GB2145539B - Optical preparation of molybdenum surfaces - Google Patents

Optical preparation of molybdenum surfaces

Info

Publication number
GB2145539B
GB2145539B GB08416974A GB8416974A GB2145539B GB 2145539 B GB2145539 B GB 2145539B GB 08416974 A GB08416974 A GB 08416974A GB 8416974 A GB8416974 A GB 8416974A GB 2145539 B GB2145539 B GB 2145539B
Authority
GB
United Kingdom
Prior art keywords
optical preparation
molybdenum surfaces
molybdenum
optical
preparation
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB08416974A
Other languages
English (en)
Other versions
GB2145539A (en
GB8416974D0 (en
Inventor
Manjin Jerome Kim
Dale Marius Brown
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
General Electric Co
Original Assignee
General Electric Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by General Electric Co filed Critical General Electric Co
Publication of GB8416974D0 publication Critical patent/GB8416974D0/en
Publication of GB2145539A publication Critical patent/GB2145539A/en
Application granted granted Critical
Publication of GB2145539B publication Critical patent/GB2145539B/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/091—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by antireflection means or light filtering or absorbing means, e.g. anti-halation, contrast enhancement
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P76/00—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography
    • H10P76/20—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography of masks comprising organic materials
    • H10P76/204—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography of masks comprising organic materials of organic photoresist masks
    • H10P76/2041—Photolithographic processes
    • H10P76/2043—Photolithographic processes using an anti-reflective coating
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P14/00—Formation of materials, e.g. in the shape of layers or pillars
    • H10P14/60—Formation of materials, e.g. in the shape of layers or pillars of insulating materials
    • H10P14/63—Formation of materials, e.g. in the shape of layers or pillars of insulating materials characterised by the formation processes
    • H10P14/6302—Non-deposition formation processes
    • H10P14/6316—Formation by nitridation, e.g. nitridation of the substrate
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P14/00—Formation of materials, e.g. in the shape of layers or pillars
    • H10P14/60—Formation of materials, e.g. in the shape of layers or pillars of insulating materials
    • H10P14/69—Inorganic materials
    • H10P14/692—Inorganic materials composed of oxides, glassy oxides or oxide-based glasses
    • H10P14/6938—Inorganic materials composed of oxides, glassy oxides or oxide-based glasses the material containing at least one metal element, e.g. metal oxides, metal oxynitrides or metal oxycarbides
    • H10P14/6939—Inorganic materials composed of oxides, glassy oxides or oxide-based glasses the material containing at least one metal element, e.g. metal oxides, metal oxynitrides or metal oxycarbides characterised by the metal

Landscapes

  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
GB08416974A 1983-08-22 1984-07-04 Optical preparation of molybdenum surfaces Expired GB2145539B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US52509083A 1983-08-22 1983-08-22

Publications (3)

Publication Number Publication Date
GB8416974D0 GB8416974D0 (en) 1984-08-08
GB2145539A GB2145539A (en) 1985-03-27
GB2145539B true GB2145539B (en) 1986-08-28

Family

ID=24091876

Family Applications (1)

Application Number Title Priority Date Filing Date
GB08416974A Expired GB2145539B (en) 1983-08-22 1984-07-04 Optical preparation of molybdenum surfaces

Country Status (3)

Country Link
JP (1) JPS6076736A (https=)
DE (1) DE3428564A1 (https=)
GB (1) GB2145539B (https=)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3534600A1 (de) * 1985-09-27 1987-04-02 Siemens Ag Integrierte schaltung mit elektrischen leiterbahnen und verfahren zu ihrer herstellung
ES2063032T3 (es) * 1987-04-24 1995-01-01 Advanced Micro Devices Inc Revestimientos antirreflexivos para utilizacion en fotolitografia.

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5593225A (en) * 1979-01-10 1980-07-15 Hitachi Ltd Forming method of minute pattern
GB2061615A (en) * 1979-10-25 1981-05-13 Gen Electric Composite conductors for integrated circuits

Also Published As

Publication number Publication date
GB2145539A (en) 1985-03-27
GB8416974D0 (en) 1984-08-08
JPH0367260B2 (https=) 1991-10-22
DE3428564C2 (https=) 1987-08-13
JPS6076736A (ja) 1985-05-01
DE3428564A1 (de) 1985-03-14

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Legal Events

Date Code Title Description
PCNP Patent ceased through non-payment of renewal fee

Effective date: 19980704