GB201215996D0 - Method of coating and etching - Google Patents

Method of coating and etching

Info

Publication number
GB201215996D0
GB201215996D0 GB201215996A GB201215996A GB201215996D0 GB 201215996 D0 GB201215996 D0 GB 201215996D0 GB 201215996 A GB201215996 A GB 201215996A GB 201215996 A GB201215996 A GB 201215996A GB 201215996 D0 GB201215996 D0 GB 201215996D0
Authority
GB
United Kingdom
Prior art keywords
etching
coating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
GB201215996A
Other versions
GB2505685B (en
GB2505685A (en
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
University of Salford
Original Assignee
University of Salford
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by University of Salford filed Critical University of Salford
Priority to GB1215996.8A priority Critical patent/GB2505685B/en
Publication of GB201215996D0 publication Critical patent/GB201215996D0/en
Priority to PCT/GB2013/052339 priority patent/WO2014037736A1/en
Publication of GB2505685A publication Critical patent/GB2505685A/en
Application granted granted Critical
Publication of GB2505685B publication Critical patent/GB2505685B/en
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C23C16/515—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using pulsed discharges
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/02—Pretreatment of the material to be coated
    • C23C16/0227—Pretreatment of the material to be coated by cleaning or etching
    • C23C16/0245—Pretreatment of the material to be coated by cleaning or etching by etching with a plasma
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/40—Oxides
    • C23C16/405—Oxides of refractory metals or yttrium
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32348—Dielectric barrier discharge
GB1215996.8A 2012-09-07 2012-09-07 Method of coating and etching Expired - Fee Related GB2505685B (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
GB1215996.8A GB2505685B (en) 2012-09-07 2012-09-07 Method of coating and etching
PCT/GB2013/052339 WO2014037736A1 (en) 2012-09-07 2013-09-06 Method of coating and etching

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB1215996.8A GB2505685B (en) 2012-09-07 2012-09-07 Method of coating and etching

Publications (3)

Publication Number Publication Date
GB201215996D0 true GB201215996D0 (en) 2012-10-24
GB2505685A GB2505685A (en) 2014-03-12
GB2505685B GB2505685B (en) 2015-11-04

Family

ID=47137103

Family Applications (1)

Application Number Title Priority Date Filing Date
GB1215996.8A Expired - Fee Related GB2505685B (en) 2012-09-07 2012-09-07 Method of coating and etching

Country Status (2)

Country Link
GB (1) GB2505685B (en)
WO (1) WO2014037736A1 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102016104852B4 (en) * 2016-03-16 2017-11-09 Leibniz - Institut Für Analytische Wissenschaften - Isas - E.V. Method for ionizing gaseous samples by means of dielectrically impeded discharge and for subsequent analysis of the generated sample ions in an analyzer

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE4122452C2 (en) * 1991-07-06 1993-10-28 Schott Glaswerke Method and device for igniting CVD plasmas
KR20030063380A (en) * 2000-11-14 2003-07-28 세끼쑤이 케미컬 가부시기가이샤 Method and device for atmospheric plasma processing
JP4437426B2 (en) * 2004-08-13 2010-03-24 日本碍子株式会社 Thin film manufacturing method
US20070037408A1 (en) * 2005-08-10 2007-02-15 Hitachi Metals, Ltd. Method and apparatus for plasma processing
DE102006053366A1 (en) * 2006-11-10 2008-05-15 Schott Ag Method and apparatus for plasma enhanced chemical vapor deposition
DE102006058771B4 (en) * 2006-12-12 2018-03-01 Schott Ag Container with improved emptiness and method for its production
US7718538B2 (en) * 2007-02-21 2010-05-18 Applied Materials, Inc. Pulsed-plasma system with pulsed sample bias for etching semiconductor substrates
WO2011007653A1 (en) * 2009-07-13 2011-01-20 日本碍子株式会社 Method for producing diamond-like carbon film body.

Also Published As

Publication number Publication date
GB2505685B (en) 2015-11-04
GB2505685A (en) 2014-03-12
WO2014037736A1 (en) 2014-03-13

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Legal Events

Date Code Title Description
PCNP Patent ceased through non-payment of renewal fee

Effective date: 20200907