GB2465528A - Method and apparatus for surface processing of a substrate using an energetic particle beam - Google Patents
Method and apparatus for surface processing of a substrate using an energetic particle beam Download PDFInfo
- Publication number
- GB2465528A GB2465528A GB1005502A GB201005502A GB2465528A GB 2465528 A GB2465528 A GB 2465528A GB 1005502 A GB1005502 A GB 1005502A GB 201005502 A GB201005502 A GB 201005502A GB 2465528 A GB2465528 A GB 2465528A
- Authority
- GB
- United Kingdom
- Prior art keywords
- substrate
- particle beam
- energetic particle
- surface processing
- energetic
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/50—Substrate holders
- C23C14/505—Substrate holders for rotation of the substrates
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/221—Ion beam deposition
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/46—Sputtering by ion beam produced by an external ion source
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/50—Substrate holders
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/54—Controlling or regulating the coating process
- C23C14/542—Controlling the film thickness or evaporation rate
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
- H01J37/08—Ion sources; Ion guns
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/20—Means for supporting or positioning the objects or the material; Means for adjusting diaphragms or lenses associated with the support
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/305—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating or etching
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/305—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating or etching
- H01J37/3053—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating or etching for evaporating or etching
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
- H01J37/3178—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation for applying thin layers on objects
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/20—Positioning, supporting, modifying or maintaining the physical state of objects being observed or treated
- H01J2237/202—Movement
- H01J2237/20207—Tilt
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/20—Positioning, supporting, modifying or maintaining the physical state of objects being observed or treated
- H01J2237/202—Movement
- H01J2237/20214—Rotation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/20—Positioning, supporting, modifying or maintaining the physical state of objects being observed or treated
- H01J2237/202—Movement
- H01J2237/20221—Translation
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Analytical Chemistry (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Recrystallisation Techniques (AREA)
- Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
- Physical Vapour Deposition (AREA)
Abstract
Method and apparatus for processing a substrate (44) with an energetic particle beam (42). Features (66) on the substrate (44) are oriented relative to the energetic particle beam (42) and the substrate (44) is scanned through the energetic particle beam (42). The substrate (44) is periodically indexed about its azimuthal axis (45) of symmetry, while shielded from exposure to the energetic particle beam (42), to reorient the features (66) relative to the major dimension (49) of the beam (42).
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US97331207P | 2007-09-18 | 2007-09-18 | |
PCT/US2008/076835 WO2009039261A1 (en) | 2007-09-18 | 2008-09-18 | Method and apparatus for surface processing of a substrate using an energetic particle beam |
Publications (3)
Publication Number | Publication Date |
---|---|
GB201005502D0 GB201005502D0 (en) | 2010-05-19 |
GB2465528A true GB2465528A (en) | 2010-05-26 |
GB2465528B GB2465528B (en) | 2013-02-27 |
Family
ID=39944448
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB1005502.8A Active GB2465528B (en) | 2007-09-18 | 2008-09-18 | Method and apparatus for surface processing of a substrate using an energetic particle beam |
Country Status (3)
Country | Link |
---|---|
JP (1) | JP2010539674A (en) |
