GB2198283A - Laser apparatus - Google Patents

Laser apparatus Download PDF

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Publication number
GB2198283A
GB2198283A GB08727413A GB8727413A GB2198283A GB 2198283 A GB2198283 A GB 2198283A GB 08727413 A GB08727413 A GB 08727413A GB 8727413 A GB8727413 A GB 8727413A GB 2198283 A GB2198283 A GB 2198283A
Authority
GB
United Kingdom
Prior art keywords
buffer gas
reservoir
laser
pressure
gas
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
GB08727413A
Other versions
GB2198283B (en
GB8727413D0 (en
Inventor
Hugh Menown
Arthur Maitland
Graeme Lawrence Clark
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Teledyne UK Ltd
Original Assignee
English Electric Valve Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from GB868627928A external-priority patent/GB8627928D0/en
Application filed by English Electric Valve Co Ltd filed Critical English Electric Valve Co Ltd
Priority to GB8727413A priority Critical patent/GB2198283B/en
Publication of GB8727413D0 publication Critical patent/GB8727413D0/en
Publication of GB2198283A publication Critical patent/GB2198283A/en
Application granted granted Critical
Publication of GB2198283B publication Critical patent/GB2198283B/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/02Constructional details
    • H01S3/03Constructional details of gas laser discharge tubes
    • H01S3/036Means for obtaining or maintaining the desired gas pressure within the tube, e.g. by gettering, replenishing; Means for circulating the gas, e.g. for equalising the pressure within the tube
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/02Constructional details
    • H01S3/03Constructional details of gas laser discharge tubes
    • H01S3/031Metal vapour lasers, e.g. metal vapour generation

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  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Optics & Photonics (AREA)
  • Lasers (AREA)

Abstract

Laser apparatus includes hydrogen or deuterium buffer gas and dispenser reservoirs 6 and 7 containing a hydride or deutride respectively. As gas molecules from the buffer gas are lost within the discharge tube 1 due to trapping and sputtering processes, hydrogen or deuterium is given off from the surfaces of the reservoirs 6 and 7 to maintain the vapour pressure within the discharge tube 1 at a substantially constant level. There is dynamic equilibrium between reservoir material and the buffer gas, and the pressure of the latter is less than one torr. The laser apparatus operates in a "sealed- off" mode, that is without requiring that buffer gas be flowed throught it. The active medium is a metallic vapour e.g. copper. <IMAGE>

