JPS4847265A - - Google Patents
Info
- Publication number
- JPS4847265A JPS4847265A JP8088871A JP8088871A JPS4847265A JP S4847265 A JPS4847265 A JP S4847265A JP 8088871 A JP8088871 A JP 8088871A JP 8088871 A JP8088871 A JP 8088871A JP S4847265 A JPS4847265 A JP S4847265A
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8088871A JPS4847265A (en) | 1971-10-15 | 1971-10-15 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8088871A JPS4847265A (en) | 1971-10-15 | 1971-10-15 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS4847265A true JPS4847265A (en) | 1973-07-05 |
Family
ID=13730873
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP8088871A Pending JPS4847265A (en) | 1971-10-15 | 1971-10-15 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS4847265A (en) |
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5129939A (en) * | 1974-05-24 | 1976-03-13 | Texas Instruments Inc | |
| JPS5755043A (en) * | 1980-08-11 | 1982-04-01 | Perkin Elmer Corp | Magnetic lens |
| JPS57151160A (en) * | 1981-03-16 | 1982-09-18 | Internatl Precision Inc | Electron lens |
| JPS5941853U (en) * | 1982-09-01 | 1984-03-17 | 日本電子株式会社 | electronic lens |
| JP2005079092A (en) * | 2003-08-29 | 2005-03-24 | Leica Microsystems Lithography Ltd | Heat compensation in magnetic field influencing of electron beam |
| JP2006210035A (en) * | 2005-01-26 | 2006-08-10 | Hitachi High-Technologies Corp | Electron lens and charged particle beam device using it |
| WO2013015311A1 (en) * | 2011-07-26 | 2013-01-31 | 株式会社日立ハイテクノロジーズ | Electromagnetic lens and charged particle device |
-
1971
- 1971-10-15 JP JP8088871A patent/JPS4847265A/ja active Pending
Cited By (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5129939A (en) * | 1974-05-24 | 1976-03-13 | Texas Instruments Inc | |
| JPS5755043A (en) * | 1980-08-11 | 1982-04-01 | Perkin Elmer Corp | Magnetic lens |
| JPH0419664B2 (en) * | 1980-08-11 | 1992-03-31 | Perkin Elmer Corp | |
| JPS57151160A (en) * | 1981-03-16 | 1982-09-18 | Internatl Precision Inc | Electron lens |
| JPS6338825B2 (en) * | 1981-03-16 | 1988-08-02 | Akashi Seisakusho Kk | |
| JPS5941853U (en) * | 1982-09-01 | 1984-03-17 | 日本電子株式会社 | electronic lens |
| JP2005079092A (en) * | 2003-08-29 | 2005-03-24 | Leica Microsystems Lithography Ltd | Heat compensation in magnetic field influencing of electron beam |
| JP2006210035A (en) * | 2005-01-26 | 2006-08-10 | Hitachi High-Technologies Corp | Electron lens and charged particle beam device using it |
| JP4676209B2 (en) * | 2005-01-26 | 2011-04-27 | 株式会社日立ハイテクノロジーズ | Electron lens and charged particle beam apparatus using the same |
| WO2013015311A1 (en) * | 2011-07-26 | 2013-01-31 | 株式会社日立ハイテクノロジーズ | Electromagnetic lens and charged particle device |
| JP2013030276A (en) * | 2011-07-26 | 2013-02-07 | Hitachi High-Technologies Corp | Electromagnetic lens and charged particle device |