GB1516900A - Process for the manufacture of hexamethyldisilazane - Google Patents
Process for the manufacture of hexamethyldisilazaneInfo
- Publication number
- GB1516900A GB1516900A GB5176976A GB5176976A GB1516900A GB 1516900 A GB1516900 A GB 1516900A GB 5176976 A GB5176976 A GB 5176976A GB 5176976 A GB5176976 A GB 5176976A GB 1516900 A GB1516900 A GB 1516900A
- Authority
- GB
- United Kingdom
- Prior art keywords
- hexamethyldisilazane
- me3sicl
- nh4cl
- disilazane
- silazane
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- FFUAGWLWBBFQJT-UHFFFAOYSA-N hexamethyldisilazane Chemical compound C[Si](C)(C)N[Si](C)(C)C FFUAGWLWBBFQJT-UHFFFAOYSA-N 0.000 title abstract 9
- 238000004519 manufacturing process Methods 0.000 title 1
- 238000000034 method Methods 0.000 title 1
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 abstract 12
- 229910000069 nitrogen hydride Inorganic materials 0.000 abstract 5
- NLXLAEXVIDQMFP-UHFFFAOYSA-N Ammonia chloride Chemical compound [NH4+].[Cl-] NLXLAEXVIDQMFP-UHFFFAOYSA-N 0.000 abstract 3
- 235000019270 ammonium chloride Nutrition 0.000 abstract 3
- IJOOHPMOJXWVHK-UHFFFAOYSA-N chlorotrimethylsilane Chemical compound C[Si](C)(C)Cl IJOOHPMOJXWVHK-UHFFFAOYSA-N 0.000 abstract 3
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 abstract 2
- 229910000077 silane Inorganic materials 0.000 abstract 2
- 239000002904 solvent Substances 0.000 abstract 2
- 229910021529 ammonia Inorganic materials 0.000 abstract 1
- 239000006227 byproduct Substances 0.000 abstract 1
- UQEAIHBTYFGYIE-UHFFFAOYSA-N hexamethyldisiloxane Chemical compound C[Si](C)(C)O[Si](C)(C)C UQEAIHBTYFGYIE-UHFFFAOYSA-N 0.000 abstract 1
- 238000011065 in-situ storage Methods 0.000 abstract 1
- 229920006395 saturated elastomer Polymers 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
- C07F7/0834—Compounds having one or more O-Si linkage
- C07F7/0838—Compounds with one or more Si-O-Si sequences
- C07F7/0872—Preparation and treatment thereof
- C07F7/0874—Reactions involving a bond of the Si-O-Si linkage
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
- C07F7/10—Compounds having one or more C—Si linkages containing nitrogen having a Si-N linkage
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
Abstract
1516900 Preparing hexamethyldisilazane T H GOLDSCHMIDT AG 10 Dec 1976 [9 Oct 1976] 51769/76 Heading C3S Hexamethyldisilazane is obtained by reaction of Me3SiCl with gaseous NH3 in hexamethyldisilazane as sole solvent and distilling the silazane fron the by-product NH4Cl. The solvent silazane may be obtained by reaction of not more than 50% of the total silane with ammonia, the remaining silane being added simultaneously with the stoichiometric amount of gaseous NH3 In three Examples Me3SiCl and NH3 are added in the stoichiometric ratio over 7 or 8 hours to Me3SiNHSiMe3 (which may have been prepared in situ, as above) saturated to a vapour pressure of 150 mmHg with NH3, or NH3 is passed for 3 hours into Me3SiCl in the disilazane. Disilazane is distilled off from the NH4Cl (85% yield), and the NH4Cl is then washed with dilute HCl to obtain hexamethyldisiloxane (10% yield).
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE19762645792 DE2645792C2 (en) | 1975-12-10 | 1976-10-09 | Process for the production of hexamethyldisilazane |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| GB1516900A true GB1516900A (en) | 1978-07-05 |
Family
ID=5990171
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| GB5176976A Expired GB1516900A (en) | 1976-10-09 | 1976-12-10 | Process for the manufacture of hexamethyldisilazane |
Country Status (2)
| Country | Link |
|---|---|
| ES (1) | ES456309A1 (en) |
| GB (1) | GB1516900A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104974184A (en) * | 2014-04-03 | 2015-10-14 | 信越化学工业株式会社 | Preparation Of Silazane Compound |
| CN109776596A (en) * | 2017-11-14 | 2019-05-21 | 石家庄圣泰化工有限公司 | The preparation method of 1,3- divinyl -1,1,3,3- tetramethyl-disilazane |
-
1976
- 1976-12-10 GB GB5176976A patent/GB1516900A/en not_active Expired
-
1977
- 1977-02-25 ES ES456309A patent/ES456309A1/en not_active Expired
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104974184A (en) * | 2014-04-03 | 2015-10-14 | 信越化学工业株式会社 | Preparation Of Silazane Compound |
| CN104974184B (en) * | 2014-04-03 | 2019-12-06 | 信越化学工业株式会社 | preparation of silazane Compounds |
| CN109776596A (en) * | 2017-11-14 | 2019-05-21 | 石家庄圣泰化工有限公司 | The preparation method of 1,3- divinyl -1,1,3,3- tetramethyl-disilazane |
Also Published As
| Publication number | Publication date |
|---|---|
| ES456309A1 (en) | 1978-01-16 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PS | Patent sealed | ||
| PCNP | Patent ceased through non-payment of renewal fee |