GB2108710B - System for developing a photo-resist material used as a recording medium - Google Patents

System for developing a photo-resist material used as a recording medium

Info

Publication number
GB2108710B
GB2108710B GB08229719A GB8229719A GB2108710B GB 2108710 B GB2108710 B GB 2108710B GB 08229719 A GB08229719 A GB 08229719A GB 8229719 A GB8229719 A GB 8229719A GB 2108710 B GB2108710 B GB 2108710B
Authority
GB
United Kingdom
Prior art keywords
photo
developing
recording medium
material used
resist material
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB08229719A
Other languages
English (en)
Other versions
GB2108710A (en
Inventor
Fumio Matsui
Mitsuaki Sashida
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Pioneer Corp
Original Assignee
Pioneer Electronic Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Pioneer Electronic Corp filed Critical Pioneer Electronic Corp
Publication of GB2108710A publication Critical patent/GB2108710A/en
Application granted granted Critical
Publication of GB2108710B publication Critical patent/GB2108710B/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/3021—Imagewise removal using liquid means from a wafer supported on a rotating chuck
    • G03F7/3028—Imagewise removal using liquid means from a wafer supported on a rotating chuck characterised by means for on-wafer monitoring of the processing

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing Optical Record Carriers (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
GB08229719A 1981-10-16 1982-10-18 System for developing a photo-resist material used as a recording medium Expired GB2108710B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1981153669U JPS5857843U (ja) 1981-10-16 1981-10-16 フオトレジスト湿式現像装置

Publications (2)

Publication Number Publication Date
GB2108710A GB2108710A (en) 1983-05-18
GB2108710B true GB2108710B (en) 1985-06-12

Family

ID=15567578

Family Applications (1)

Application Number Title Priority Date Filing Date
GB08229719A Expired GB2108710B (en) 1981-10-16 1982-10-18 System for developing a photo-resist material used as a recording medium

Country Status (5)

Country Link
US (1) US4501480A (enExample)
JP (1) JPS5857843U (enExample)
DE (1) DE3238528C2 (enExample)
FR (1) FR2514927B1 (enExample)
GB (1) GB2108710B (enExample)

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RU2107893C1 (ru) * 1993-04-07 1998-03-27 Нимбус Коммуникейшнз Интернэшнл Лимитед Способ исследования оптического диска оригинала и устройство для его осуществления

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US4647172A (en) * 1985-05-17 1987-03-03 Gca Corporation Resist development method
US5006720A (en) * 1988-07-28 1991-04-09 Transtechnology Corporation Light sensor apparatus for sheet transport
US5196285A (en) * 1990-05-18 1993-03-23 Xinix, Inc. Method for control of photoresist develop processes
JP3070113B2 (ja) * 1991-03-07 2000-07-24 ソニー株式会社 フォトレジストの現像処理装置
US5357304A (en) * 1992-03-25 1994-10-18 Sony Corporation Image development apparatus and method
US5416552A (en) * 1994-01-28 1995-05-16 Surface Tek, Inc. Apparatus and method for replenishing developer
US5988896A (en) * 1996-10-26 1999-11-23 Applied Science Fiction, Inc. Method and apparatus for electronic film development
US6069714A (en) 1996-12-05 2000-05-30 Applied Science Fiction, Inc. Method and apparatus for reducing noise in electronic film development
US6017688A (en) 1997-01-30 2000-01-25 Applied Science Fiction, Inc. System and method for latent film recovery in electronic film development
WO1999043149A1 (en) 1998-02-23 1999-08-26 Applied Science Fiction, Inc. Progressive area scan in electronic film development
US6594041B1 (en) 1998-11-20 2003-07-15 Applied Science Fiction, Inc. Log time processing and stitching system
US6781620B1 (en) 1999-03-16 2004-08-24 Eastman Kodak Company Mixed-element stitching and noise reduction system
TW495389B (en) * 1999-06-29 2002-07-21 Applied Science Fiction Inc Slot coater device for applying developer to film for electronic film development
DE60014956T2 (de) 1999-08-17 2006-02-09 Eastman Kodak Co. Verfahren und System für die Verwendung von Eichzonen in der Elektronischen Filmentwicklung
WO2001045042A1 (en) * 1999-12-17 2001-06-21 Applied Science Fiction, Inc. Method and system for selective enhancement of image data
US6864973B2 (en) * 1999-12-30 2005-03-08 Eastman Kodak Company Method and apparatus to pre-scan and pre-treat film for improved digital film processing handling
AU2465001A (en) 1999-12-30 2001-07-16 Applied Science Fiction, Inc. System and method for digital color dye film processing
AU2463501A (en) * 1999-12-30 2001-07-24 Applied Science Fiction, Inc. Methods and apparatus for transporting and positioning film in a digital film processing system
US20010030685A1 (en) * 1999-12-30 2001-10-18 Darbin Stephen P. Method and apparatus for digital film processing using a scanning station having a single sensor
US6447178B2 (en) 1999-12-30 2002-09-10 Applied Science Fiction, Inc. System, method, and apparatus for providing multiple extrusion widths
US6554504B2 (en) 1999-12-30 2003-04-29 Applied Science Fiction, Inc. Distributed digital film processing system and method
US6788335B2 (en) 1999-12-30 2004-09-07 Eastman Kodak Company Pulsed illumination signal modulation control & adjustment method and system
US6707557B2 (en) 1999-12-30 2004-03-16 Eastman Kodak Company Method and system for estimating sensor dark current drift and sensor/illumination non-uniformities
US6813392B2 (en) 1999-12-30 2004-11-02 Eastman Kodak Company Method and apparatus for aligning multiple scans of the same area of a medium using mathematical correlation
US6965692B1 (en) 1999-12-30 2005-11-15 Eastman Kodak Company Method and apparatus for improving the quality of reconstructed information
EP1247140A1 (en) 1999-12-30 2002-10-09 Applied Science Fiction, Inc. Improved system and method for digital film development using visible light
US6540416B2 (en) 1999-12-30 2003-04-01 Applied Science Fiction, Inc. System and method for digital film development using visible light
US6475711B1 (en) 1999-12-31 2002-11-05 Applied Science Fiction, Inc. Photographic element and digital film processing method using same
AU2733601A (en) * 1999-12-31 2001-07-16 Applied Science Fiction, Inc. Digital film processing method
US7020344B2 (en) * 2000-02-03 2006-03-28 Eastman Kodak Company Match blur system and method
US20010040701A1 (en) * 2000-02-03 2001-11-15 Edgar Albert D. Photographic film having time resolved sensitivity distinction
US6599036B2 (en) 2000-02-03 2003-07-29 Applied Science Fiction, Inc. Film processing solution cartridge and method for developing and digitizing film
US6990251B2 (en) 2000-02-03 2006-01-24 Eastman Kodak Company Method, system, and software for signal processing using sheep and shepherd artifacts
US6786655B2 (en) 2000-02-03 2004-09-07 Eastman Kodak Company Method and system for self-service film processing
US6619863B2 (en) 2000-02-03 2003-09-16 Eastman Kodak Company Method and system for capturing film images
US6943920B2 (en) 2000-02-03 2005-09-13 Eastman Kodak Company Method, system, and software for signal processing using pyramidal decomposition
US20060182337A1 (en) * 2000-06-28 2006-08-17 Ford Benjamin C Method and apparatus for improving the quality of reconstructed information
US20020118402A1 (en) * 2000-09-19 2002-08-29 Shaw Timothy C. Film bridge for digital film scanning system
CN1474997A (zh) * 2000-09-21 2004-02-11 Ӧ�ÿ�ѧ��˾ 动态图像校正及成像系统
US20020146171A1 (en) * 2000-10-01 2002-10-10 Applied Science Fiction, Inc. Method, apparatus and system for black segment detection
US6778696B1 (en) * 2000-10-12 2004-08-17 Eastman Kodak Company Integrated traditional and digital photographic processing system with exchanged feedback control
US6888997B2 (en) * 2000-12-05 2005-05-03 Eastman Kodak Company Waveguide device and optical transfer system for directing light to an image plane
WO2002065210A2 (en) 2001-02-09 2002-08-22 Eastman Kodak Company Digital film processing solutions and method of digital film processing
US6805501B2 (en) * 2001-07-16 2004-10-19 Eastman Kodak Company System and method for digital film development using visible light
US7263240B2 (en) * 2002-01-14 2007-08-28 Eastman Kodak Company Method, system, and software for improving signal quality using pyramidal decomposition
WO2005079061A1 (ja) * 2004-02-13 2005-08-25 Sony Corporation 画像処理装置と画像処理方法およびプログラム

