GB2119970B - Film deposition equipment - Google Patents

Film deposition equipment

Info

Publication number
GB2119970B
GB2119970B GB8308253A GB8308253A GB2119970B GB 2119970 B GB2119970 B GB 2119970B GB 8308253 A GB8308253 A GB 8308253A GB 8308253 A GB8308253 A GB 8308253A GB 2119970 B GB2119970 B GB 2119970B
Authority
GB
United Kingdom
Prior art keywords
film deposition
deposition equipment
equipment
film
deposition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB8308253A
Other versions
GB8308253D0 (en
GB2119970A (en
Inventor
Kazuo Sato
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Faurecia Clarion Electronics Co Ltd
Original Assignee
Clarion Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Clarion Co Ltd filed Critical Clarion Co Ltd
Publication of GB8308253D0 publication Critical patent/GB8308253D0/en
Publication of GB2119970A publication Critical patent/GB2119970A/en
Application granted granted Critical
Publication of GB2119970B publication Critical patent/GB2119970B/en
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54—Controlling or regulating the coating process
    • C23C14/542—Controlling the film thickness or evaporation rate
    • C23C14/544—Controlling the film thickness or evaporation rate using measurement in the gas phase
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/0021—Reactive sputtering or evaporation

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
GB8308253A 1982-03-26 1983-03-25 Film deposition equipment Expired GB2119970B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4991982A JPS58167767A (en) 1982-03-26 1982-03-26 Formation of thin film

Publications (3)

Publication Number Publication Date
GB8308253D0 GB8308253D0 (en) 1983-05-05
GB2119970A GB2119970A (en) 1983-11-23
GB2119970B true GB2119970B (en) 1985-11-27

Family

ID=12844413

Family Applications (1)

Application Number Title Priority Date Filing Date
GB8308253A Expired GB2119970B (en) 1982-03-26 1983-03-25 Film deposition equipment

Country Status (2)

Country Link
JP (1) JPS58167767A (en)
GB (1) GB2119970B (en)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4553853A (en) * 1984-02-27 1985-11-19 International Business Machines Corporation End point detector for a tin lead evaporator
JPS61242631A (en) * 1985-04-20 1986-10-28 Nippon Soken Inc Method and device for producing ultrafine particles of compound
JPH0699798B2 (en) * 1985-10-29 1994-12-07 東洋メタライジング株式会社 Method for producing transparent gas barrier film
JPS6329243A (en) * 1986-07-22 1988-02-06 Nok Corp Thin film temperature sensing element
GB9005321D0 (en) * 1990-03-09 1990-05-02 Matthews Allan Modulated structure composites produced by vapour disposition
CH686253A5 (en) * 1992-08-28 1996-02-15 Balzers Hochvakuum A method for controlling the degree of reaction and coating plant.
DE69308859T3 (en) * 1993-11-09 2000-11-02 Galileo Vacuum Systems S.R.L., Prato Method and device for producing a plastic film with a dielectric layer
EP2484796A1 (en) * 2011-02-04 2012-08-08 Pivot a.s. Magnetron sputtering process
CN113930738B (en) * 2020-06-29 2023-09-12 宝山钢铁股份有限公司 Metal vapor modulation device for vacuum coating and modulation method thereof

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5210872A (en) * 1975-07-16 1977-01-27 Matsushita Electric Ind Co Ltd Apparatus for production of compound thin films
FR2371009A1 (en) * 1976-11-15 1978-06-09 Commissariat Energie Atomique METHOD FOR CONTROL OF LAYER DEPOSIT BY REACTIVE SPRAYING AND IMPLEMENTATION DEVICE
DE2821119C2 (en) * 1978-05-13 1983-08-25 Leybold-Heraeus GmbH, 5000 Köln Method and arrangement for regulating the discharge process in a cathode sputtering system
DE2834813C2 (en) * 1978-08-09 1983-01-20 Leybold-Heraeus GmbH, 5000 Köln Method and device for regulating the evaporation rate of oxidizable substances during reactive vacuum evaporation
GB2084197B (en) * 1980-09-23 1984-02-22 Univ Delaware Deposition material by vacuum evaporation

Also Published As

Publication number Publication date
GB8308253D0 (en) 1983-05-05
JPS58167767A (en) 1983-10-04
GB2119970A (en) 1983-11-23

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Legal Events

Date Code Title Description
746 Register noted 'licences of right' (sect. 46/1977)

Effective date: 19930318

PCNP Patent ceased through non-payment of renewal fee

Effective date: 19960325