Description

LASER APPARATUS This invention relates to laser apparatus and more particularly, but not exclusively, to metal vapour lasers.
Laser apparatus generally requires that, in addition to the material which is, or is to form, the laser active medium, a buffer gas is included in the discharge tube to enable sufficient gas pressure to be maintained for laser action to be possible. Typically, the buffer gas must be continuously pumped through the discharge tube so that contaminants are removed and gas pressure maintained against losses. The apparatus required to ensure that sufficient gas flows through the discharge tube is relatively complex and physically bulky, requiring external pumps, pipes and valves.
The present invention seeks to provide improved laser apparatus.
According to the invention, there is provided laser apparatus comprising a laser discharge tube containing hydrogen and/or deuterium buffer gas and a dispenser reservoir arranged such that in operation there is dynamic equilibrium between material of the reservoir and the buffer gas whereby buffer gas is replenished from the reservoir. Apparatus in accordance with the invention enables "sealed-off" operation to be achieved, that is, apparatus in which no flow-through of buffer gas is required since compensation may be made for gas losses suffered due to sputtering processes and trapping within the discharge tube by use of the reservoir. Thus, the laser apparatus may be made particularly compact and simple to operate because the need for external pumps, pipes and valves is avoided. It is also believed that by employing the invention, population inversion properties may be improved.The invention is particularly advantageously employed where the laser active medium is a metal vapour, such as copper or gold, because trapping is a significant process in such cases. Previously, it had not been considered desirable to use hydrogen or deuterium as a buffer gas within a laser discharge tube since these gases require pumping with higher power levels to achieve laser operation than is the case with neon, say. With apparatus in accordance with the invention, this power into the buffer gas remains within the discharge tube to heat it.
In practice, the desired pressure of the buffer gas is obtained by heating the material of the reservoir to a particular temperature to adjust the dynamic equilibrium. The surface of the material may be arranged to be open to the gas within the tube or the material could be wholly enclosed by a container, such as a thin-walled titanium vessel, through which gas molecules may pass, dynamic equilibrium thus being substantially unaffected by its presence. Most conveniently the pressure within the tube is arranged to be maintained substantially constant. It is preferred that the pressure of the buffer gas is low, being less than 1 torr,enabling the laser to be operated on the left hand side of the Paschen curve.
In an advantageous embodiment of the invention the dispenser reservoir comprises a container surrounding the material of the reservoir and means are included for passing a heating current through the container wall to maintain the material of the reservoir at a desired operating temperature. Alternatively, a heater may be located within the material of the reservoir to attain the operating temperature, and hence the required pressure within the tube. Where hydrogen is a buffer gas, the dispenser reservoir preferably includes a hydride, titanium hydride being particulary suitable, or, where deuterium is the buffer gas, a deutride or a mixture of these may be used if a mixture of buffer gas is employed.
Some ways in which the invention may be performed is now described by way of example with reference to the accompany drawing, in which: Figure 1 schematically illustrates laser apparatus in accordance with the invention; and Figure 2 shows part of another apparatus in accordance with the invention.
With reference to Figure 1, laser apparatus includes a laser discharge tube 1 which comprises a generally cylindrical quartz envelope 2 containing hydrogen buffer gas at a pressure of les than 1 torr, two electrodes 3 and 4 located at each end of the tube and copper metal pieces 5. In this embodiment of the invention, two dispenser reservoirs 6 and 7 are included, being located at respective ends of the tube 1. The reservoirs 6 and 7 comprise thin-walled titanium containers 8 and 9 respectively, which hold powdered titanium hydride 10. The containers 8 and 9 are connected in circuits 11 to provide a heating current through their walls.
The electrodes 3 and 4 are connected in parallel with a capacitor 12. A second capacitor 13 is included within the circuit, being connected in parallel with the first capacitor 12 but being isolated therefrom by a switch 14.
During operation of the laser apparatus, a large potential is applied at a terminal 15 to cause the second capacitor 13 to become charged. When charging is complete, the switch 14 is closed and the charge is transferred to the first capacitor 12. The voltage produced across the plates of the capacitor 12, and thus the electrodes 3 and 4 within the discharge tube 1, is sufficient to cause breakdown of the gas within the tube.
The discharge established within the envelope 2 between the electrodes 3 and 4 causes the copper 5 to become heated and to vaporise, forming the laser active medium.
Laser action occurs when sufficient vapour pressure is achieved, typically at about 0.5 to 1.0 torr.
When it is desired to operate the laser, the titanium hydride 10 of the dispenser reservoirs 6 and 7 is heated by means of the circuits 11 to a desired operating temperature, to set a chosen gas pressure within the tube 1. The structure of the titanium wall of the containers 8 and 9 is sufficiently open to allow substantially free passage through it to hydrogen molecules from the buffer gas and given off from the titanium hydride 10 when it is heated. Monitoring means may be included to determine the temperature of the titanium hydride 10 or the average pressure within the tube 1 and the heating current controlled accordingly to maintain the pressure at the desired value.
As laser operation continues, metal condenses from the vapour onto the inner surface of the envelope 2, causing gas molecules to become trapped at the surface, and hence vapour pressure within the envelope 2 is reduced. This is compensated for by an increased rate of evaporation of hydrogen from the surfaces of the reservoirs 6 and 7. Thus the desired vapour pressure is maintained and laser action may continue.
With reference to Figure 2, in another embodiment of the invention, laser apparatus which employs deuterium buffer gas also includes a plurality of dispenser reservoirs, one of which 16 is illustrated.
In this case, the material of the reservoir is tightly packed titanium deuteride 17, the surface of which is left open to the gas atmosphere within the laser discharge tube. Heating of the titanium deuteride 17 is accomplished by including a heater coil 18 within the material itself.

Claims (9)

1. Laser apparatus comprising a laser discharge tube containing hydrogen and/or deuterium buffer gas and a dispenser reservoir arranged such that in operation there is dynamic equilibrium between material of the reservoir and the buffer gas whereby buffer gas is replenished from the reservoir.
2. Apparatus as claimed in claim 1 wherein-the pressure within the tube is maintained substantially constant.
3. Apparatus as claimed in claim 1 or 2 wherein the buffer gas pressure is less than 1 torr.
4. Apparatus as claimed in claim 1, 2 or 3 wherein the dispenser reservoir comprises a container surrounding the material of the reservoir and means are included for passing a heating current through the container wall to maintain the material of the reservoir at a desired operating temperature.
5. Apparatus as claimed in claim 1, 2 or 3 wherein a heater is located in the material of the reservoir for heating the material to a desired operating temperature.
6. Apparatus as claimed in any preceding claim wherein the laser active medium is a metal vapour.
7. Apparatus as claimed in any preceding claim wherein, where the buffer gas is hydrogen, the material of the reservoir includes a hydride.
8. Apparatus as claimed in any of claims 1 to 6 wherein, where the buffer gas is deuterium, the material of the reservoir includes a deuteride.
9. Laser apparatus substantially as illustrated in and described with reference to the accompanying drawings.
GB8727413A 1986-11-21 1987-11-23 Laser apparatus Expired - Lifetime GB2198283B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
GB8727413A GB2198283B (en) 1986-11-21 1987-11-23 Laser apparatus

