GB2345882B - Method for fabricating microactuator for inkjet head - Google Patents

Abstract

Initially, a lower electrode 3 (Fig.10A) and an oxide piezoelectric sheet 4 is laminated over a vibrating plate 2 with an integral chamber plate 1. A photoresist film is coated over the upper surface of the piezoelectric sheet. Some film is removed through baking and exposure of light via a patterned mask. The oxide piezoelectric sheet is etched, using the remaining film as a mask, to form oxide piezoelectric elements of a predetermined pattern. The resulting structure is rinsed to remove the film completely. An electrode layer (Fig.10B) is coated to a predetermined thickness over the entire exposed upper surface of the structure, i.e. the upper surfaces of the oxide piezoelectric elements, and the exposed upper surface portions of the lower electrode. Another photoresist film 6 (Fig.10C) is coated over an upper surface of the electrode layer, and portions thereof not covering the oxide piezoelectric elements are removed by rinsing (Fig.10D). Unnecessary portions of the electrode layer are removed by etching while using the second film remaining on the electrode layer as a mask to form upper electrodes 5 (Fig.10E). The photoresist film left on the upper electrodes is completely removed (Fig.10F) to form the microactuator. Several other methods of forming the microactuator are disclosed (Figs. 1A-9D,Figs.11A-12D). For example, the chamber plate maybe etched and patterned to form chambers therein following the formation of the oxide piezoelectric elements (Figs.3A-D).