GB1469853A - Method of exposing a surface of a body provided with an electron resist thereon to an image in electrons - Google Patents

Method of exposing a surface of a body provided with an electron resist thereon to an image in electrons

Info

Publication number
GB1469853A
GB1469853A GB2077874A GB2077874A GB1469853A GB 1469853 A GB1469853 A GB 1469853A GB 2077874 A GB2077874 A GB 2077874A GB 2077874 A GB2077874 A GB 2077874A GB 1469853 A GB1469853 A GB 1469853A
Authority
GB
United Kingdom
Prior art keywords
photocathode
layer
frames
exposing
patterned
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB2077874A
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Philips Components Ltd
Original Assignee
Mullard Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mullard Ltd filed Critical Mullard Ltd
Priority to GB2077874A priority Critical patent/GB1469853A/en
Publication of GB1469853A publication Critical patent/GB1469853A/en
Expired legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/3002—Details
    • H01J37/3007—Electron or ion-optical systems
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
    • H01J37/3174—Particle-beam lithography, e.g. electron beam lithography
    • H01J37/3175—Projection methods, i.e. transfer substantially complete pattern to substrate
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J9/00—Apparatus or processes specially adapted for the manufacture, installation, removal, maintenance of electric discharge tubes, discharge lamps, or parts thereof; Recovery of material from discharge tubes or lamps
    • H01J9/20—Manufacture of screens on or from which an image or pattern is formed, picked up, converted or stored; Applying coatings to the vessel
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/20—Positioning, supporting, modifying or maintaining the physical state of objects being observed or treated
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30—Electron or ion beam tubes for processing objects
    • H01J2237/317—Processing objects on a microscale
    • H01J2237/3175—Lithography
    • H01J2237/31777—Lithography by projection
    • H01J2237/31779—Lithography by projection from patterned photocathode

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Nanotechnology (AREA)
  • Manufacturing & Machinery (AREA)
  • Physics & Mathematics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Analytical Chemistry (AREA)
  • Mathematical Physics (AREA)
  • Theoretical Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Image-Pickup Tubes, Image-Amplification Tubes, And Storage Tubes (AREA)

Abstract

1469853 Semi-conductor device manufacture MULLARD Ltd 10 May 1974 20778/74 Heading H1K In a method of exposing an electron resist coated surface of a body (e.g. of semi-conductor) to an electron image generated by a patterned photocathode arranged opposite and, e.g. 2 cm., from said surface and held at a negative potential with respect thereto a surface of a holder for the body or the photocathode is maintained at a potential intermediate those of the photocathode and body. Two suitable apparatus for performing the method are described, comprising a focusing coil 24 (Fig. 2) around an insulating chamber 2 with end ports sealed off by holders of identical structure for the body and photocathode respectively. In the arrangement shown each holder comprises a metal frame (11) with an insulating layer (38) against which, e.g. the photocathode 3 is urged by springs 13 electrically connecting it to a metal layer 39 insulated at 40 from the frame, thus enabling appropriate biasing by the voltage sources shown. In the other arrangement the photocathode and body directly abut the respective frames which they electrically contact by similar springs, while the facing surfaces of the frames carry conductive layers insulated therefrom and externally connected via wires extending through the frames. The photocathode comprises a quartz plate, transparent Ti layer 8, patterned Au masking layer 9 and layer 10 of CsI and is illuminated with u.v. light as shown.
GB2077874A 1974-05-10 1974-05-10 Method of exposing a surface of a body provided with an electron resist thereon to an image in electrons Expired GB1469853A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
GB2077874A GB1469853A (en) 1974-05-10 1974-05-10 Method of exposing a surface of a body provided with an electron resist thereon to an image in electrons

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB2077874A GB1469853A (en) 1974-05-10 1974-05-10 Method of exposing a surface of a body provided with an electron resist thereon to an image in electrons

Publications (1)

Publication Number Publication Date
GB1469853A true GB1469853A (en) 1977-04-06

Family

ID=10151538

Family Applications (1)

Application Number Title Priority Date Filing Date
GB2077874A Expired GB1469853A (en) 1974-05-10 1974-05-10 Method of exposing a surface of a body provided with an electron resist thereon to an image in electrons

Country Status (1)

Country Link
GB (1) GB1469853A (en)

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Legal Events

Date Code Title Description
PS Patent sealed
PCNP Patent ceased through non-payment of renewal fee