GB2118940B - 2-methyl-1, 3-propylene glycol mono-or di-alkylene oxide ether - Google Patents
2-methyl-1, 3-propylene glycol mono-or di-alkylene oxide etherInfo
- Publication number
- GB2118940B GB2118940B GB08310772A GB8310772A GB2118940B GB 2118940 B GB2118940 B GB 2118940B GB 08310772 A GB08310772 A GB 08310772A GB 8310772 A GB8310772 A GB 8310772A GB 2118940 B GB2118940 B GB 2118940B
- Authority
- GB
- United Kingdom
- Prior art keywords
- methyl
- propylene glycol
- alkylene oxide
- glycol mono
- oxide ether
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 title 2
- QWGRWMMWNDWRQN-UHFFFAOYSA-N 2-methylpropane-1,3-diol Chemical compound OCC(C)CO QWGRWMMWNDWRQN-UHFFFAOYSA-N 0.000 title 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D303/00—Compounds containing three-membered rings having one oxygen atom as the only ring hetero atom
- C07D303/02—Compounds containing oxirane rings
- C07D303/12—Compounds containing oxirane rings with hydrocarbon radicals, substituted by singly or doubly bound oxygen atoms
- C07D303/18—Compounds containing oxirane rings with hydrocarbon radicals, substituted by singly or doubly bound oxygen atoms by etherified hydroxyl radicals
- C07D303/20—Ethers with hydroxy compounds containing no oxirane rings
- C07D303/24—Ethers with hydroxy compounds containing no oxirane rings with polyhydroxy compounds
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
- C08G59/20—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the epoxy compounds used
- C08G59/22—Di-epoxy compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
Landscapes
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Organic Chemistry (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Medicinal Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Polymers & Plastics (AREA)
- Health & Medical Sciences (AREA)
- Polyethers (AREA)
- Macromonomer-Based Addition Polymer (AREA)
- Epoxy Resins (AREA)
- Paints Or Removers (AREA)
- Epoxy Compounds (AREA)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP6788782A JPS58184943A (ja) | 1982-04-22 | 1982-04-22 | 硬化性組成物 |
JP57067885A JPS58185575A (ja) | 1982-04-22 | 1982-04-22 | 2−メチル−1,3−プロピレングリコ−ルモノアルキレンオキシドエ−テル |
JP6788682A JPS58185576A (ja) | 1982-04-22 | 1982-04-22 | 2−メチル−1,3−プロピレングリコ−ルジアルキレンオキシドエ−テル |
Publications (3)
Publication Number | Publication Date |
---|---|
GB8310772D0 GB8310772D0 (en) | 1983-05-25 |
GB2118940A GB2118940A (en) | 1983-11-09 |
GB2118940B true GB2118940B (en) | 1985-09-11 |
Family
ID=27299568
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB08310772A Expired GB2118940B (en) | 1982-04-22 | 1983-04-21 | 2-methyl-1, 3-propylene glycol mono-or di-alkylene oxide ether |
Country Status (3)
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5114830A (en) * | 1988-10-28 | 1992-05-19 | W. R. Grace & Co.-Conn. | Solder mask resins having improved stability containing a multifunctional epoxide and a partial ester or styrene-maleic anhydride copolymer |
TWI345564B (en) * | 2003-12-02 | 2011-07-21 | Mitsubishi Gas Chemical Co | Method for producing glycidyl 2-hydroxyisobutyrate |
BR112015007773A8 (pt) * | 2012-11-08 | 2019-08-27 | Basf Se | derivado de 2-fenil-1,3-propanodiol diglicidil éter, processos para preparar um derivado de 2-fenil-1,3-propanodiol diglicidil éter e para preparar um oligômero, oligômero, composição de resina de epóxi curável, método para produzir uma resina de epóxi curada, resina de epóxi curada, componente de resina, e, usos de uma composição de resina de epóxi curável e de um composto |
US9150685B2 (en) * | 2012-11-08 | 2015-10-06 | Basf Se | Diglycidyl ethers of 2-phenyl-1,3-propanediol derivatives and oligomers thereof as curable epoxy resins |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2538072A (en) * | 1947-06-11 | 1951-01-16 | Devoe & Raynolds Co | Epoxide preparation |
JPS5471579A (en) * | 1977-11-17 | 1979-06-08 | Matsushita Electric Ind Co Ltd | Electron beam resist |
US4216288A (en) * | 1978-09-08 | 1980-08-05 | General Electric Company | Heat curable cationically polymerizable compositions and method of curing same with onium salts and reducing agents |
-
1983
- 1983-04-18 US US06/485,687 patent/US4458063A/en not_active Expired - Lifetime
- 1983-04-21 GB GB08310772A patent/GB2118940B/en not_active Expired
- 1983-04-21 DE DE19833314538 patent/DE3314538A1/de active Granted
Also Published As
Publication number | Publication date |
---|---|
US4458063A (en) | 1984-07-03 |
GB8310772D0 (en) | 1983-05-25 |
DE3314538C2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1990-10-31 |
GB2118940A (en) | 1983-11-09 |
DE3314538A1 (de) | 1983-10-27 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PCNP | Patent ceased through non-payment of renewal fee |
Effective date: 19950421 |