GB2405524B - Thermal compensation in magnetic field influencing of an electron beam - Google Patents

Thermal compensation in magnetic field influencing of an electron beam

Info

Publication number
GB2405524B
GB2405524B GB0320292A GB0320292A GB2405524B GB 2405524 B GB2405524 B GB 2405524B GB 0320292 A GB0320292 A GB 0320292A GB 0320292 A GB0320292 A GB 0320292A GB 2405524 B GB2405524 B GB 2405524B
Authority
GB
United Kingdom
Prior art keywords
magnetic field
electron beam
thermal compensation
field influencing
influencing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
GB0320292A
Other versions
GB2405524A (en
GB0320292D0 (en
Inventor
Andrew Dean
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Vistec Lithography Ltd
Original Assignee
Vistec Lithography Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Vistec Lithography Ltd filed Critical Vistec Lithography Ltd
Priority to GB0320292A priority Critical patent/GB2405524B/en
Publication of GB0320292D0 publication Critical patent/GB0320292D0/en
Priority to DE200410035012 priority patent/DE102004035012A1/en
Priority to JP2004235972A priority patent/JP2005079092A/en
Publication of GB2405524A publication Critical patent/GB2405524A/en
Application granted granted Critical
Publication of GB2405524B publication Critical patent/GB2405524B/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/147—Arrangements for directing or deflecting the discharge along a desired path
    • H01J37/1472—Deflecting along given lines
    • H01J37/1474—Scanning means
    • H01J37/1475—Scanning means magnetic
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/002—Cooling arrangements
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/15—Means for deflecting or directing discharge
    • H01J2237/152—Magnetic means
    • H01J2237/1526—For X-Y scanning

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
GB0320292A 2003-08-29 2003-08-29 Thermal compensation in magnetic field influencing of an electron beam Expired - Fee Related GB2405524B (en)

Priority Applications (3)

Application Number Priority Date Filing Date Title
GB0320292A GB2405524B (en) 2003-08-29 2003-08-29 Thermal compensation in magnetic field influencing of an electron beam
DE200410035012 DE102004035012A1 (en) 2003-08-29 2004-07-20 Thermal compensation in the magnetic field influence of an electron beam
JP2004235972A JP2005079092A (en) 2003-08-29 2004-08-13 Heat compensation in magnetic field influencing of electron beam

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB0320292A GB2405524B (en) 2003-08-29 2003-08-29 Thermal compensation in magnetic field influencing of an electron beam

Publications (3)

Publication Number Publication Date
GB0320292D0 GB0320292D0 (en) 2003-10-01
GB2405524A GB2405524A (en) 2005-03-02
GB2405524B true GB2405524B (en) 2005-08-17

Family

ID=28686581

Family Applications (1)

Application Number Title Priority Date Filing Date
GB0320292A Expired - Fee Related GB2405524B (en) 2003-08-29 2003-08-29 Thermal compensation in magnetic field influencing of an electron beam

Country Status (3)

Country Link
JP (1) JP2005079092A (en)
DE (1) DE102004035012A1 (en)
GB (1) GB2405524B (en)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5386934B2 (en) * 2008-11-04 2014-01-15 株式会社島津製作所 Contamination prevention device for charged particle beam device and objective lens thereof
JP2013030276A (en) * 2011-07-26 2013-02-07 Hitachi High-Technologies Corp Electromagnetic lens and charged particle device
CN110265278A (en) * 2016-12-14 2019-09-20 聚束科技（北京）有限公司 A kind of magnetic lenses and exciting current control method
US10340114B1 (en) * 2018-01-19 2019-07-02 Kla-Tencor Corporation Method of eliminating thermally induced beam drift in an electron beam separator

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0689850A (en) * 1992-09-09 1994-03-29 Fujitsu Ltd Electron beam aligner
JPH06204127A (en) * 1993-01-07 1994-07-22 Fujitsu Ltd Determining method of heat compensation current in charged particle beam aligner

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4847265A (en) * 1971-10-15 1973-07-05
US4345152A (en) * 1980-08-11 1982-08-17 The Perkin-Elmer Corporation Magnetic lens
JPH05198490A (en) * 1992-01-22 1993-08-06 Fujitsu Ltd Charged-particle beam exposure system
JP3174796B2 (en) * 1992-06-22 2001-06-11 富士通株式会社 Charged particle beam apparatus and control method thereof

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0689850A (en) * 1992-09-09 1994-03-29 Fujitsu Ltd Electron beam aligner
JPH06204127A (en) * 1993-01-07 1994-07-22 Fujitsu Ltd Determining method of heat compensation current in charged particle beam aligner

Also Published As

Publication number Publication date
GB2405524A (en) 2005-03-02
JP2005079092A (en) 2005-03-24
GB0320292D0 (en) 2003-10-01
DE102004035012A1 (en) 2005-03-31

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Legal Events

Date Code Title Description
732E Amendments to the register in respect of changes of name or changes affecting rights (sect. 32/1977)

Free format text: REGISTERED BETWEEN 20121004 AND 20121010

PCNP Patent ceased through non-payment of renewal fee

Effective date: 20120829