GB2615659B - Automatically controlled cleaning apparatus and controlled cleaning method for MEMS chip - Google Patents

Automatically controlled cleaning apparatus and controlled cleaning method for MEMS chip Download PDF

Info

Publication number
GB2615659B
GB2615659B GB2304383.9A GB202304383A GB2615659B GB 2615659 B GB2615659 B GB 2615659B GB 202304383 A GB202304383 A GB 202304383A GB 2615659 B GB2615659 B GB 2615659B
Authority
GB
United Kingdom
Prior art keywords
controlled cleaning
mems chip
cleaning apparatus
automatically controlled
cleaning method
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
GB2304383.9A
Other versions
GB202304383D0 (en
GB2615659A (en
Inventor
Zhang Na
He Fang
Li Yongqing
Li Hongru
Hu Yanli
Liu Yan
Zhu Yongfeng
Jia Wenbo
Shan Henan
Xu Haining
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shenyang Academy of Instrumentation Science Co Ltd
Sinomach Sensing Technology Co Ltd
Original Assignee
Shenyang Academy of Instrumentation Science Co Ltd
Sinomach Sensing Technology Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from CN202210941656.8A external-priority patent/CN114985361B/en
Application filed by Shenyang Academy of Instrumentation Science Co Ltd, Sinomach Sensing Technology Co Ltd filed Critical Shenyang Academy of Instrumentation Science Co Ltd
Publication of GB202304383D0 publication Critical patent/GB202304383D0/en
Publication of GB2615659A publication Critical patent/GB2615659A/en
Application granted granted Critical
Publication of GB2615659B publication Critical patent/GB2615659B/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/02—Cleaning by the force of jets or sprays
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/04—Cleaning involving contact with liquid
    • B08B3/10—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration
    • B08B3/14—Removing waste, e.g. labels, from cleaning liquid; Regenerating cleaning liquids
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
    • B81B7/00—Microstructural systems; Auxiliary parts of microstructural devices or systems
    • B81B7/02—Microstructural systems; Auxiliary parts of microstructural devices or systems containing distinct electrical or optical devices of particular relevance for their function, e.g. microelectro-mechanical systems [MEMS]
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
    • B81C1/00—Manufacture or treatment of devices or systems in or on a substrate
    • B81C1/00841—Cleaning during or after manufacture
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
    • B81C1/00—Manufacture or treatment of devices or systems in or on a substrate
    • B81C1/00841—Cleaning during or after manufacture
    • B81C1/00849—Cleaning during or after manufacture during manufacture
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
    • B81C1/00—Manufacture or treatment of devices or systems in or on a substrate
    • B81C1/00841—Cleaning during or after manufacture
    • B81C1/00857—Cleaning during or after manufacture after manufacture, e.g. back-end of the line process
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
    • B81C99/00—Subject matter not provided for in other groups of this subclass
    • B81C99/0005—Apparatus specially adapted for the manufacture or treatment of microstructural devices or systems, or methods for manufacturing the same
    • B81C99/0025—Apparatus specially adapted for the manufacture or treatment of microstructural devices or systems not provided for in B81C99/001 - B81C99/002
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C02F1/46—Treatment of water, waste water, or sewage by electrochemical methods
    • C02F1/469—Treatment of water, waste water, or sewage by electrochemical methods by electrochemical separation, e.g. by electro-osmosis, electrodialysis, electrophoresis
    • C02F1/4693—Treatment of water, waste water, or sewage by electrochemical methods by electrochemical separation, e.g. by electro-osmosis, electrodialysis, electrophoresis electrodialysis
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2103/00—Nature of the water, waste water, sewage or sludge to be treated
    • C02F2103/34—Nature of the water, waste water, sewage or sludge to be treated from industrial activities not provided for in groups C02F2103/12 - C02F2103/32
    • C02F2103/346—Nature of the water, waste water, sewage or sludge to be treated from industrial activities not provided for in groups C02F2103/12 - C02F2103/32 from semiconductor processing, e.g. waste water from polishing of wafers

