GB2066487B - Alignment of exposure masks - Google Patents

Alignment of exposure masks

Info

Publication number
GB2066487B
GB2066487B GB7943449A GB7943449A GB2066487B GB 2066487 B GB2066487 B GB 2066487B GB 7943449 A GB7943449 A GB 7943449A GB 7943449 A GB7943449 A GB 7943449A GB 2066487 B GB2066487 B GB 2066487B
Authority
GB
United Kingdom
Prior art keywords
alignment
exposure masks
masks
exposure
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB7943449A
Other languages
English (en)
Other versions
GB2066487A (en
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Philips Electronics UK Ltd
Original Assignee
Philips Electronic and Associated Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Philips Electronic and Associated Industries Ltd filed Critical Philips Electronic and Associated Industries Ltd
Priority to GB7943449A priority Critical patent/GB2066487B/en
Priority to DE19803046856 priority patent/DE3046856A1/de
Priority to FR8026537A priority patent/FR2472213A1/fr
Priority to US06/216,340 priority patent/US4377627A/en
Priority to IE2623/80A priority patent/IE50699B1/en
Priority to JP17796980A priority patent/JPS5698830A/ja
Publication of GB2066487A publication Critical patent/GB2066487A/en
Application granted granted Critical
Publication of GB2066487B publication Critical patent/GB2066487B/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7073—Alignment marks and their environment
    • G03F9/7076—Mark details, e.g. phase grating mark, temporary mark
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/167—X-ray
    • Y10S430/168—X-ray exposure process

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Electron Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
GB7943449A 1979-12-18 1979-12-18 Alignment of exposure masks Expired GB2066487B (en)

Priority Applications (6)

Application Number Priority Date Filing Date Title
GB7943449A GB2066487B (en) 1979-12-18 1979-12-18 Alignment of exposure masks
DE19803046856 DE3046856A1 (de) 1979-12-18 1980-12-12 Herstellung von mikrominiaturfeststoffanordnungen
FR8026537A FR2472213A1 (fr) 1979-12-18 1980-12-15 Fabrication de circuit microminiature a l'etat solide et circuits ainsi obtenus
US06/216,340 US4377627A (en) 1979-12-18 1980-12-15 Microminiature solid state device manufacture with automatic alignment of sub-patterns
IE2623/80A IE50699B1 (en) 1979-12-18 1980-12-15 Microminiature solid state device manufacture
JP17796980A JPS5698830A (en) 1979-12-18 1980-12-16 Method of manufacturing microminiature solidstate device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB7943449A GB2066487B (en) 1979-12-18 1979-12-18 Alignment of exposure masks

Publications (2)

Publication Number Publication Date
GB2066487A GB2066487A (en) 1981-07-08
GB2066487B true GB2066487B (en) 1983-11-23

Family

ID=10509905

Family Applications (1)

Application Number Title Priority Date Filing Date
GB7943449A Expired GB2066487B (en) 1979-12-18 1979-12-18 Alignment of exposure masks

Country Status (6)

Country Link
US (1) US4377627A (US20020128544A1-20020912-P00008.png)
JP (1) JPS5698830A (US20020128544A1-20020912-P00008.png)
DE (1) DE3046856A1 (US20020128544A1-20020912-P00008.png)
FR (1) FR2472213A1 (US20020128544A1-20020912-P00008.png)
GB (1) GB2066487B (US20020128544A1-20020912-P00008.png)
IE (1) IE50699B1 (US20020128544A1-20020912-P00008.png)

