GB1412477A - Perfluoroalkylamindalkanols process for their manufacture and their use - Google Patents
Perfluoroalkylamindalkanols process for their manufacture and their useInfo
- Publication number
- GB1412477A GB1412477A GB5469973A GB5469973A GB1412477A GB 1412477 A GB1412477 A GB 1412477A GB 5469973 A GB5469973 A GB 5469973A GB 5469973 A GB5469973 A GB 5469973A GB 1412477 A GB1412477 A GB 1412477A
- Authority
- GB
- United Kingdom
- Prior art keywords
- perfluorooctyl
- amine
- general formula
- radical
- perfluoroalkylaminoalkanols
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D295/00—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms
- C07D295/04—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms
- C07D295/08—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms substituted by singly bound oxygen or sulfur atoms
- C07D295/084—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms substituted by singly bound oxygen or sulfur atoms with the ring nitrogen atoms and the oxygen or sulfur atoms attached to the same carbon chain, which is not interrupted by carbocyclic rings
- C07D295/088—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms substituted by singly bound oxygen or sulfur atoms with the ring nitrogen atoms and the oxygen or sulfur atoms attached to the same carbon chain, which is not interrupted by carbocyclic rings to an acyclic saturated chain
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D203/00—Heterocyclic compounds containing three-membered rings with one nitrogen atom as the only ring hetero atom
- C07D203/04—Heterocyclic compounds containing three-membered rings with one nitrogen atom as the only ring hetero atom not condensed with other rings
- C07D203/06—Heterocyclic compounds containing three-membered rings with one nitrogen atom as the only ring hetero atom not condensed with other rings having no double bonds between ring members or between ring members and non-ring members
- C07D203/08—Heterocyclic compounds containing three-membered rings with one nitrogen atom as the only ring hetero atom not condensed with other rings having no double bonds between ring members or between ring members and non-ring members with only hydrogen atoms, hydrocarbon or substituted hydrocarbon radicals, directly attached to the ring nitrogen atom
- C07D203/10—Radicals substituted by singly bound oxygen atoms
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Materials Applied To Surfaces To Minimize Adherence Of Mist Or Water (AREA)
Abstract
1412477 Perfluoroalkylaminoalkanols CIBAGEIGY AG 26 Nov 1973 [28 Sept 1972] 54699/73 Heading C2C Perfluoroalkylaminoalkanols of general formula where R f is a C 4-14 perfluorinated hydrocarbon radical; R is H or CH 3 ; R 1 and R 2 are each H, C 1-18 alkyl, C 5-6 cycloalkyl, C 1-10 hydroxyalkyl or alkoxyalkyl or the radical or R 1 and R 2 , together with the N-atom to which they are attached, form a heterocyclic ring of 3-6 members, are prepared by reacting an epoxide of general formula or a chlorohydrin of general formula with an amine R 1 R 2 NH, preferably at 20- 150‹ C. in an inert solvent in the presence of an alkali. Preferred compounds have R f as C 6 F 13 to C 12 F 25 radical, and R 1 and R 2 representing H, C 1-6 alkyl, C 2-6 hydroxyalkyl or together forming an aziridine, piperidine, morpholine or piperazine ring. Amongst the examples the following compounds are prepared:-1-perfluorooctyl - 2 - piperidinoethanol, 1 - perfluorooctyl - 2 - butylaminoethanol, bis - (perfluorooctyl - diethanol) amine and tris - (perfluorooctyl-triethanol)amine.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CH1729472A CH576936A5 (en) | 1972-11-28 | 1972-11-28 |
Publications (1)
Publication Number | Publication Date |
---|---|
GB1412477A true GB1412477A (en) | 1975-11-05 |
Family
ID=4424294
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB5469973A Expired GB1412477A (en) | 1972-11-28 | 1973-11-26 | Perfluoroalkylamindalkanols process for their manufacture and their use |
Country Status (8)
Country | Link |
---|---|
JP (1) | JPS4982612A (en) |
BE (1) | BE807848A (en) |
CA (1) | CA1018976A (en) |
CH (1) | CH576936A5 (en) |
DE (1) | DE2357780A1 (en) |
FR (1) | FR2207907B1 (en) |
GB (1) | GB1412477A (en) |
SU (1) | SU510993A3 (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7468236B2 (en) * | 2005-10-14 | 2008-12-23 | Shin-Etsu Chemical Co., Ltd. | Amine compound, chemically amplified resist composition and patterning process |
CN102796014A (en) * | 2012-09-07 | 2012-11-28 | 山东大学 | Preparation method of perfluorohexyl-containing tribasic alcohol |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6020425B2 (en) * | 1976-06-28 | 1985-05-22 | ダイキン工業株式会社 | Polishing composition |
EP0002004B1 (en) * | 1977-11-07 | 1982-03-24 | Ciba-Geigy Ag | Process for the manufacture of fluorinated cationic compounds and their use as surfactants |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2023562A1 (en) * | 1968-11-18 | 1970-08-21 | Daikin Ind Ltd |
-
1972
- 1972-11-28 CH CH1729472A patent/CH576936A5/xx unknown
-
1973
- 1973-11-20 DE DE19732357780 patent/DE2357780A1/en active Pending
- 1973-11-20 CA CA186,291A patent/CA1018976A/en not_active Expired
- 1973-11-26 SU SU1970287A patent/SU510993A3/en active
- 1973-11-26 GB GB5469973A patent/GB1412477A/en not_active Expired
- 1973-11-26 FR FR7342014A patent/FR2207907B1/fr not_active Expired
- 1973-11-27 BE BE138207A patent/BE807848A/en unknown
- 1973-11-28 JP JP48132840A patent/JPS4982612A/ja active Pending
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7468236B2 (en) * | 2005-10-14 | 2008-12-23 | Shin-Etsu Chemical Co., Ltd. | Amine compound, chemically amplified resist composition and patterning process |
CN102796014A (en) * | 2012-09-07 | 2012-11-28 | 山东大学 | Preparation method of perfluorohexyl-containing tribasic alcohol |
Also Published As
Publication number | Publication date |
---|---|
CH576936A5 (en) | 1976-06-30 |
CA1018976A (en) | 1977-10-11 |
SU510993A3 (en) | 1976-04-15 |
JPS4982612A (en) | 1974-08-08 |
BE807848A (en) | 1974-05-27 |
FR2207907B1 (en) | 1978-03-10 |
FR2207907A1 (en) | 1974-06-21 |
DE2357780A1 (en) | 1974-05-30 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PS | Patent sealed | ||
PCNP | Patent ceased through non-payment of renewal fee |