GB2200766A - X-ray reflective mask and system for image formation with use of the same - Google Patents

X-ray reflective mask and system for image formation with use of the same

Info

Publication number
GB2200766A
GB2200766A GB08727566A GB8727566A GB2200766A GB 2200766 A GB2200766 A GB 2200766A GB 08727566 A GB08727566 A GB 08727566A GB 8727566 A GB8727566 A GB 8727566A GB 2200766 A GB2200766 A GB 2200766A
Authority
GB
United Kingdom
Prior art keywords
same
image formation
reflective mask
ray reflective
ray
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
GB08727566A
Other versions
GB8727566D0 (en
GB2200766B (en
Inventor
Kenji Iwahashi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shimadzu Corp
Original Assignee
Shimadzu Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP61071970A external-priority patent/JPS62229836A/en
Priority claimed from JP61074695A external-priority patent/JPS62230022A/en
Application filed by Shimadzu Corp filed Critical Shimadzu Corp
Priority claimed from PCT/JP1987/000177 external-priority patent/WO1987006028A2/en
Publication of GB8727566D0 publication Critical patent/GB8727566D0/en
Publication of GB2200766A publication Critical patent/GB2200766A/en
Application granted granted Critical
Publication of GB2200766B publication Critical patent/GB2200766B/en
Expired legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/22—Masks or mask blanks for imaging by radiation of 100nm or shorter wavelength, e.g. X-ray masks, extreme ultraviolet [EUV] masks; Preparation thereof
    • G03F1/24—Reflection masks; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2037—Exposure with X-ray radiation or corpuscular radiation, through a mask with a pattern opaque to that radiation
    • G03F7/2039—X-ray radiation
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70283—Mask effects on the imaging process
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70316—Details of optical elements, e.g. of Bragg reflectors, extreme ultraviolet [EUV] multilayer or bilayer mirrors or diffractive optical elements

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Nanotechnology (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Mathematical Physics (AREA)
  • Theoretical Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
GB8727566A 1986-03-28 1987-03-24 A system for x-ray projection using a reflective mask Expired GB2200766B (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP61071970A JPS62229836A (en) 1986-03-28 1986-03-28 Reflection type x-ray mask
JP61074695A JPS62230022A (en) 1986-03-31 1986-03-31 X-ray projection exposure device
PCT/JP1987/000177 WO1987006028A2 (en) 1986-03-28 1987-03-24 X-ray reflective mask and system for image formation with use of the same

Publications (3)

Publication Number Publication Date
GB8727566D0 GB8727566D0 (en) 1987-12-31
GB2200766A true GB2200766A (en) 1988-08-10
GB2200766B GB2200766B (en) 1990-03-07

Family

ID=27300823

Family Applications (1)

Application Number Title Priority Date Filing Date
GB8727566A Expired GB2200766B (en) 1986-03-28 1987-03-24 A system for x-ray projection using a reflective mask

Country Status (1)

Country Link
GB (1) GB2200766B (en)

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2911848A1 (en) * 1978-03-27 1979-10-04 Vlsi Technology Res Ass ARRANGEMENT FOR THE FORMATION OF PATTERNS
EP0055077A2 (en) * 1980-12-23 1982-06-30 Kabushiki Kaisha Toshiba System for transferring a fine pattern onto a target
JPS60173551A (en) * 1984-02-20 1985-09-06 Hideki Matsumura Pattern transferring method by reflecting projection of light such as x rays or the like

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2911848A1 (en) * 1978-03-27 1979-10-04 Vlsi Technology Res Ass ARRANGEMENT FOR THE FORMATION OF PATTERNS
EP0055077A2 (en) * 1980-12-23 1982-06-30 Kabushiki Kaisha Toshiba System for transferring a fine pattern onto a target
JPS60173551A (en) * 1984-02-20 1985-09-06 Hideki Matsumura Pattern transferring method by reflecting projection of light such as x rays or the like

Non-Patent Citations (3)

* Cited by examiner, † Cited by third party
Title
APPLIED PHYSICS LETTERS, VOLUME 45, NO. 1, 1 JULY 1984, AMERICAN INSTITUTE OF PHYSICS, (NEW YORK, US) PAGES 3-5 *
IBM TECHNICAL DISCLOSURE BULLETIN, VOLUME 16, NO. 9 FEBRUARY 1974, PAGES 3121-3122 *
PATENT ABSTRACTS OF JAPAN, VOLUME 10, NO. 19 (P-423)(2076), 24 JANUARY 1986; & JP-A-60 173 551, 6 SEPTEMBER 1985 *

Also Published As

Publication number Publication date
GB8727566D0 (en) 1987-12-31
GB2200766B (en) 1990-03-07

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Legal Events

Date Code Title Description
PCNP Patent ceased through non-payment of renewal fee

Effective date: 19960324