GB2327513B - Power control apparatus for an ion source having an indirectly heated cathode - Google Patents
Power control apparatus for an ion source having an indirectly heated cathodeInfo
- Publication number
- GB2327513B GB2327513B GB9714990A GB9714990A GB2327513B GB 2327513 B GB2327513 B GB 2327513B GB 9714990 A GB9714990 A GB 9714990A GB 9714990 A GB9714990 A GB 9714990A GB 2327513 B GB2327513 B GB 2327513B
- Authority
- GB
- United Kingdom
- Prior art keywords
- control apparatus
- power control
- ion source
- indirectly heated
- heated cathode
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J27/00—Ion beam tubes
- H01J27/02—Ion sources; Ion guns
- H01J27/08—Ion sources; Ion guns using arc discharge
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Combustion & Propulsion (AREA)
- Electron Sources, Ion Sources (AREA)
- Plasma Technology (AREA)
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB9714990A GB2327513B (en) | 1997-07-16 | 1997-07-16 | Power control apparatus for an ion source having an indirectly heated cathode |
PCT/GB1998/002075 WO1999004409A1 (fr) | 1997-07-16 | 1998-07-14 | Appareil de commande de puissance pour source d'ions possedant une cathode rechauffee indirectement |
JP2000503540A JP4054525B2 (ja) | 1997-07-16 | 1998-07-14 | 間接加熱される陰極を有するイオン源の出力制御装置 |
EP98933797A EP0995215A1 (fr) | 1997-07-16 | 1998-07-14 | Appareil de commande de puissance pour source d'ions possedant une cathode rechauffee indirectement |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB9714990A GB2327513B (en) | 1997-07-16 | 1997-07-16 | Power control apparatus for an ion source having an indirectly heated cathode |
Publications (3)
Publication Number | Publication Date |
---|---|
GB9714990D0 GB9714990D0 (en) | 1997-09-24 |
GB2327513A GB2327513A (en) | 1999-01-27 |
GB2327513B true GB2327513B (en) | 2001-10-24 |
Family
ID=10815952
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB9714990A Expired - Fee Related GB2327513B (en) | 1997-07-16 | 1997-07-16 | Power control apparatus for an ion source having an indirectly heated cathode |
Country Status (4)
Country | Link |
---|---|
EP (1) | EP0995215A1 (fr) |
JP (1) | JP4054525B2 (fr) |
GB (1) | GB2327513B (fr) |
WO (1) | WO1999004409A1 (fr) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7276847B2 (en) | 2000-05-17 | 2007-10-02 | Varian Semiconductor Equipment Associates, Inc. | Cathode assembly for indirectly heated cathode ion source |
US6777686B2 (en) * | 2000-05-17 | 2004-08-17 | Varian Semiconductor Equipment Associates, Inc. | Control system for indirectly heated cathode ion source |
US7138768B2 (en) | 2002-05-23 | 2006-11-21 | Varian Semiconductor Equipment Associates, Inc. | Indirectly heated cathode ion source |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0215626A2 (fr) * | 1985-09-09 | 1987-03-25 | Applied Materials, Inc. | Dispositifs et procédés de contrôle de la source d'ions dans les implanteurs ioniques |
US5097179A (en) * | 1990-01-30 | 1992-03-17 | Tokyo Electron Limited | Ion generating apparatus |
US5497006A (en) * | 1994-11-15 | 1996-03-05 | Eaton Corporation | Ion generating source for use in an ion implanter |
JPH08106872A (ja) * | 1994-10-05 | 1996-04-23 | Nissin Electric Co Ltd | イオン源 |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE2325786C2 (de) * | 1973-05-22 | 1983-10-06 | Leybold-Heraeus Gmbh, 5000 Koeln | Schaltung zur Regelung der Betriebsparameter eines Elektronenstrahlerzeugers |
US4506160A (en) * | 1982-05-24 | 1985-03-19 | Tokyo Shibaura Denki Kabushiki Kaisha | Ion source apparatus |
-
1997
- 1997-07-16 GB GB9714990A patent/GB2327513B/en not_active Expired - Fee Related
-
1998
- 1998-07-14 JP JP2000503540A patent/JP4054525B2/ja not_active Expired - Lifetime
- 1998-07-14 WO PCT/GB1998/002075 patent/WO1999004409A1/fr active Application Filing
- 1998-07-14 EP EP98933797A patent/EP0995215A1/fr not_active Withdrawn
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0215626A2 (fr) * | 1985-09-09 | 1987-03-25 | Applied Materials, Inc. | Dispositifs et procédés de contrôle de la source d'ions dans les implanteurs ioniques |
US5097179A (en) * | 1990-01-30 | 1992-03-17 | Tokyo Electron Limited | Ion generating apparatus |
JPH08106872A (ja) * | 1994-10-05 | 1996-04-23 | Nissin Electric Co Ltd | イオン源 |
US5497006A (en) * | 1994-11-15 | 1996-03-05 | Eaton Corporation | Ion generating source for use in an ion implanter |
Non-Patent Citations (1)
Title |
---|
WPI Abstract Accession No 96-257020 26 & JP 08 106 872 A * |
Also Published As
Publication number | Publication date |
---|---|
WO1999004409A1 (fr) | 1999-01-28 |
EP0995215A1 (fr) | 2000-04-26 |
JP4054525B2 (ja) | 2008-02-27 |
GB9714990D0 (en) | 1997-09-24 |
JP2001510928A (ja) | 2001-08-07 |
GB2327513A (en) | 1999-01-27 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PCNP | Patent ceased through non-payment of renewal fee |
Effective date: 20090716 |