degussa Ag, 6000 Frankfurt | Process for the pyrogenic production of finely divided oxide of a metal and / or a metalloid |
DE2904199A1 (en) * | 1979-02-05 | 1980-08-07 | Degussa | METHOD FOR THE GUIDED PRODUCTION OF SILICON BY MEANS OF FLAME HYDROLYSIS |
DE4009299A1 (en) * | 1989-04-19 | 1990-10-25 | Degussa | (ALPHA) ALUMINUM OXIDE AND METHOD FOR THE PRODUCTION THEREOF |
DE4102328A1 (en) * | 1991-01-26 | 1992-07-30 | Degussa | Pyrogenic niobium oxide - useful for prodn. of catalysts, ceramics and glass |
DE102018127957A1 (en) | 2018-11-08 | 2020-05-14 | Umicore Ag & Co. Kg | Particle filter with multiple coatings |
DE102018127955A1 (en) | 2018-11-08 | 2020-05-14 | Umicore Ag & Co. Kg | Catalytically active particle filter with high filtration efficiency |
DE102018127953A1 (en) | 2018-11-08 | 2020-05-14 | Umicore Ag & Co. Kg | Wall flow filter with high filtration efficiency |
-
0
- BE BE508951D patent/BE508951A/xx unknown
-
1951
- 1951-02-07 CH CH295398D patent/CH295398A/en unknown
-
1952
- 1952-01-02 GB GB159/52A patent/GB708970A/en not_active Expired
- 1952-01-10 DE DES26744A patent/DE948415C/en not_active Expired
- 1952-02-06 FR FR1054385D patent/FR1054385A/en not_active Expired
Cited By (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0262561A2 (en) * | 1986-09-29 | 1988-04-06 | Mitsubishi Jushi Engineering Co., Ltd. | Method of burning waste gases from semiconductor-manufacturing processes and an apparatus for burning the waste gases |
EP0262561A3 (en) * | 1986-09-29 | 1988-08-03 | Mitsubishi Jushi Engineering Co., Ltd. | Method of burning waste gases from semiconductor-manufacturing processes and an apparatus for burning the waste gases |
FR2612606A1 (en) * | 1987-03-18 | 1988-09-23 | Air Liquide | METHOD AND DEVICE FOR DESTRUCTION OF TOXIC GASEOUS EFFLUENTS |
EP0285485A1 (en) * | 1987-03-18 | 1988-10-05 | L'air Liquide, Societe Anonyme Pour L'etude Et L'exploitation Des Procedes Georges Claude | Method and device for destroying toxic gaseous effluents |
EP0311317A2 (en) * | 1987-10-06 | 1989-04-12 | Toyo Sanso Co., Ltd. | Combustion method for specific exhaust gases containing deleterious substances |
EP0311317A3 (en) * | 1987-10-06 | 1990-03-28 | Toyo Sanso Co., Ltd. | Combustion method for specific exhaust gases containing deleterious substances |
WO2007127232A2 (en) * | 2006-04-28 | 2007-11-08 | Cabot Corporation | Process for the production of fumed silica |
WO2007127232A3 (en) * | 2006-04-28 | 2009-10-01 | Cabot Corporation | Process for the production of fumed silica |
US7910081B2 (en) | 2006-04-28 | 2011-03-22 | Cabot Corporation | Process for the production of fumed silica |
Also Published As
Publication number | Publication date |
---|---|
FR1054385A (en) | 1954-02-10 |
CH295398A (en) | 1953-12-31 |
DE948415C (en) | 1956-08-30 |
BE508951A (en) |
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