GB1408709A - Retouching of photosensitive lithographic printing plates - Google Patents
Retouching of photosensitive lithographic printing platesInfo
- Publication number
- GB1408709A GB1408709A GB5950573A GB5950573A GB1408709A GB 1408709 A GB1408709 A GB 1408709A GB 5950573 A GB5950573 A GB 5950573A GB 5950573 A GB5950573 A GB 5950573A GB 1408709 A GB1408709 A GB 1408709A
- Authority
- GB
- United Kingdom
- Prior art keywords
- retouching
- photo
- lithographic printing
- printing plates
- photosensitive lithographic
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 abstract 2
- 150000002596 lactones Chemical class 0.000 abstract 2
- 239000007788 liquid Substances 0.000 abstract 2
- 239000002904 solvent Substances 0.000 abstract 2
- 229920002134 Carboxymethyl cellulose Polymers 0.000 abstract 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 abstract 1
- 235000010724 Wisteria floribunda Nutrition 0.000 abstract 1
- 239000002253 acid Substances 0.000 abstract 1
- 239000001768 carboxy methyl cellulose Substances 0.000 abstract 1
- 235000010948 carboxy methyl cellulose Nutrition 0.000 abstract 1
- 239000008112 carboxymethyl-cellulose Substances 0.000 abstract 1
- 229940105329 carboxymethylcellulose Drugs 0.000 abstract 1
- 239000003795 chemical substances by application Substances 0.000 abstract 1
- 239000013078 crystal Substances 0.000 abstract 1
- -1 methyl- Chemical group 0.000 abstract 1
- 238000000206 photolithography Methods 0.000 abstract 1
- 229920000036 polyvinylpyrrolidone Polymers 0.000 abstract 1
- 239000001267 polyvinylpyrrolidone Substances 0.000 abstract 1
- 235000013855 polyvinylpyrrolidone Nutrition 0.000 abstract 1
- OARRHUQTFTUEOS-UHFFFAOYSA-N safranin Chemical compound [Cl-].C=12C=C(N)C(C)=CC2=NC2=CC(C)=C(N)C=C2[N+]=1C1=CC=CC=C1 OARRHUQTFTUEOS-UHFFFAOYSA-N 0.000 abstract 1
- 239000000377 silicon dioxide Substances 0.000 abstract 1
- 239000004094 surface-active agent Substances 0.000 abstract 1
- 239000008096 xylene Substances 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
- G03F7/32—Liquid compositions therefor, e.g. developers
- G03F7/325—Non-aqueous compositions
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Printing Plates And Materials Therefor (AREA)
- Compositions Of Macromolecular Compounds (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP284073A JPS5133442B2 (enrdf_load_stackoverflow) | 1972-12-26 | 1972-12-26 |
Publications (1)
Publication Number | Publication Date |
---|---|
GB1408709A true GB1408709A (en) | 1975-10-01 |
Family
ID=11540594
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB5950573A Expired GB1408709A (en) | 1972-12-26 | 1973-12-21 | Retouching of photosensitive lithographic printing plates |
Country Status (3)
Country | Link |
---|---|
JP (1) | JPS5133442B2 (enrdf_load_stackoverflow) |
DE (1) | DE2364037C2 (enrdf_load_stackoverflow) |
GB (1) | GB1408709A (enrdf_load_stackoverflow) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4370406A (en) * | 1979-12-26 | 1983-01-25 | Richardson Graphics Company | Developers for photopolymer lithographic plates |
US4396703A (en) | 1979-03-15 | 1983-08-02 | Fuji Photo Film Co., Ltd. | Retouching agent for lithographic printing plate |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0224662A (ja) * | 1988-07-13 | 1990-01-26 | Konica Corp | 平版印刷版の処理方法 |
DE102004055113A1 (de) * | 2004-11-15 | 2006-05-18 | Kissel & Wolf Gmbh | Verfahren zur Hydrophilierung von Siebdruckschablonenträgern sowie Verfahren zur Entfernung von Schablonenmaterial von einem Siebdruckschablonenträger und Entschichtungsflüssigkeit hierfür |
-
1972
- 1972-12-26 JP JP284073A patent/JPS5133442B2/ja not_active Expired
-
1973
- 1973-12-21 GB GB5950573A patent/GB1408709A/en not_active Expired
- 1973-12-21 DE DE19732364037 patent/DE2364037C2/de not_active Expired
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4396703A (en) | 1979-03-15 | 1983-08-02 | Fuji Photo Film Co., Ltd. | Retouching agent for lithographic printing plate |
US4370406A (en) * | 1979-12-26 | 1983-01-25 | Richardson Graphics Company | Developers for photopolymer lithographic plates |
Also Published As
Publication number | Publication date |
---|---|
DE2364037A1 (de) | 1974-07-11 |
JPS4987404A (enrdf_load_stackoverflow) | 1974-08-21 |
JPS5133442B2 (enrdf_load_stackoverflow) | 1976-09-20 |
DE2364037C2 (de) | 1984-08-09 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PS | Patent sealed | ||
PE20 | Patent expired after termination of 20 years |
Effective date: 19931220 |