GB1442346A - Polymers and light-sensitive elements containing them - Google Patents
Polymers and light-sensitive elements containing themInfo
- Publication number
- GB1442346A GB1442346A GB4873373A GB4873373A GB1442346A GB 1442346 A GB1442346 A GB 1442346A GB 4873373 A GB4873373 A GB 4873373A GB 4873373 A GB4873373 A GB 4873373A GB 1442346 A GB1442346 A GB 1442346A
- Authority
- GB
- United Kingdom
- Prior art keywords
- polymers
- polymer
- methacrylate
- prepared
- light
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 229920000642 polymer Polymers 0.000 title abstract 7
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 abstract 6
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 abstract 3
- SOGAXMICEFXMKE-UHFFFAOYSA-N Butylmethacrylate Chemical compound CCCCOC(=O)C(C)=C SOGAXMICEFXMKE-UHFFFAOYSA-N 0.000 abstract 2
- YLQBMQCUIZJEEH-UHFFFAOYSA-N Furan Chemical compound C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 abstract 2
- UFWIBTONFRDIAS-UHFFFAOYSA-N Naphthalene Chemical compound C1=CC=CC2=CC=CC=C21 UFWIBTONFRDIAS-UHFFFAOYSA-N 0.000 abstract 2
- SMWDFEZZVXVKRB-UHFFFAOYSA-N Quinoline Chemical compound N1=CC=CC2=CC=CC=C21 SMWDFEZZVXVKRB-UHFFFAOYSA-N 0.000 abstract 2
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 abstract 2
- YTPLMLYBLZKORZ-UHFFFAOYSA-N Thiophene Chemical compound C=1C=CSC=1 YTPLMLYBLZKORZ-UHFFFAOYSA-N 0.000 abstract 2
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 abstract 2
- MWPLVEDNUUSJAV-UHFFFAOYSA-N anthracene Chemical compound C1=CC=CC2=CC3=CC=CC=C3C=C21 MWPLVEDNUUSJAV-UHFFFAOYSA-N 0.000 abstract 2
- CUFNKYGDVFVPHO-UHFFFAOYSA-N azulene Chemical compound C1=CC=CC2=CC=CC2=C1 CUFNKYGDVFVPHO-UHFFFAOYSA-N 0.000 abstract 2
- UHOVQNZJYSORNB-UHFFFAOYSA-N monobenzene Natural products C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 abstract 2
- 229920002818 (Hydroxyethyl)methacrylate Polymers 0.000 abstract 1
- PXPBDJVBNWDUFM-UHFFFAOYSA-N 2,3,4,6-tetranitrophenol Chemical compound OC1=C([N+]([O-])=O)C=C([N+]([O-])=O)C([N+]([O-])=O)=C1[N+]([O-])=O PXPBDJVBNWDUFM-UHFFFAOYSA-N 0.000 abstract 1
- JOERSAVCLPYNIZ-UHFFFAOYSA-N 2,4,5,7-tetranitrofluoren-9-one Chemical compound O=C1C2=CC([N+]([O-])=O)=CC([N+]([O-])=O)=C2C2=C1C=C([N+](=O)[O-])C=C2[N+]([O-])=O JOERSAVCLPYNIZ-UHFFFAOYSA-N 0.000 abstract 1
- OMIGHNLMNHATMP-UHFFFAOYSA-N 2-hydroxyethyl prop-2-enoate Chemical compound OCCOC(=O)C=C OMIGHNLMNHATMP-UHFFFAOYSA-N 0.000 abstract 1
- HDECRAPHCDXMIJ-UHFFFAOYSA-N 2-methylbenzenesulfonyl chloride Chemical compound CC1=CC=CC=C1S(Cl)(=O)=O HDECRAPHCDXMIJ-UHFFFAOYSA-N 0.000 abstract 1
- CUARLQDWYSRQDF-UHFFFAOYSA-N 5-Nitroacenaphthene Chemical compound C1CC2=CC=CC3=C2C1=CC=C3[N+](=O)[O-] CUARLQDWYSRQDF-UHFFFAOYSA-N 0.000 abstract 1
- WOBHKFSMXKNTIM-UHFFFAOYSA-N Hydroxyethyl methacrylate Chemical compound CC(=C)C(=O)OCCO WOBHKFSMXKNTIM-UHFFFAOYSA-N 0.000 abstract 1
- VVQNEPGJFQJSBK-UHFFFAOYSA-N Methyl methacrylate Chemical compound COC(=O)C(C)=C VVQNEPGJFQJSBK-UHFFFAOYSA-N 0.000 abstract 1
- RFFFKMOABOFIDF-UHFFFAOYSA-N Pentanenitrile Chemical compound CCCCC#N RFFFKMOABOFIDF-UHFFFAOYSA-N 0.000 abstract 1
- 235000010724 Wisteria floribunda Nutrition 0.000 abstract 1
- CWRYPZZKDGJXCA-UHFFFAOYSA-N acenaphthene Chemical compound C1=CC(CC2)=C3C2=CC=CC3=C1 CWRYPZZKDGJXCA-UHFFFAOYSA-N 0.000 abstract 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 abstract 1