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4407933A (en) * 1981-06-11 1983-10-04 Bell Telephone Laboratories, Incorporated Alignment marks for electron beam lithography
DE3235064A1 (de) * 1982-09-22 1984-03-22 Siemens AG, 1000 Berlin und 8000 München Tunnelkathodenmaske fuer die elektronenlithografie, verfahren zu ihrer herstellung und verfahren zu ihrem betrieb
JPS6010727A (ja) * 1983-06-30 1985-01-19 Toshiba Corp 位置合わせ方法
US4547958A (en) * 1984-05-16 1985-10-22 The United States Of America As Represented By The Secretary Of The Air Force VMJ Solar cell fabrication process using mask aligner
US4608112A (en) * 1984-05-16 1986-08-26 The United States Of America As Represented By The Secretary Of The Air Force Mask aligner for solar cell fabrication
US4690880A (en) * 1984-07-20 1987-09-01 Canon Kabushiki Kaisha Pattern forming method
GB2180669A (en) * 1985-09-20 1987-04-01 Phillips Electronic And Associ An electron emissive mask for an electron beam image projector, its manufacture, and the manufacture of a solid state device using such a mask
US4713315A (en) * 1986-12-09 1987-12-15 Smith David V Wire tag etching system
US4948706A (en) * 1987-12-30 1990-08-14 Hoya Corporation Process for producing transparent substrate having thereon transparent conductive pattern elements separated by light-shielding insulating film, and process for producing surface-colored material
JP2794793B2 (ja) * 1989-06-13 1998-09-10 ソニー株式会社 露光用マスクの製造方法
JPH045663U (US20020128544A1-20020912-P00008.png) * 1990-04-28 1992-01-20
JPH0521310A (ja) * 1991-07-11 1993-01-29 Canon Inc 微細パタン形成方法
US5382483A (en) * 1992-01-13 1995-01-17 International Business Machines Corporation Self-aligned phase-shifting mask
JP3334911B2 (ja) * 1992-07-31 2002-10-15 キヤノン株式会社 パターン形成方法
US5418095A (en) * 1993-01-21 1995-05-23 Sematech, Inc. Method of fabricating phase shifters with absorbing/attenuating sidewalls using an additive process
US5411824A (en) * 1993-01-21 1995-05-02 Sematech, Inc. Phase shifting mask structure with absorbing/attenuating sidewalls for improved imaging
AU5681194A (en) * 1993-01-21 1994-08-15 Sematech, Inc. Phase shifting mask structure with multilayer optical coating for improved transmission
US5733708A (en) * 1995-10-02 1998-03-31 Litel Instruments Multilayer e-beam lithography on nonconducting substrates

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3245794A (en) * 1962-10-29 1966-04-12 Ihilco Corp Sequential registration scheme
US3607267A (en) * 1967-10-09 1971-09-21 Motorola Inc Precision alignment of photographic masks
AT301620B (de) * 1967-10-23 1972-08-15 Siemens Ag Verfahren zum herstellen einer photolackmaske fuer halbleiterzwecke
US3742229A (en) * 1972-06-29 1973-06-26 Massachusetts Inst Technology Soft x-ray mask alignment system
CS159563B1 (US20020128544A1-20020912-P00008.png) * 1972-12-28 1975-01-31
GB1520925A (en) * 1975-10-06 1978-08-09 Mullard Ltd Semiconductor device manufacture
DE2600137A1 (de) * 1976-01-03 1977-07-07 Ernst Prof Dipl Phys Froeschle Elektronenstrahlbelichtungsverfahren fuer halbleiterbauelemente
GB1557064A (en) * 1976-09-09 1979-12-05 Mullard Ltd Masks suitable for use in electron image projectors
DE2642634A1 (de) * 1976-09-22 1978-03-23 Siemens Ag Verfahren zum justieren von belichtungsmasken relativ zu einer substratscheibe
DE2708674C3 (de) * 1977-02-28 1980-07-24 Siemens Ag, 1000 Berlin Und 8000 Muenchen Verfahren zum Justieren einer Belichtungsmaske relativ zu einer Substratscheibe bei der Fotolithografie

Also Published As

Publication number Publication date
IE802623L (en) 1981-06-18
DE3046856A1 (de) 1981-09-03
JPS5698830A (en) 1981-08-08
GB2066487A (en) 1981-07-08
IE50699B1 (en) 1986-06-25
US4377627A (en) 1983-03-22
FR2472213A1 (fr) 1981-06-26
FR2472213B1 (US20020128544A1-20020912-P00008.png) 1983-10-07
JPS6318858B2 (US20020128544A1-20020912-P00008.png) 1988-04-20
DE3046856C2 (US20020128544A1-20020912-P00008.png) 1992-03-05

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Legal Events

Date Code Title Description
PCNP Patent ceased through non-payment of renewal fee