GB1519699A - Producing coatings of compounds of hafnium - Google Patents

Producing coatings of compounds of hafnium

Info

Publication number
GB1519699A
GB1519699A GB2359076A GB2359076A GB1519699A GB 1519699 A GB1519699 A GB 1519699A GB 2359076 A GB2359076 A GB 2359076A GB 2359076 A GB2359076 A GB 2359076A GB 1519699 A GB1519699 A GB 1519699A
Authority
GB
United Kingdom
Prior art keywords
hfcl
hafnium
compounds
compound
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB2359076A
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Westinghouse Canada Inc
Original Assignee
Westinghouse Canada Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Westinghouse Canada Inc filed Critical Westinghouse Canada Inc
Publication of GB1519699A publication Critical patent/GB1519699A/en
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
    • C23C16/4488—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by in situ generation of reactive gas by chemical or electrochemical reaction
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/32—Carbides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/34—Nitrides

Abstract

1519699 Chemical vapour deposition of hafnium compounds WESTINGHOUSE CANADA Ltd 8 June 1976 [15 Sept 1975] 23590/76 Heading C7F Coatings of hafnium compounds are formed on a substrate at 900 to <1300‹C by chemical vapour deposition from a gas mixture of mainly the lower hafnium halides, the other material of the compound and at least one of H 2 , He, A, Kr, Xe. The preferred lower halides are HfCl 3 , HfCl 2 and HfCl which are formed by passing HCl over Hf heated to 500-700‹C. Alternatively HfCl 4 may be reduced with Hf or H 2 . The deposited coating may be the carbide, nitride, oxide, oxycarbide, oxynitride or carbonitride and the other component of the gas mixture may be a hydrocarbon, N 2 , NH 3 , O 2 or a volatile O 2 compound. The substrate may be a metal such as W or a ceramic.
GB2359076A 1975-09-15 1976-06-08 Producing coatings of compounds of hafnium Expired GB1519699A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CA235,453A CA1087041A (en) 1975-09-15 1975-09-15 Hafnium carbide and nitride coatings

Publications (1)

Publication Number Publication Date
GB1519699A true GB1519699A (en) 1978-08-02

Family

ID=4104046

Family Applications (1)

Application Number Title Priority Date Filing Date
GB2359076A Expired GB1519699A (en) 1975-09-15 1976-06-08 Producing coatings of compounds of hafnium

Country Status (6)

Country Link
JP (1) JPS5236585A (en)
CA (1) CA1087041A (en)
DE (1) DE2619330A1 (en)
FR (1) FR2323773A1 (en)
GB (1) GB1519699A (en)
IT (1) IT1065083B (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4699082A (en) * 1983-02-25 1987-10-13 Liburdi Engineering Limited Apparatus for chemical vapor deposition
US4803127A (en) * 1983-02-25 1989-02-07 Liburdi Engineering Limited Vapor deposition of metal compound coating utilizing metal sub-halides and coated metal article
US9905414B2 (en) 2000-09-28 2018-02-27 President And Fellows Of Harvard College Vapor deposition of metal oxides, silicates and phosphates, and silicon dioxide

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS54109098A (en) * 1978-02-15 1979-08-27 Hitachi Metals Ltd Method of manufacturing hafnium compound
EP0117542B1 (en) * 1983-02-25 1992-06-17 Liburdi Engineering Limited Chemical vapor deposition of metal compound coatings utilizing metal sub-halides
FR2612946B1 (en) * 1987-03-27 1993-02-19 Chimie Metal PROCESS AND PLANT FOR CHEMICAL DEPOSITION OF MODERATE TEMPERATURE ULTRADOR COATINGS
US5141773A (en) * 1990-11-05 1992-08-25 Northeastern University Method of forming a carbide on a carbon substrate
US5238711A (en) * 1990-11-05 1993-08-24 The President And Fellows Of Harvard College Method of coating carbon fibers with a carbide
CN111206234A (en) * 2020-02-21 2020-05-29 攀钢集团攀枝花钢铁研究院有限公司 Preparation method of titanium-based vanadium carbide coating
CN112358303A (en) * 2020-10-27 2021-02-12 中国科学院金属研究所 HfCxNyUltrahigh-temperature ceramic powder material and preparation method thereof

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
IT500087A (en) * 1952-03-17
DE1056449B (en) * 1954-03-12 1959-04-30 Metallgesellschaft Ag Process for the production of coatings from hard carbides
DE1948035A1 (en) * 1968-10-21 1970-04-30 Texas Instruments Inc Process for coating objects with a metal carbonitride
BE795014A (en) * 1972-02-11 1973-05-29 Gen Electric COATED AGGLOMERATED CARBIDE TYPE PRODUCTS

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4699082A (en) * 1983-02-25 1987-10-13 Liburdi Engineering Limited Apparatus for chemical vapor deposition
US4803127A (en) * 1983-02-25 1989-02-07 Liburdi Engineering Limited Vapor deposition of metal compound coating utilizing metal sub-halides and coated metal article
US9905414B2 (en) 2000-09-28 2018-02-27 President And Fellows Of Harvard College Vapor deposition of metal oxides, silicates and phosphates, and silicon dioxide

Also Published As

Publication number Publication date
FR2323773B1 (en) 1982-11-26
IT1065083B (en) 1985-02-25
FR2323773A1 (en) 1977-04-08
DE2619330A1 (en) 1977-03-17
JPS5236585A (en) 1977-03-19
CA1087041A (en) 1980-10-07

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Legal Events

Date Code Title Description
PS Patent sealed
PCNP Patent ceased through non-payment of renewal fee