- 229910052782 aluminium Inorganic materials 0.000 abstract 1
- 239000004411 aluminium Substances 0.000 abstract 1
- 125000003118 aryl group Chemical group 0.000 abstract 1
- 150000001555 benzenes Chemical class 0.000 abstract 1
- 239000011248 coating agent Substances 0.000 abstract 1
- 238000000576 coating method Methods 0.000 abstract 1
- 229920001577 copolymer Polymers 0.000 abstract 1
- 150000001907 coumarones Chemical class 0.000 abstract 1
- 125000004435 hydrogen atom Chemical group [H]* 0.000 abstract 1
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 abstract 1
- 229910052753 mercury Inorganic materials 0.000 abstract 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 abstract 1
- 239000000178 monomer Substances 0.000 abstract 1
- IEQIEDJGQAUEQZ-UHFFFAOYSA-N phthalocyanine Chemical compound N1C(N=C2C3=CC=CC=C3C(N=C3C4=CC=CC=C4C(=N4)N3)=N2)=C(C=CC=C2)C2=C1N=C1C2=CC=CC=C2C4=N1 IEQIEDJGQAUEQZ-UHFFFAOYSA-N 0.000 abstract 1
- YBBRCQOCSYXUOC-UHFFFAOYSA-N sulfuryl dichloride Chemical compound ClS(Cl)(=O)=O YBBRCQOCSYXUOC-UHFFFAOYSA-N 0.000 abstract 1
- 229930192474 thiophene Natural products 0.000 abstract 1
- 239000011787 zinc oxide Substances 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S526/00—Synthetic resins or natural rubbers -- part of the class 520 series
- Y10S526/923—Ethylenic monomers containing at least one salt group
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP47103550A JPS4963419A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1972-10-18 | 1972-10-18 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| GB1442346A true GB1442346A (en) | 1976-07-14 |
Family
ID=14356919
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| GB4873373A Expired GB1442346A (en) | 1972-10-18 | 1973-10-18 | Polymers and light-sensitive elements containing them |
Country Status (4)
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB2351498A (en) * | 1999-06-26 | 2001-01-03 | Hyundai Electronics Ind | Benzenesulphonyloxyalkyl (meth)acrylate polymers |
| CN101685255B (zh) * | 2008-09-22 | 2013-04-03 | 富士胶片株式会社 | 着色感光性组合物、滤色器及液晶显示装置 |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB8512998D0 (en) * | 1985-05-22 | 1985-06-26 | Ciba Geigy Ag | Production of images |
| US5204451A (en) * | 1990-08-13 | 1993-04-20 | Baxter International Inc. | Activating hydroxyl groups of polymeric carriers using 4-fluorobenzenesulfonyl chloride for binding biologically active ligands |
| CN1110068C (zh) * | 1997-11-28 | 2003-05-28 | 松下电器产业株式会社 | 半导体杂质的激活方法以及激活装置 |
| EP1951769B1 (en) * | 2005-11-11 | 2009-03-18 | Canon Kabushiki Kaisha | Polymer having sulfonic acid group or sulfonic acid ester group and amide group, and toner for developing electrostatic latent image having the polymer |
| US7968650B2 (en) | 2006-10-31 | 2011-06-28 | Johnson & Johnson Vision Care, Inc. | Polymeric compositions comprising at least one volume excluding polymer |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2694699A (en) | 1952-02-15 | 1954-11-16 | Eastman Kodak Co | Alpha-sulfonoxy acrylates and polymers thereof |
| NL83360C (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1953-03-11 | 1956-06-15 | ||
| BE566000A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1957-03-25 | |||
