GB1549256A - Methods of forming an oxide layer on silicon - Google Patents

Methods of forming an oxide layer on silicon

Info

Publication number
GB1549256A
GB1549256A GB49901/76A GB4990176A GB1549256A GB 1549256 A GB1549256 A GB 1549256A GB 49901/76 A GB49901/76 A GB 49901/76A GB 4990176 A GB4990176 A GB 4990176A GB 1549256 A GB1549256 A GB 1549256A
Authority
GB
United Kingdom
Prior art keywords
silicon
methods
forming
oxide layer
oxide
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB49901/76A
Other languages
English (en)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sony Corp
Original Assignee
Sony Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sony Corp filed Critical Sony Corp
Publication of GB1549256A publication Critical patent/GB1549256A/en
Expired legal-status Critical Current

Links

Classifications

    • H10P14/6309—
    • H10P14/6322—
GB49901/76A 1975-12-01 1976-11-30 Methods of forming an oxide layer on silicon Expired GB1549256A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP50143472A JPS5826661B2 (ja) 1975-12-01 1975-12-01 サンカマクノ ケイセイホウホウ

Publications (1)

Publication Number Publication Date
GB1549256A true GB1549256A (en) 1979-08-01

Family

ID=15339483

Family Applications (1)

Application Number Title Priority Date Filing Date
GB49901/76A Expired GB1549256A (en) 1975-12-01 1976-11-30 Methods of forming an oxide layer on silicon

Country Status (6)

Country Link
JP (1) JPS5826661B2 (enExample)
CA (1) CA1074630A (enExample)
DE (1) DE2654493A1 (enExample)
FR (1) FR2334200A1 (enExample)
GB (1) GB1549256A (enExample)
NL (1) NL7613392A (enExample)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3142548A1 (de) * 1981-10-27 1983-05-05 Siemens AG, 1000 Berlin und 8000 München Verfahren zum herstellen von oxidschichten auf aus silizium oder anderem oxidierbarem material bestehenden substratscheiben in extrem trockener sauerstoffatmosphaere bzw. in sauerstoffatmosphaere mit chlorwasserstoffgas-zusaetzen
CN111785612B (zh) * 2020-08-21 2022-05-17 中电晶华(天津)半导体材料有限公司 一种vdmos功率器件用二氧化硅层的制备方法

Also Published As

Publication number Publication date
FR2334200A1 (fr) 1977-07-01
FR2334200B1 (enExample) 1983-02-11
JPS5826661B2 (ja) 1983-06-04
NL7613392A (nl) 1977-06-03
JPS5267268A (en) 1977-06-03
DE2654493A1 (de) 1977-06-08
CA1074630A (en) 1980-04-01

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Legal Events

Date Code Title Description
PS Patent sealed [section 19, patents act 1949]
PCNP Patent ceased through non-payment of renewal fee