GB2321316A8 - Forming a pattern on a semiconductor substrate including heating or cooling the substrate to adjust its size - Google Patents

Forming a pattern on a semiconductor substrate including heating or cooling the substrate to adjust its size

Info

Publication number
GB2321316A8
GB2321316A8 GB9800991A GB9800991A GB2321316A8 GB 2321316 A8 GB2321316 A8 GB 2321316A8 GB 9800991 A GB9800991 A GB 9800991A GB 9800991 A GB9800991 A GB 9800991A GB 2321316 A8 GB2321316 A8 GB 2321316A8
Authority
GB
United Kingdom
Prior art keywords
adjust
cooling
pattern
forming
size
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
GB9800991A
Other versions
GB2321316B (en
GB2321316A (en
GB9800991D0 (en
Inventor
Takeo Hashimoto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp filed Critical NEC Corp
Publication of GB9800991D0 publication Critical patent/GB9800991D0/en
Publication of GB2321316A publication Critical patent/GB2321316A/en
Application granted granted Critical
Publication of GB2321316B publication Critical patent/GB2321316B/en
Publication of GB2321316A8 publication Critical patent/GB2321316A8/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70866—Environment aspects, e.g. pressure of beam-path gas, temperature of mask or workpiece
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70866—Environment aspects, e.g. pressure of beam-path gas, temperature of mask or workpiece
    • G03F7/70875—Temperature, e.g. temperature control of masks or workpieces via control of stage temperature
GB9800991A 1997-01-16 1998-01-16 Light exposure method and light exposure device Expired - Fee Related GB2321316B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9005375A JPH10208994A (en) 1997-01-16 1997-01-16 Alignment method and aligner

Publications (4)

Publication Number Publication Date
GB9800991D0 GB9800991D0 (en) 1998-03-11
GB2321316A GB2321316A (en) 1998-07-22
GB2321316B GB2321316B (en) 2001-06-20
GB2321316A8 true GB2321316A8 (en) 2001-08-30

Family

ID=11609435

Family Applications (1)

Application Number Title Priority Date Filing Date
GB9800991A Expired - Fee Related GB2321316B (en) 1997-01-16 1998-01-16 Light exposure method and light exposure device

Country Status (3)

Country Link
JP (1) JPH10208994A (en)
KR (1) KR100289674B1 (en)
GB (1) GB2321316B (en)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH11307430A (en) * 1998-04-23 1999-11-05 Canon Inc Aligner, manufacture of device, and drive
KR100493379B1 (en) * 2001-12-27 2005-06-07 엘지.필립스 엘시디 주식회사 Liquid crystal display device and method for manufacturing the same
JP4085147B2 (en) 2002-10-11 2008-05-14 スパンション エルエルシー Semiconductor device manufacturing method and manufacturing apparatus
EP1513017A1 (en) 2003-09-04 2005-03-09 ASML Netherlands B.V. Lithographic apparatus and device manufacturing method
EP1513021B1 (en) * 2003-09-04 2007-10-03 ASML Netherlands B.V. Lithographic apparatus and a method of compensating for thermal deformation in a lithographic apparatus
KR101579361B1 (en) 2004-02-04 2015-12-21 가부시키가이샤 니콘 Exposure apparatus, exposure method, and device producing method
US7561251B2 (en) * 2004-03-29 2009-07-14 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7830493B2 (en) 2005-10-04 2010-11-09 Asml Netherlands B.V. System and method for compensating for radiation induced thermal distortions in a substrate or projection system
US7924408B2 (en) * 2007-02-23 2011-04-12 Kla-Tencor Technologies Corporation Temperature effects on overlay accuracy
US20090042139A1 (en) * 2007-04-10 2009-02-12 Nikon Corporation Exposure method and electronic device manufacturing method
KR101504388B1 (en) * 2008-06-26 2015-03-19 가부시키가이샤 니콘 Method and apparatus for manufacturing display element
US10775707B2 (en) 2016-10-07 2020-09-15 Asml Netherlands B.V. Lithographic apparatus and method

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1578259A (en) * 1977-05-11 1980-11-05 Philips Electronic Associated Methods of manufacturing solid-state devices apparatus for use therein and devices manufactured thereby
JPS60158626A (en) * 1984-01-30 1985-08-20 Canon Inc Semiconductor exposure device

Also Published As

Publication number Publication date
KR19980070574A (en) 1998-10-26
JPH10208994A (en) 1998-08-07
GB2321316B (en) 2001-06-20
GB2321316A (en) 1998-07-22
GB9800991D0 (en) 1998-03-11
KR100289674B1 (en) 2001-07-12

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Legal Events

Date Code Title Description
711B Application made for correction of error (sect. 117/77)
732E Amendments to the register in respect of changes of name or changes affecting rights (sect. 32/1977)
PCNP Patent ceased through non-payment of renewal fee

Effective date: 20040116