| NL275031A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1961-03-02 |
-
1972
- 1972-10-18 JP JP47103550A patent/JPS4963419A/ja active Pending
-
1973
- 1973-10-16 US US05/407,034 patent/US4438245A/en not_active Expired - Lifetime
- 1973-10-18 DE DE19732352348 patent/DE2352348A1/de active Pending
- 1973-10-18 GB GB4873373A patent/GB1442346A/en not_active Expired
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB2351498A (en) * | 1999-06-26 | 2001-01-03 | Hyundai Electronics Ind | Benzenesulphonyloxyalkyl (meth)acrylate polymers |
| GB2351498B (en) * | 1999-06-26 | 2004-09-08 | Hyundai Electronics Ind | Organic anti-reflective polymer and preparation thereof |
| US6956091B2 (en) | 1999-06-26 | 2005-10-18 | Hyundai Electronics Industries Co., Ltd. | Organic anti-reflective polymer and preparation thereof |
| CN101685255B (zh) * | 2008-09-22 | 2013-04-03 | 富士胶片株式会社 | 着色感光性组合物、滤色器及液晶显示装置 |
Also Published As
| Publication number | Publication date |
|---|---|
| US4438245A (en) | 1984-03-20 |
| DE2352348A1 (de) | 1974-05-09 |
| JPS4963419A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1974-06-19 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US3893127A (en) | Electron beam recording media | |
| JP3016533B2 (ja) | フォトクロミック組成物 | |
| GB1395822A (en) | Photosensitive compositions | |
| GB1404497A (en) | Photosensitive coating materials | |
| KR900010461A (ko) | 감광성 조성물 | |
| KR840001343A (ko) | 방사(radiation)중합성 혼합물과 이들로부터 제조되는 광중합성복사물 | |
| US3556792A (en) | Novel substituted allyl polymer derivatives useful as photoresists | |
| EP0628599A4 (en) | PHOTO-SENSITIVE RESIN COMPOSITION FOR COLOR FILTERS. | |
| GB1442346A (en) | Polymers and light-sensitive elements containing them | |
| JPS5748736A (en) | Flexible photosensitive layer containing polymer binder | |
| GB1273746A (en) | Unsaturated photochromic monomers and polymers prepared therefrom | |
| US3933885A (en) | Cinnamylideneacetic acid esters | |
| KR920004449A (ko) | 광학재료 | |
| KR910008176A (ko) | 이온 도전성 중합체 전해질 | |
| US3957725A (en) | Active matrix and intrinsic photoconductive polymer | |
| GB1447142A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | ||
| JPS60238827A (ja) | 感光性樹脂組成物 | |
| GB1278775A (en) | Light-sensitive photographic material | |
| US3770443A (en) | Photosensitive composition comprising a photosensitive polymer | |
| US4245027A (en) | Light-sensitive image recording material and dry process for recording light image using the same | |
| BR8304534A (pt) | Composicao de polimero elastomerico foto-sensivel para producao de chapas de impressao flexograficas processaveis em solucoes basicas semi-aquosas ou sistemas de solventes | |
| GB1377740A (en) | Light-sensitive polymers monomers from which the polymers are formed and image-forming method using the polymers | |
| JPS56107237A (en) | Photosensitive printing plate | |
| US3993624A (en) | Light-sensitive high molecular weight compound capable of being cross-linked by irradiation with light or an electron beam | |
| MX9305047A (es) | Composicion de capa protectora fotosensible negativa. |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PS | Patent sealed [section 19, patents act 1949] | ||
| PCNP | Patent ceased through non-payment of renewal fee |