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US3388652A (en) * 1965-05-27 1968-06-18 Technical Operations Inc Photographic processing control
US3663724A (en) * 1969-11-14 1972-05-16 Chemcut Corp Built-in type speed control for conveyorized continuous etcher
GB1280625A (en) * 1970-02-26 1972-07-05 Nat Res Dev Method of forming fringe pattern images
US3702277A (en) * 1970-09-23 1972-11-07 Zenith Radio Corp Control system for mask etching apparatus
US3995959A (en) * 1975-04-21 1976-12-07 Shaber Gary S Method and apparatus for determining the operational status of a photographic film processor
US3953265A (en) * 1975-04-28 1976-04-27 International Business Machines Corporation Meniscus-contained method of handling fluids in the manufacture of semiconductor wafers
US4119989A (en) * 1977-01-03 1978-10-10 Pitney-Bowes, Inc. System for controlling concentration of developer solution
US4128325A (en) * 1977-05-31 1978-12-05 Pako Corporation Automatic density measurement calibration for photographic replenishment system
US4180830A (en) * 1977-06-28 1979-12-25 Rca Corporation Depth estimation system using diffractive effects of the grooves and signal elements in the grooves
US4142107A (en) * 1977-06-30 1979-02-27 International Business Machines Corporation Resist development control system
US4136940A (en) * 1977-12-19 1979-01-30 Rca Corporation Resist development control system
FR2509484B1 (fr) * 1981-07-08 1986-06-13 Pioneer Electronic Corp Procede et dispositif pour developper un materiau photo-sensible utilise comme milieu d'enregistrement
GB8719137D0 (en) * 1987-08-13 1987-09-23 Proform Uk Ltd Roofing valleys

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
RU2107893C1 (ru) * 1993-04-07 1998-03-27 Нимбус Коммуникейшнз Интернэшнл Лимитед Способ исследования оптического диска оригинала и устройство для его осуществления

Also Published As

Publication number Publication date
DE3238528C2 (de) 1984-08-16
DE3238528A1 (de) 1983-05-05
JPH0238283Y2 (enExample) 1990-10-16
FR2514927B1 (fr) 1989-05-12
US4501480A (en) 1985-02-26
FR2514927A1 (fr) 1983-04-22
GB2108710A (en) 1983-05-18
JPS5857843U (ja) 1983-04-19

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Legal Events

Date Code Title Description
746 Register noted 'licences of right' (sect. 46/1977)
PCNP Patent ceased through non-payment of renewal fee

Effective date: 19961018