GB1529562A - Semiconductor devices and circuits - Google Patents

Semiconductor devices and circuits

Info

Publication number
GB1529562A
GB1529562A GB5300975A GB5300975A GB1529562A GB 1529562 A GB1529562 A GB 1529562A GB 5300975 A GB5300975 A GB 5300975A GB 5300975 A GB5300975 A GB 5300975A GB 1529562 A GB1529562 A GB 1529562A
Authority
GB
United Kingdom
Prior art keywords
zone
base
schottky
input
diode forming
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB5300975A
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Shibaura Electric Co Ltd filed Critical Tokyo Shibaura Electric Co Ltd
Priority to GB5300975A priority Critical patent/GB1529562A/en
Publication of GB1529562A publication Critical patent/GB1529562A/en
Expired legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/02Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
    • H01L27/0203Particular design considerations for integrated circuits
    • H01L27/0214Particular design considerations for integrated circuits for internal polarisation, e.g. I2L
    • H01L27/0229Particular design considerations for integrated circuits for internal polarisation, e.g. I2L of bipolar structures
    • H01L27/0233Integrated injection logic structures [I2L]

Landscapes

  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Logic Circuits (AREA)
  • Bipolar Integrated Circuits (AREA)

Abstract

1529562 Integrated injection logic device TOKYO SHIBAURA ELECTRIC CO Ltd 29 Dec 1975 53009/75 Heading H1K An integrated injection logic device, as shown in Fig. 1A for example, comprises a substrate 11 of one conductivity type carrying a layer 12 of the opposite type through which extends an isolating ring 14 of the one type in which is formed an opposite type zone 15 which with the ring and the isolated region 12A defines a lateral injection transistor. The substrate and layer define with further zone 17 of the one conductivity type a complementary inverted vertical transistor the collector zone 17 of which is contacted by a Schottky-diode forming electrode while its base is contacted by an ohmic or, as shown, a Schottky-diode forming electrode 19E. In the Fig. 1A embodiment the vertical transistor has two identical collector zones and its base is contacted by three Schottky-diode forming input electrodes to provide with the connections shown, a multi-input and output NAND circuit. One variant of this has only a single collector zone provided with a pair of Schottky-diode forming output electrodes. In a modification of either for use as a multioutput inverter the input diodes on the base zone are replaced by a single input electrode making ohmic contact with the base via a P + diffusion and additional collectors and/or output diodes provided. To reduce minority carrier accumulation in the base an additional N+ collector zone may be provided overlapping the P+ diffusion and connected to the input electrode.
GB5300975A 1975-12-29 1975-12-29 Semiconductor devices and circuits Expired GB1529562A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
GB5300975A GB1529562A (en) 1975-12-29 1975-12-29 Semiconductor devices and circuits

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB5300975A GB1529562A (en) 1975-12-29 1975-12-29 Semiconductor devices and circuits

Publications (1)

Publication Number Publication Date
GB1529562A true GB1529562A (en) 1978-10-25

Family

ID=10466263

Family Applications (1)

Application Number Title Priority Date Filing Date
GB5300975A Expired GB1529562A (en) 1975-12-29 1975-12-29 Semiconductor devices and circuits

Country Status (1)

Country Link
GB (1) GB1529562A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN112993015A (en) * 2021-02-26 2021-06-18 西安微电子技术研究所 Collector region double-diffusion-based high early voltage transverse PNP transistor and preparation method thereof

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN112993015A (en) * 2021-02-26 2021-06-18 西安微电子技术研究所 Collector region double-diffusion-based high early voltage transverse PNP transistor and preparation method thereof
CN112993015B (en) * 2021-02-26 2023-02-07 西安微电子技术研究所 Collector region double-diffusion-based high early voltage transverse PNP transistor and preparation method thereof

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Legal Events

Date Code Title Description
PS Patent sealed
746 Register noted 'licences of right' (sect. 46/1977)
PE20 Patent expired after termination of 20 years

Effective date: 19951228