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Manufacturing & Machinery (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Hydrology & Water Resources (AREA)
  • General Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Electrochemistry (AREA)
  • Environmental & Geological Engineering (AREA)
  • Water Supply & Treatment (AREA)
  • Organic Chemistry (AREA)
  • Molecular Biology (AREA)
  • Analytical Chemistry (AREA)
  • Computer Hardware Design (AREA)
  • Cleaning By Liquid Or Steam (AREA)
GB2304383.9A 2022-08-08 2022-11-28 Automatically controlled cleaning apparatus and controlled cleaning method for MEMS chip Active GB2615659B (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
CN202210941656.8A CN114985361B (en) 2022-08-08 2022-08-08 Automatic control cleaning device and control cleaning method for MEMS chip
PCT/CN2022/134790 WO2024031873A1 (en) 2022-08-08 2022-11-28 Device and method for automatically controlling cleaning of mems chip

Publications (3)

Publication Number Publication Date
GB202304383D0 GB202304383D0 (en) 2023-05-10
GB2615659A GB2615659A (en) 2023-08-16
GB2615659B true GB2615659B (en) 2024-03-06

Family

ID=87312890

Family Applications (1)

Application Number Title Priority Date Filing Date
GB2304383.9A Active GB2615659B (en) 2022-08-08 2022-11-28 Automatically controlled cleaning apparatus and controlled cleaning method for MEMS chip

Country Status (1)

Country Link
GB (1) GB2615659B (en)

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001017839A (en) * 1999-07-08 2001-01-23 Ebara Corp Method and apparatus for reusing chemical liquid for surface treatment
US20190143481A1 (en) * 2017-11-14 2019-05-16 Taiwan Semiconductor Manufacturing Co., Ltd. Method and apparatus for cleaning process monitoring
CN213612868U (en) * 2020-07-11 2021-07-06 青岛龙利电子有限公司 Pretreatment cleaning equipment for circuit board manufacturing
CN114602875A (en) * 2022-02-16 2022-06-10 无锡恒大电子科技有限公司 Organic cleaning equipment for MEMS (micro-electromechanical systems) process
CN217411651U (en) * 2022-04-06 2022-09-13 强一半导体（苏州）有限公司 MEMS wafer spraying device

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001017839A (en) * 1999-07-08 2001-01-23 Ebara Corp Method and apparatus for reusing chemical liquid for surface treatment
US20190143481A1 (en) * 2017-11-14 2019-05-16 Taiwan Semiconductor Manufacturing Co., Ltd. Method and apparatus for cleaning process monitoring
CN213612868U (en) * 2020-07-11 2021-07-06 青岛龙利电子有限公司 Pretreatment cleaning equipment for circuit board manufacturing
CN114602875A (en) * 2022-02-16 2022-06-10 无锡恒大电子科技有限公司 Organic cleaning equipment for MEMS (micro-electromechanical systems) process
CN217411651U (en) * 2022-04-06 2022-09-13 强一半导体（苏州）有限公司 MEMS wafer spraying device

Also Published As

Publication number Publication date
GB202304383D0 (en) 2023-05-10
GB2615659A (en) 2023-08-16

Similar Documents

Publication Publication Date Title
EP3971577A4 (en) Automatic analysis apparatus and cleaning method for same
GB202007769D0 (en) Laser cleaning apparatus and method
SG10202104870QA (en) Apparatus for polishing and method of polishing
HUE065534T2 (en) Method and device for cleaning vessels
GB2615659B (en) Automatically controlled cleaning apparatus and controlled cleaning method for MEMS chip
EP4059403A4 (en) Method and apparatus for controlling cleaning device
EP3871797C0 (en) Cleaning apparatus and cleaning method
GB202304887D0 (en) Apparatus and method for refriferation
GB202205191D0 (en) Pillutant removal apparatus and method
GB202206946D0 (en) Apparatus and method for web cleaning
KR102435926B9 (en) Apparatus and method for polishing wafer
GB202308736D0 (en) Apparatus and method for creating bubbles
GB202215381D0 (en) Steam-wand cleaning device, apparatus, and associated method
KR102531086B9 (en) Polishing apparatus and polishing method
GB202116648D0 (en) Method and apparatus for dropsonde deployment
GB202218404D0 (en) Apparatus and method for a cleaning device
GB202306378D0 (en) Method and apparatus for ejecting fluids
GB202005227D0 (en) Apparatus for cleaning a vessel and method
AU2021904243A0 (en) Slide cleaning apparatus and method
GB202302877D0 (en) Dispensing apparatus and method
GB202219856D0 (en) Apparatus and method
GB202219434D0 (en) Method and apparatus
GB202218500D0 (en) Apparatus and Method
GB202218290D0 (en) Apparatus and method
GB202217395D0 (en) Apparatus and method