GB2405531A - Integrated circuit with reverse engineering protection - Google Patents
Integrated circuit with reverse engineering protection Download PDFInfo
- Publication number
- GB2405531A GB2405531A GB0427115A GB0427115A GB2405531A GB 2405531 A GB2405531 A GB 2405531A GB 0427115 A GB0427115 A GB 0427115A GB 0427115 A GB0427115 A GB 0427115A GB 2405531 A GB2405531 A GB 2405531A
- Authority
- GB
- United Kingdom
- Prior art keywords
- integrated circuit
- reverse engineering
- engineering protection
- circuit structure
- controlled
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000003989 dielectric material Substances 0.000 abstract 1
- 239000000463 material Substances 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/58—Structural electrical arrangements for semiconductor devices not otherwise provided for, e.g. in combination with batteries
- H01L23/585—Structural electrical arrangements for semiconductor devices not otherwise provided for, e.g. in combination with batteries comprising conductive layers or plates or strips or rods or rings
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/57—Protection from inspection, reverse engineering or tampering
- H01L23/573—Protection from inspection, reverse engineering or tampering using passive means
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
- H01L27/0203—Particular design considerations for integrated circuits
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/0001—Technical content checked by a classifier
- H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
Landscapes
- Power Engineering (AREA)
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- General Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Computer Hardware Design (AREA)
- Physics & Mathematics (AREA)
- Semiconductor Integrated Circuits (AREA)
- Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)
- Semiconductor Memories (AREA)
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Bipolar Transistors (AREA)
- Non-Volatile Memory (AREA)
- Insulated Gate Type Field-Effect Transistor (AREA)
Abstract
Technique and structures for camouflaging an integrated circuit structure. The integrated circuit structure is formed by a plurality of layers of material having controlled outlines and controlled thicknesses. A layer of dielectric material of a controlled thickness is disposed among said plurality of layers to thereby render the integrated circuit structure intentionally inoperable.
Description
GB 2405531 A continuation (71) cont Raytheon Company (Incorporated in USA
- Delaware} 141 Spring Street, Lexington, Massachusetts 02173, United States of America (72) Inventor(s): Lap-Wai Chow William M Clark Jr James P Baukus (74) Agent and/or Address for Service: Langner Parry High Holborn House, 52-54 High Holborn, LONDON, WC1V ERR, United Kingdom
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US37815502P | 2002-05-14 | 2002-05-14 | |
PCT/US2003/014058 WO2003098692A1 (en) | 2002-05-14 | 2003-05-06 | Integrated circuit with reverse engineering protection |
Publications (3)
Publication Number | Publication Date |
---|---|
GB0427115D0 GB0427115D0 (en) | 2005-01-12 |
GB2405531A true GB2405531A (en) | 2005-03-02 |
GB2405531B GB2405531B (en) | 2006-04-12 |
Family
ID=29549915
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB0427115A Expired - Fee Related GB2405531B (en) | 2002-05-14 | 2003-05-06 | Integrated circuit with reverse engineering protection |
Country Status (5)
Country | Link |
---|---|
JP (1) | JP4729303B2 (en) |
AU (1) | AU2003245265A1 (en) |
GB (1) | GB2405531B (en) |
TW (1) | TWI226697B (en) |
WO (1) | WO2003098692A1 (en) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2008507851A (en) * | 2004-07-26 | 2008-03-13 | コーニンクレッカ フィリップス エレクトロニクス エヌ ヴィ | Chip with light protection layer |
FR3069370B1 (en) | 2017-07-21 | 2021-10-22 | St Microelectronics Rousset | INTEGRATED CIRCUIT CONTAINING A LURE STRUCTURE |
US11257769B2 (en) * | 2019-06-28 | 2022-02-22 | Taiwan Semiconductor Manufacturing Company, Ltd. | Integrated circuit layout, integrated circuit, and method for fabricating the same |
Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61147551A (en) * | 1984-12-21 | 1986-07-05 | Nec Corp | Semiconductor device |
EP0186855A2 (en) * | 1984-12-25 | 1986-07-09 | Kabushiki Kaisha Toshiba | Semiconductor read only memory device and method of manufacturing the same |
WO1998057373A1 (en) * | 1997-06-13 | 1998-12-17 | Inside Technologies | Method for making an integrated circuit and integrated circuit produced by said method |
US5895241A (en) * | 1997-03-28 | 1999-04-20 | Lu; Tao Cheng | Method for fabricating a cell structure for mask ROM |
EP1193758A1 (en) * | 2000-10-02 | 2002-04-03 | STMicroelectronics S.r.l. | Anti-deciphering contacts |
EP1202353A1 (en) * | 2000-10-27 | 2002-05-02 | STMicroelectronics S.r.l. | Mask programmed ROM and method of fabrication |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS63296368A (en) * | 1987-05-28 | 1988-12-02 | Matsushita Electronics Corp | Complementary type mos semiconductor device |
JPH02192761A (en) * | 1989-01-20 | 1990-07-30 | Sony Corp | Manufacture of semiconductor device |
JP4931267B2 (en) * | 1998-01-29 | 2012-05-16 | ルネサスエレクトロニクス株式会社 | Semiconductor device |
-
2003
- 2003-05-06 JP JP2004506086A patent/JP4729303B2/en not_active Expired - Fee Related
- 2003-05-06 AU AU2003245265A patent/AU2003245265A1/en not_active Abandoned
- 2003-05-06 WO PCT/US2003/014058 patent/WO2003098692A1/en active Application Filing
- 2003-05-06 GB GB0427115A patent/GB2405531B/en not_active Expired - Fee Related
- 2003-05-13 TW TW092112967A patent/TWI226697B/en not_active IP Right Cessation
Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61147551A (en) * | 1984-12-21 | 1986-07-05 | Nec Corp | Semiconductor device |
EP0186855A2 (en) * | 1984-12-25 | 1986-07-09 | Kabushiki Kaisha Toshiba | Semiconductor read only memory device and method of manufacturing the same |
US5895241A (en) * | 1997-03-28 | 1999-04-20 | Lu; Tao Cheng | Method for fabricating a cell structure for mask ROM |
WO1998057373A1 (en) * | 1997-06-13 | 1998-12-17 | Inside Technologies | Method for making an integrated circuit and integrated circuit produced by said method |
EP1193758A1 (en) * | 2000-10-02 | 2002-04-03 | STMicroelectronics S.r.l. | Anti-deciphering contacts |
EP1202353A1 (en) * | 2000-10-27 | 2002-05-02 | STMicroelectronics S.r.l. | Mask programmed ROM and method of fabrication |
Non-Patent Citations (1)
Title |
---|
PATENT ABSTRACTS OF JAPAN, Vol. 0103, No. 43 (E-456), 19 November 1986; & JP 61 147551 A (NEC CORP), 5 July 1986 * |
Also Published As
Publication number | Publication date |
---|---|
AU2003245265A1 (en) | 2003-12-02 |
JP4729303B2 (en) | 2011-07-20 |
GB2405531B (en) | 2006-04-12 |
TW200400611A (en) | 2004-01-01 |
GB0427115D0 (en) | 2005-01-12 |
WO2003098692A1 (en) | 2003-11-27 |
TWI226697B (en) | 2005-01-11 |
JP2005526401A (en) | 2005-09-02 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PCNP | Patent ceased through non-payment of renewal fee |
Effective date: 20150506 |