GB2366766B - Method for reactive ion etching - Google Patents
Method for reactive ion etchingInfo
- Publication number
- GB2366766B GB2366766B GB0128508A GB0128508A GB2366766B GB 2366766 B GB2366766 B GB 2366766B GB 0128508 A GB0128508 A GB 0128508A GB 0128508 A GB0128508 A GB 0128508A GB 2366766 B GB2366766 B GB 2366766B
- Authority
- GB
- United Kingdom
- Prior art keywords
- reactive ion
- ion etching
- etching
- reactive
- ion
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y25/00—Nanomagnetism, e.g. magnetoimpedance, anisotropic magnetoresistance, giant magnetoresistance or tunneling magnetoresistance
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y40/00—Manufacture or treatment of nanostructures
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
- H01F41/00—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties
- H01F41/14—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates
- H01F41/30—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates for applying nanostructures, e.g. by molecular beam epitaxy [MBE]
- H01F41/302—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates for applying nanostructures, e.g. by molecular beam epitaxy [MBE] for applying spin-exchange-coupled multilayers, e.g. nanostructured superlattices
- H01F41/308—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates for applying nanostructures, e.g. by molecular beam epitaxy [MBE] for applying spin-exchange-coupled multilayers, e.g. nanostructured superlattices lift-off processes, e.g. ion milling, for trimming or patterning
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
- H01F41/00—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties
- H01F41/32—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying conductive, insulating or magnetic material on a magnetic film, specially adapted for a thin magnetic film
- H01F41/34—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying conductive, insulating or magnetic material on a magnetic film, specially adapted for a thin magnetic film in patterns, e.g. by lithography
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/127—Structure or manufacture of heads, e.g. inductive
- G11B5/31—Structure or manufacture of heads, e.g. inductive using thin films
- G11B5/3163—Fabrication methods or processes specially adapted for a particular head structure, e.g. using base layers for electroplating, using functional layers for masking, using energy or particle beams for shaping the structure or modifying the properties of the basic layers
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Nanotechnology (AREA)
- Crystallography & Structural Chemistry (AREA)
- Power Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Drying Of Semiconductors (AREA)
- ing And Chemical Polishing (AREA)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP09256636A JP3131595B2 (en) | 1997-09-22 | 1997-09-22 | Mask for reactive ion etching |
JP09256635A JP3131594B2 (en) | 1997-09-22 | 1997-09-22 | Reactive ion etching equipment |
GB9820639.4A GB2331273B8 (en) | 1997-09-22 | 1998-09-22 | Method for reactive-ion etching and apparatus therefor |
Publications (4)
Publication Number | Publication Date |
---|---|
GB2366766A GB2366766A (en) | 2002-03-20 |
GB2366766B true GB2366766B (en) | 2002-05-15 |
GB2366766B8 GB2366766B8 (en) | 2016-06-22 |
GB2366766A8 GB2366766A8 (en) | 2016-06-22 |
Family
ID=27269487
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB0128508.9A Expired - Fee Related GB2366766B8 (en) | 1997-09-22 | 1998-09-22 | Method for reactive ion etching |
Country Status (1)
Country | Link |
---|---|
GB (1) | GB2366766B8 (en) |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH08253881A (en) * | 1995-03-15 | 1996-10-01 | Natl Res Inst For Metals | Dry etching method |
-
1998
- 1998-09-22 GB GB0128508.9A patent/GB2366766B8/en not_active Expired - Fee Related
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH08253881A (en) * | 1995-03-15 | 1996-10-01 | Natl Res Inst For Metals | Dry etching method |
Also Published As
Publication number | Publication date |
---|---|
GB2366766A (en) | 2002-03-20 |
GB2366766B8 (en) | 2016-06-22 |
GB2366766A8 (en) | 2016-06-22 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
S117 | Correction of errors in patents and applications (sect. 117/patents act 1977) |
Free format text: REQUEST FILED; REQUEST FOR CORRECTION UNDER SECTION 117 FILED ON 18 APRIL 2016. |
|
S117 | Correction of errors in patents and applications (sect. 117/patents act 1977) |
Free format text: CORRECTIONS ALLOWED; REQUEST FOR CORRECTION UNDER SECTION 117 FILED ON 18 APRIL 2016, ALLOWED ON 15 JUNE 2016. |
|
PCNP | Patent ceased through non-payment of renewal fee |
Effective date: 20160922 |