GB1421805A - Method of forming a positive resist - Google Patents
Method of forming a positive resistInfo
- Publication number
- GB1421805A GB1421805A GB4110673A GB4110673A GB1421805A GB 1421805 A GB1421805 A GB 1421805A GB 4110673 A GB4110673 A GB 4110673A GB 4110673 A GB4110673 A GB 4110673A GB 1421805 A GB1421805 A GB 1421805A
- Authority
- GB
- United Kingdom
- Prior art keywords
- ene
- polymers
- olefine
- sulphur dioxide
- forming
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000000034 method Methods 0.000 title abstract 2
- 229920000642 polymer Polymers 0.000 abstract 3
- RAHZWNYVWXNFOC-UHFFFAOYSA-N sulfur dioxide Inorganic materials O=S=O RAHZWNYVWXNFOC-UHFFFAOYSA-N 0.000 abstract 3
- VXNZUUAINFGPBY-UHFFFAOYSA-N 1-Butene Chemical compound CCC=C VXNZUUAINFGPBY-UHFFFAOYSA-N 0.000 abstract 2
- LIKMAJRDDDTEIG-UHFFFAOYSA-N 1-hexene Chemical compound CCCCC=C LIKMAJRDDDTEIG-UHFFFAOYSA-N 0.000 abstract 2
- OZAIFHULBGXAKX-UHFFFAOYSA-N 2-(2-cyanopropan-2-yldiazenyl)-2-methylpropanenitrile Chemical compound N#CC(C)(C)N=NC(C)(C)C#N OZAIFHULBGXAKX-UHFFFAOYSA-N 0.000 abstract 2
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 abstract 2
- LPIQUOYDBNQMRZ-UHFFFAOYSA-N cyclopentene Chemical compound C1CC=CC1 LPIQUOYDBNQMRZ-UHFFFAOYSA-N 0.000 abstract 2
- YWAKXRMUMFPDSH-UHFFFAOYSA-N pentene Chemical compound CCCC=C YWAKXRMUMFPDSH-UHFFFAOYSA-N 0.000 abstract 2
- 239000004291 sulphur dioxide Substances 0.000 abstract 2
- DMAYBPBPEUFIHJ-UHFFFAOYSA-N 4-bromobut-1-ene Chemical compound BrCCC=C DMAYBPBPEUFIHJ-UHFFFAOYSA-N 0.000 abstract 1
- 125000002723 alicyclic group Chemical group 0.000 abstract 1
- 125000000217 alkyl group Chemical group 0.000 abstract 1
- 125000003118 aryl group Chemical group 0.000 abstract 1
- 239000003054 catalyst Substances 0.000 abstract 1
- IAQRGUVFOMOMEM-ARJAWSKDSA-N cis-but-2-ene Chemical compound C\C=C/C IAQRGUVFOMOMEM-ARJAWSKDSA-N 0.000 abstract 1
- 238000010438 heat treatment Methods 0.000 abstract 1
- RGSFGYAAUTVSQA-UHFFFAOYSA-N pentamethylene Natural products C1CCCC1 RGSFGYAAUTVSQA-UHFFFAOYSA-N 0.000 abstract 1
- 125000000547 substituted alkyl group Chemical group 0.000 abstract 1
- 235000010269 sulphur dioxide Nutrition 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Manufacturing Of Printed Circuit Boards (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US30623472A | 1972-11-13 | 1972-11-13 |
Publications (1)
Publication Number | Publication Date |
---|---|
GB1421805A true GB1421805A (en) | 1976-01-21 |
Family
ID=23184410
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB4110673A Expired GB1421805A (en) | 1972-11-13 | 1973-08-31 | Method of forming a positive resist |
Country Status (5)
Country | Link |
---|---|
JP (1) | JPS4979525A (enrdf_load_stackoverflow) |
CA (1) | CA1286905C (enrdf_load_stackoverflow) |
DE (1) | DE2355701A1 (enrdf_load_stackoverflow) |
FR (1) | FR2206527B1 (enrdf_load_stackoverflow) |
GB (1) | GB1421805A (enrdf_load_stackoverflow) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3893127A (en) * | 1973-09-27 | 1975-07-01 | Rca Corp | Electron beam recording media |
EP0268595B1 (en) * | 1986-03-24 | 1992-06-10 | AT&T Corp. | Pattern transfer process for fabricating integrated-circuit devices |
DE19917790A1 (de) * | 1999-04-20 | 2000-11-02 | Hoechst Trespaphan Gmbh | Biaxial orientierte Folie für die Herstellung von Keramikkondensatoren |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3535137A (en) * | 1967-01-13 | 1970-10-20 | Ibm | Method of fabricating etch resistant masks |
SE391405B (sv) * | 1972-05-01 | 1977-02-14 | Western Electric Co | Forfarande for astadkommande av resistmonster pa ett substrat |
-
1973
- 1973-08-31 GB GB4110673A patent/GB1421805A/en not_active Expired
- 1973-09-19 FR FR7334210A patent/FR2206527B1/fr not_active Expired
- 1973-10-26 CA CA 184354 patent/CA1286905C/en not_active Expired
- 1973-10-26 JP JP12003673A patent/JPS4979525A/ja active Pending
- 1973-11-07 DE DE19732355701 patent/DE2355701A1/de active Pending
Also Published As
Publication number | Publication date |
---|---|
JPS4979525A (enrdf_load_stackoverflow) | 1974-08-01 |
FR2206527B1 (enrdf_load_stackoverflow) | 1978-01-13 |
CA1286905C (en) | 1991-07-30 |
DE2355701A1 (de) | 1974-05-16 |
FR2206527A1 (enrdf_load_stackoverflow) | 1974-06-07 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PS | Patent sealed | ||
PCNP | Patent ceased through non-payment of renewal fee |