GB2303564B - Semiconductor device manufacturing apparatus and manufacturing method - Google Patents

Semiconductor device manufacturing apparatus and manufacturing method

Info

Publication number
GB2303564B
GB2303564B GB9522520A GB9522520A GB2303564B GB 2303564 B GB2303564 B GB 2303564B GB 9522520 A GB9522520 A GB 9522520A GB 9522520 A GB9522520 A GB 9522520A GB 2303564 B GB2303564 B GB 2303564B
Authority
GB
United Kingdom
Prior art keywords
manufacturing
semiconductor device
manufacturing apparatus
device manufacturing
semiconductor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
GB9522520A
Other languages
English (en)
Other versions
GB9522520D0 (en
GB2303564A (en
Inventor
Jang-Hoon Kim
Dong-Heui Jang
Sang-Kap Kim
Jeong-Yeal Kim
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Samsung Electronics Co Ltd
Original Assignee
Samsung Electronics Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Samsung Electronics Co Ltd filed Critical Samsung Electronics Co Ltd
Publication of GB9522520D0 publication Critical patent/GB9522520D0/en
Publication of GB2303564A publication Critical patent/GB2303564A/en
Application granted granted Critical
Publication of GB2303564B publication Critical patent/GB2303564B/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D19/00—Degasification of liquids
    • B01D19/0031—Degasification of liquids by filtration
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/3021—Imagewise removal using liquid means from a wafer supported on a rotating chuck

Landscapes

  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Power Engineering (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Degasification And Air Bubble Elimination (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
GB9522520A 1995-07-26 1995-11-03 Semiconductor device manufacturing apparatus and manufacturing method Expired - Fee Related GB2303564B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1019950022313A KR970008315A (ko) 1995-07-26 1995-07-26 반도체장치

Publications (3)

Publication Number Publication Date
GB9522520D0 GB9522520D0 (en) 1996-01-03
GB2303564A GB2303564A (en) 1997-02-26
GB2303564B true GB2303564B (en) 1998-12-30

Family

ID=19421660

Family Applications (1)

Application Number Title Priority Date Filing Date
GB9522520A Expired - Fee Related GB2303564B (en) 1995-07-26 1995-11-03 Semiconductor device manufacturing apparatus and manufacturing method

Country Status (5)

Country Link
JP (1) JPH0945615A (de)
KR (1) KR970008315A (de)
DE (1) DE19540010A1 (de)
GB (1) GB2303564B (de)
TW (1) TW376528B (de)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW535216B (en) * 1996-09-13 2003-06-01 Tokyo Electron Ltd Photoresist processing method and photoresist processing system
DE10345379B3 (de) * 2003-09-30 2005-06-02 Advanced Micro Devices, Inc., Sunnyvale Vorratstank für Prozessflüssigkeiten mit einer reduzierten Menge an Blasen und Verfahren zum Betreiben desselben
DE102005004361B4 (de) 2005-01-31 2006-12-07 Advanced Micro Devices, Inc., Sunnyvale Vorrichtung und Verfahren zum Entfernen von Blasen aus einer Prozessflüssigkeit
KR101262410B1 (ko) 2005-04-25 2013-05-08 엔테그리스, 아이엔씨. 미소 기포를 감소시키도록 유체를 처리하는 방법 및 장치
JP5967045B2 (ja) * 2013-10-02 2016-08-10 東京エレクトロン株式会社 処理液供給装置及び処理液供給方法

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2222099A (en) * 1988-08-12 1990-02-28 Japan Gore Tex Inc Degassing device.
EP0572035A2 (de) * 1992-05-28 1993-12-01 Ebara Corporation Anlage für die Herstellung von Reinigungswasser
WO1994003397A1 (en) * 1992-08-07 1994-02-17 Miura Co., Ltd. Improvement to membrane type deaerator
EP0598424A2 (de) * 1992-11-16 1994-05-25 Novellus Systems, Inc. Vorrichtung zur Entfernung von gelösten Gasen aus einer Flüssigkeit
EP0622475A1 (de) * 1993-04-29 1994-11-02 Applied Materials, Inc. Verfahren und Vorrichtung zum Entgasen einer Flüssigkeit zum Herstellen einer Halbleiter
JPH0745001B2 (ja) * 1990-09-11 1995-05-17 シーケーディ株式会社 液体供給装置及び脱泡方法

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2222099A (en) * 1988-08-12 1990-02-28 Japan Gore Tex Inc Degassing device.
JPH0745001B2 (ja) * 1990-09-11 1995-05-17 シーケーディ株式会社 液体供給装置及び脱泡方法
EP0572035A2 (de) * 1992-05-28 1993-12-01 Ebara Corporation Anlage für die Herstellung von Reinigungswasser
WO1994003397A1 (en) * 1992-08-07 1994-02-17 Miura Co., Ltd. Improvement to membrane type deaerator
EP0598424A2 (de) * 1992-11-16 1994-05-25 Novellus Systems, Inc. Vorrichtung zur Entfernung von gelösten Gasen aus einer Flüssigkeit
EP0622475A1 (de) * 1993-04-29 1994-11-02 Applied Materials, Inc. Verfahren und Vorrichtung zum Entgasen einer Flüssigkeit zum Herstellen einer Halbleiter

Non-Patent Citations (2)

* Cited by examiner, † Cited by third party
Title
WPI Accession No. 92-409487/199250 & JP 07045001 B *
WPI Accession No. 94-065529/199408 & WO 9403397 A1 *

Also Published As

Publication number Publication date
TW376528B (en) 1999-12-11
JPH0945615A (ja) 1997-02-14
DE19540010A1 (de) 1997-01-30
GB9522520D0 (en) 1996-01-03
GB2303564A (en) 1997-02-26
KR970008315A (ko) 1997-02-24

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Legal Events

Date Code Title Description
PCNP Patent ceased through non-payment of renewal fee

Effective date: 19991103