GB (1) | GB2465528B (en) |
WO (1) | WO2009039261A1 (en) |
Families Citing this family (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US9206500B2 (en) | 2003-08-11 | 2015-12-08 | Boris Druz | Method and apparatus for surface processing of a substrate using an energetic particle beam |
US20130206583A1 (en) * | 2007-09-18 | 2013-08-15 | Veeco Instruments, Inc. | Method and Apparatus for Surface Processing of a Substrate Using an Energetic Particle Beam |
JP5882934B2 (en) | 2012-05-09 | 2016-03-09 | シーゲイト テクノロジー エルエルシー | Sputtering equipment |
CN103463849A (en) * | 2012-06-07 | 2013-12-25 | 雅玛信过滤器株式会社 | Filter core |
JP6053154B2 (en) * | 2013-03-28 | 2016-12-27 | リンテック株式会社 | Light irradiation apparatus and light irradiation method |
JP2015067856A (en) * | 2013-09-27 | 2015-04-13 | シーゲイト テクノロジー エルエルシー | Magnetron sputtering apparatus |
WO2017188132A1 (en) | 2016-04-25 | 2017-11-02 | 日新電機株式会社 | Ion beam irradiation device and ion beam irradiation method |
JP2019199630A (en) * | 2018-05-15 | 2019-11-21 | 東京エレクトロン株式会社 | Method for forming film |
JP2019218621A (en) * | 2018-06-22 | 2019-12-26 | 東京エレクトロン株式会社 | Substrate placing base and film deposition device |
US10879055B2 (en) * | 2018-07-17 | 2020-12-29 | Varian Semiconductor Equipment Associates, Inc. | Techniques, system and apparatus for selective deposition of a layer using angled ions |
JP7097777B2 (en) * | 2018-08-10 | 2022-07-08 | 東京エレクトロン株式会社 | Film forming equipment and film forming method |
JP7329913B2 (en) * | 2018-10-16 | 2023-08-21 | Jswアフティ株式会社 | Plasma deposition method |
JP2022513448A (en) * | 2018-12-17 | 2022-02-08 | アプライド マテリアルズ インコーポレイテッド | PVD directional deposition for encapsulation |
BE1027427B1 (en) * | 2019-07-14 | 2021-02-08 | Soleras Advanced Coatings Bv | Motion systems for sputter coating non-planar substrates |
JP7060633B2 (en) * | 2020-01-29 | 2022-04-26 | キヤノントッキ株式会社 | Film forming equipment and electronic device manufacturing equipment |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6056826A (en) * | 1997-07-18 | 2000-05-02 | Leybold Systems, Gmbh | Vacuum coating device for coating substrates on all sides |
JP2001247963A (en) * | 2000-03-03 | 2001-09-14 | Shimadzu Corp | Ecr sputter film forming apparatus |
US6716322B1 (en) * | 2001-04-19 | 2004-04-06 | Veeco Instruments Inc. | Method and apparatus for controlling film profiles on topographic features |
US20050034979A1 (en) * | 2003-08-11 | 2005-02-17 | Veeco Instruments Inc. | Method and apparatus for surface processing of a substrate |
DE102004018079A1 (en) * | 2004-04-08 | 2005-10-27 | Nobuyuki Sagamihara Takahashi | Sputtering device includes rotation mechanism, sputtering cathode unit, movement mechanism, and sputtering mechanism which sputters when sputtering cathode moves over rotating substrate |
-
2008
- 2008-09-18 JP JP2010525963A patent/JP2010539674A/en not_active Ceased
- 2008-09-18 WO PCT/US2008/076835 patent/WO2009039261A1/en active Application Filing
- 2008-09-18 GB GB1005502.8A patent/GB2465528B/en active Active
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6056826A (en) * | 1997-07-18 | 2000-05-02 | Leybold Systems, Gmbh | Vacuum coating device for coating substrates on all sides |
JP2001247963A (en) * | 2000-03-03 | 2001-09-14 | Shimadzu Corp | Ecr sputter film forming apparatus |
US6716322B1 (en) * | 2001-04-19 | 2004-04-06 | Veeco Instruments Inc. | Method and apparatus for controlling film profiles on topographic features |
US20050034979A1 (en) * | 2003-08-11 | 2005-02-17 | Veeco Instruments Inc. | Method and apparatus for surface processing of a substrate |
DE102004018079A1 (en) * | 2004-04-08 | 2005-10-27 | Nobuyuki Sagamihara Takahashi | Sputtering device includes rotation mechanism, sputtering cathode unit, movement mechanism, and sputtering mechanism which sputters when sputtering cathode moves over rotating substrate |
Also Published As
Publication number | Publication date |
---|---|
JP2010539674A (en) | 2010-12-16 |
WO2009039261A1 (en) | 2009-03-26 |
GB2465528B (en) | 2013-02-27 |
GB201005502D0 (en) | 2010-05-19 |
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