GB2244285B - Phosphide films - Google Patents
Phosphide filmsInfo
- Publication number
- GB2244285B GB2244285B GB9109603A GB9109603A GB2244285B GB 2244285 B GB2244285 B GB 2244285B GB 9109603 A GB9109603 A GB 9109603A GB 9109603 A GB9109603 A GB 9109603A GB 2244285 B GB2244285 B GB 2244285B
- Authority
- GB
- United Kingdom
- Prior art keywords
- phosphide films
- phosphide
- films
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32623—Mechanical discharge control means
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
- C23C16/505—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using radio frequency discharges
- C23C16/509—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using radio frequency discharges using internal electrodes
- C23C16/5096—Flat-bed apparatus
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
- C23C16/515—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using pulsed discharges
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32532—Electrodes
- H01J37/3255—Material
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB909010000A GB9010000D0 (en) | 1990-05-03 | 1990-05-03 | Phosphide films |
Publications (3)
Publication Number | Publication Date |
---|---|
GB9109603D0 GB9109603D0 (en) | 1991-07-17 |
GB2244285A GB2244285A (en) | 1991-11-27 |
GB2244285B true GB2244285B (en) | 1994-01-26 |
Family
ID=10675435
Family Applications (3)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB909010000A Pending GB9010000D0 (en) | 1990-05-03 | 1990-05-03 | Phosphide films |
GB9109602A Expired - Fee Related GB2244721B (en) | 1990-05-03 | 1991-05-03 | Plasma processing apparatus |
GB9109603A Expired - Fee Related GB2244285B (en) | 1990-05-03 | 1991-05-03 | Phosphide films |
Family Applications Before (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB909010000A Pending GB9010000D0 (en) | 1990-05-03 | 1990-05-03 | Phosphide films |
GB9109602A Expired - Fee Related GB2244721B (en) | 1990-05-03 | 1991-05-03 | Plasma processing apparatus |
Country Status (1)
Country | Link |
---|---|
GB (3) | GB9010000D0 (en) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB9414905D0 (en) * | 1994-07-23 | 1994-09-21 | Barr & Stroud Ltd | Protective coatings for optical components |
US6182604B1 (en) * | 1999-10-27 | 2001-02-06 | Varian Semiconductor Equipment Associates, Inc. | Hollow cathode for plasma doping system |
CN105714274A (en) * | 2016-03-31 | 2016-06-29 | 成都西沃克真空科技有限公司 | Plasma enhanced chemical vapor deposition equipment and film manufacturing method |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB2105729A (en) * | 1981-09-15 | 1983-03-30 | Itt Ind Ltd | Surface processing of a substrate material |
GB2113663A (en) * | 1981-12-30 | 1983-08-10 | Stauffer Chemical Co | Catenated phosphorus material |
EP0184917A1 (en) * | 1984-12-13 | 1986-06-18 | Stc Plc | Plasma reactor vessel and process |
GB2223510A (en) * | 1988-09-08 | 1990-04-11 | Barr & Stroud Ltd | Infra-red transmitting optical components and optical coating therefor |
GB2224390A (en) * | 1988-10-26 | 1990-05-02 | Intel Corp | Pulsed dual radio frequency cvd process |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS53112066A (en) * | 1977-03-11 | 1978-09-30 | Fujitsu Ltd | Plasma treatment apparatus |
US4287851A (en) * | 1980-01-16 | 1981-09-08 | Dozier Alfred R | Mounting and excitation system for reaction in the plasma state |
FR2538987A1 (en) * | 1983-01-05 | 1984-07-06 | Commissariat Energie Atomique | ENCLOSURE FOR THE TREATMENT AND PARTICULARLY THE ETCHING OF SUBSTRATES BY THE REACTIVE PLASMA METHOD |
US4661203A (en) * | 1985-06-28 | 1987-04-28 | Control Data Corporation | Low defect etching of patterns using plasma-stencil mask |
US4637853A (en) * | 1985-07-29 | 1987-01-20 | International Business Machines Corporation | Hollow cathode enhanced plasma for high rate reactive ion etching and deposition |
WO1988001435A1 (en) * | 1986-08-13 | 1988-02-25 | The Australian National University | Improvements in reactive ion etching apparatus |
US4799451A (en) * | 1987-02-20 | 1989-01-24 | Asm America, Inc. | Electrode boat apparatus for processing semiconductor wafers or the like |
DE3830430A1 (en) * | 1987-09-11 | 1989-03-23 | Japan Synthetic Rubber Co Ltd | METHOD FOR PRODUCING COVERS |
-
1990
- 1990-05-03 GB GB909010000A patent/GB9010000D0/en active Pending
-
1991
- 1991-05-03 GB GB9109602A patent/GB2244721B/en not_active Expired - Fee Related
- 1991-05-03 GB GB9109603A patent/GB2244285B/en not_active Expired - Fee Related
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB2105729A (en) * | 1981-09-15 | 1983-03-30 | Itt Ind Ltd | Surface processing of a substrate material |
GB2113663A (en) * | 1981-12-30 | 1983-08-10 | Stauffer Chemical Co | Catenated phosphorus material |
EP0184917A1 (en) * | 1984-12-13 | 1986-06-18 | Stc Plc | Plasma reactor vessel and process |
GB2223510A (en) * | 1988-09-08 | 1990-04-11 | Barr & Stroud Ltd | Infra-red transmitting optical components and optical coating therefor |
GB2224390A (en) * | 1988-10-26 | 1990-05-02 | Intel Corp | Pulsed dual radio frequency cvd process |
Also Published As
Publication number | Publication date |
---|---|
GB2244285A (en) | 1991-11-27 |
GB9109603D0 (en) | 1991-07-17 |
GB2244721A (en) | 1991-12-11 |
GB9010000D0 (en) | 1990-06-27 |
GB9109602D0 (en) | 1991-06-26 |
GB2244721B (en) | 1993-05-19 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PCNP | Patent ceased through non-payment of renewal fee |
Effective date: 20050503 |