GB1465819A - Method for the formation of hard metal deposits - Google Patents

Method for the formation of hard metal deposits

Info

Publication number
GB1465819A
GB1465819A GB1709274A GB1709274A GB1465819A GB 1465819 A GB1465819 A GB 1465819A GB 1709274 A GB1709274 A GB 1709274A GB 1709274 A GB1709274 A GB 1709274A GB 1465819 A GB1465819 A GB 1465819A
Authority
GB
United Kingdom
Prior art keywords
metal
halide
deposit
oxygen
hard metal
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB1709274A
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Chemetal Corp
Original Assignee
Chemetal Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Chemetal Corp filed Critical Chemetal Corp
Publication of GB1465819A publication Critical patent/GB1465819A/en
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C30/00—Coating with metallic material characterised only by the composition of the metallic material, i.e. not characterised by the coating process
    • C23C30/005—Coating with metallic material characterised only by the composition of the metallic material, i.e. not characterised by the coating process on hard metal substrates

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
  • Cutting Tools, Boring Holders, And Turrets (AREA)

Abstract

1465819 Chemical vapour deposition of hard metal coatings CHEMETAL CORP 18 April 1974 [7 May 1973] 17092/74 Heading C7F In the chemical vapour deposition of hard metal on a substrate, a gaseous volatile halide of a Group IVA, VA or VIA metal is reacted with oxygen or an oxygen containing substance when the metal is W or Mo or with an oxygen free reducing agent when the metal is other than W or Mo, to deposit a liquid phase metal compound which is reacted with a B, Si or C containing gas which also includes hydrogen when the metal is W or Mo. With W or Mo halides the liquid phase may be an oxide or oxyhalide formed by reacting the halide up to 1000‹C with oxygen, water, CO, alcohols, ketones, ethers, ethylene oxide, or CO saturated with water vapour. With the other metals i.e. Ti, Zr, Hf, V, Nb, Ta and Cr a lower halide liquid phase is formed by reducing the halide either by passing it through metal chips or by reduction with hydrogen above 700‹C. The liquid deposit is then reacted with a B, C or Si containing gas which is preferably present in the initial halide gas mixture so that the deposit is formed in a one stage process. The substrates may be graphite, refracting oxides, cemented WC, W, Mo, Ti or Fe, Ni or Co base alloys. A diffusion coating of B, Si, C or N2 may be formed on the Fe, Co or Ni base alloys by pre-treating with e.g. boron chloride and hydrogen above 600 C, before depositing the hard metal. The substrate may also be stripped from the deposit to form a free standing hard metal.
GB1709274A 1973-05-07 1974-04-18 Method for the formation of hard metal deposits Expired GB1465819A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US35811073A 1973-05-07 1973-05-07

Publications (1)

Publication Number Publication Date
GB1465819A true GB1465819A (en) 1977-03-02

Family

ID=23408352

Family Applications (1)

Application Number Title Priority Date Filing Date
GB1709274A Expired GB1465819A (en) 1973-05-07 1974-04-18 Method for the formation of hard metal deposits

Country Status (5)

Country Link
JP (1) JPS5757552B2 (en)
CA (1) CA1052639A (en)
DE (1) DE2421131C2 (en)
GB (1) GB1465819A (en)
SE (1) SE408716B (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2256876A (en) * 1991-06-18 1992-12-23 Mtu Muenchen Gmbh Aluminium gas diffusion coating using heated aluminium particles

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5284875U (en) * 1975-12-22 1977-06-24
US4268582A (en) * 1979-03-02 1981-05-19 General Electric Company Boride coated cemented carbide
JPS59110146A (en) * 1982-12-16 1984-06-26 Toshiba Corp Outer lead terminal of package type module
JPS607759A (en) * 1983-06-28 1985-01-16 Internatl Rectifier Corp Japan Ltd Manufacture of semiconductor device
JPH0278265A (en) * 1988-09-14 1990-03-19 Nippon Inter Electronics Corp Lead frame and compound semiconductor device provided therewith

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2887407A (en) * 1957-08-05 1959-05-19 Manufacturers Chemical Corp Preparation of diffusion coatings on metals
US3574672A (en) * 1964-08-05 1971-04-13 Texas Instruments Inc Cvd process for producing tungsten carbide and article of manufacture
US3658577A (en) * 1969-10-01 1972-04-25 Gene F Wakefield Vapor phase deposition of silicide refractory coatings

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2256876A (en) * 1991-06-18 1992-12-23 Mtu Muenchen Gmbh Aluminium gas diffusion coating using heated aluminium particles
GB2256876B (en) * 1991-06-18 1995-03-22 Mtu Muenchen Gmbh Method of gas diffusion coating

Also Published As

Publication number Publication date
SE408716B (en) 1979-07-02
CA1052639A (en) 1979-04-17
JPS5014549A (en) 1975-02-15
JPS5757552B2 (en) 1982-12-04
DE2421131C2 (en) 1983-06-01
DE2421131A1 (en) 1974-11-28

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Legal Events

Date Code Title Description
PS Patent sealed
732 Registration of transactions, instruments or events in the register (sect. 32/1977)
PCNP Patent ceased through non-payment of renewal fee