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
GB868627928A GB8627928D0 (en) 1986-11-21 1986-11-21 Laser apparatus
GB8727413A GB2198283B (en) 1986-11-21 1987-11-23 Laser apparatus

Publications (3)

Publication Number Publication Date
GB8727413D0 GB8727413D0 (en) 1987-12-23
GB2198283A true GB2198283A (en) 1988-06-08
GB2198283B GB2198283B (en) 1990-09-05

Family

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Family Applications (1)

Application Number Title Priority Date Filing Date
GB8727413A Expired - Lifetime GB2198283B (en) 1986-11-21 1987-11-23 Laser apparatus

Country Status (1)

Country Link
GB (1) GB2198283B (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2274541A (en) * 1993-01-20 1994-07-27 Eev Ltd Laser
GB2262184B (en) * 1991-11-07 1995-06-07 Mitsubishi Electric Corp Pulse laser apparatus

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB650260A (en) * 1948-12-31 1951-02-21 British Thomson Houston Co Ltd Improvements relating to electric discharge devices with hydrogen filling
GB771487A (en) * 1955-06-13 1957-04-03 M O Valve Co Ltd Improvements in or relating to gas reservoirs for use in gas filled enclosures
GB806945A (en) * 1955-05-26 1959-01-07 M O Valve Co Ltd Improvements in or relating to gas-filled electronic valves
GB850950A (en) * 1958-01-24 1960-10-12 Atomic Energy Authority Uk Apparatus for controlling gas pressure
US3742378A (en) * 1970-11-07 1973-06-26 Philips Corp Device for producing stimulated infrared emission an iraser by means of an electric discharge in a gas mixture which consists partly of carbon dioxide and discharge tube for such a device
EP0081081A1 (en) * 1981-12-08 1983-06-15 ELTRO GmbH Gesellschaft für Strahlungstechnik Process and apparatus for CO2 laser excitation
US4578618A (en) * 1979-06-23 1986-03-25 Hartmann & Braun Ag Low-pressure, hollow cathode lamp

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB650260A (en) * 1948-12-31 1951-02-21 British Thomson Houston Co Ltd Improvements relating to electric discharge devices with hydrogen filling
GB806945A (en) * 1955-05-26 1959-01-07 M O Valve Co Ltd Improvements in or relating to gas-filled electronic valves
GB771487A (en) * 1955-06-13 1957-04-03 M O Valve Co Ltd Improvements in or relating to gas reservoirs for use in gas filled enclosures
GB850950A (en) * 1958-01-24 1960-10-12 Atomic Energy Authority Uk Apparatus for controlling gas pressure
US3742378A (en) * 1970-11-07 1973-06-26 Philips Corp Device for producing stimulated infrared emission an iraser by means of an electric discharge in a gas mixture which consists partly of carbon dioxide and discharge tube for such a device
US4578618A (en) * 1979-06-23 1986-03-25 Hartmann & Braun Ag Low-pressure, hollow cathode lamp
EP0081081A1 (en) * 1981-12-08 1983-06-15 ELTRO GmbH Gesellschaft für Strahlungstechnik Process and apparatus for CO2 laser excitation

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2262184B (en) * 1991-11-07 1995-06-07 Mitsubishi Electric Corp Pulse laser apparatus
US5452317A (en) * 1991-11-07 1995-09-19 Mitsubishi Denki Kabushiki Kaisha Metal vapor laser apparatus
GB2274541A (en) * 1993-01-20 1994-07-27 Eev Ltd Laser
FR2700897A1 (en) * 1993-01-20 1994-07-29 Eev Ltd Metal vapor laser device.
US5450433A (en) * 1993-01-20 1995-09-12 English Electric Valve Company Limited Laser arrangement including effeciency improving gas reservoirs in thermal insulation
AU665139B2 (en) * 1993-01-20 1995-12-14 Eev Limited Laser arrangements
GB2274541B (en) * 1993-01-20 1996-03-27 Eev Ltd Laser arrangements

Also Published As

Publication number Publication date
GB2198283B (en) 1990-09-05
GB8727413D0 (en) 1987-12-23

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Legal Events

Date Code Title Description
PCNP Patent ceased through non-payment of renewal fee

Effective date: 19931123