JPS4982612A - - Google Patents

Info

Publication number
JPS4982612A
JPS4982612A JP48132840A JP13284073A JPS4982612A JP S4982612 A JPS4982612 A JP S4982612A JP 48132840 A JP48132840 A JP 48132840A JP 13284073 A JP13284073 A JP 13284073A JP S4982612 A JPS4982612 A JP S4982612A
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP48132840A
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPS4982612A publication Critical patent/JPS4982612A/ja
Pending legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D295/00Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms
    • C07D295/04Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms
    • C07D295/08Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms substituted by singly bound oxygen or sulfur atoms
    • C07D295/084Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms substituted by singly bound oxygen or sulfur atoms with the ring nitrogen atoms and the oxygen or sulfur atoms attached to the same carbon chain, which is not interrupted by carbocyclic rings
    • C07D295/088Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms substituted by singly bound oxygen or sulfur atoms with the ring nitrogen atoms and the oxygen or sulfur atoms attached to the same carbon chain, which is not interrupted by carbocyclic rings to an acyclic saturated chain
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D203/00Heterocyclic compounds containing three-membered rings with one nitrogen atom as the only ring hetero atom
    • C07D203/04Heterocyclic compounds containing three-membered rings with one nitrogen atom as the only ring hetero atom not condensed with other rings
    • C07D203/06Heterocyclic compounds containing three-membered rings with one nitrogen atom as the only ring hetero atom not condensed with other rings having no double bonds between ring members or between ring members and non-ring members
    • C07D203/08Heterocyclic compounds containing three-membered rings with one nitrogen atom as the only ring hetero atom not condensed with other rings having no double bonds between ring members or between ring members and non-ring members with only hydrogen atoms, hydrocarbon or substituted hydrocarbon radicals, directly attached to the ring nitrogen atom
    • C07D203/10Radicals substituted by singly bound oxygen atoms
JP48132840A 1972-11-28 1973-11-28 Pending JPS4982612A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CH1729472A CH576936A5 (en) 1972-11-28 1972-11-28

Publications (1)

Publication Number Publication Date
JPS4982612A true JPS4982612A (en) 1974-08-08

Family

ID=4424294

Family Applications (1)

Application Number Title Priority Date Filing Date
JP48132840A Pending JPS4982612A (en) 1972-11-28 1973-11-28

Country Status (8)

Country Link
JP (1) JPS4982612A (en)
BE (1) BE807848A (en)
CA (1) CA1018976A (en)
CH (1) CH576936A5 (en)
DE (1) DE2357780A1 (en)
FR (1) FR2207907B1 (en)
GB (1) GB1412477A (en)
SU (1) SU510993A3 (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS531691A (en) * 1976-06-28 1978-01-09 Daikin Ind Ltd Polishing composition
JP2007108451A (en) * 2005-10-14 2007-04-26 Shin Etsu Chem Co Ltd Amine compound, chemically amplified resist material, and pattern forming method

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0002004B1 (en) * 1977-11-07 1982-03-24 Ciba-Geigy Ag Process for the manufacture of fluorinated cationic compounds and their use as surfactants
CN102796014A (en) * 2012-09-07 2012-11-28 山东大学 Preparation method of perfluorohexyl-containing tribasic alcohol

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CH285170A4 (en) * 1968-11-18 1971-09-30

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS531691A (en) * 1976-06-28 1978-01-09 Daikin Ind Ltd Polishing composition
JPS6020425B2 (en) * 1976-06-28 1985-05-22 ダイキン工業株式会社 Polishing composition
JP2007108451A (en) * 2005-10-14 2007-04-26 Shin Etsu Chem Co Ltd Amine compound, chemically amplified resist material, and pattern forming method
JP4671035B2 (en) * 2005-10-14 2011-04-13 信越化学工業株式会社 Chemically amplified resist material and pattern forming method

Also Published As

Publication number Publication date
FR2207907B1 (en) 1978-03-10
CA1018976A (en) 1977-10-11
DE2357780A1 (en) 1974-05-30
SU510993A3 (en) 1976-04-15
CH576936A5 (en) 1976-06-30
GB1412477A (en) 1975-11-05
FR2207907A1 (en) 1974-06-21
BE807848A (en) 1974-05-27

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