GB1392076A - Photosensitive polymers and elements - Google Patents

Photosensitive polymers and elements

Info

Publication number
GB1392076A
GB1392076A GB2791772A GB2791772A GB1392076A GB 1392076 A GB1392076 A GB 1392076A GB 2791772 A GB2791772 A GB 2791772A GB 2791772 A GB2791772 A GB 2791772A GB 1392076 A GB1392076 A GB 1392076A
Authority
GB
United Kingdom
Prior art keywords
elements
methacrylate
june
photosensitive polymers
acid chloride
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB2791772A
Other languages
English (en)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Holdings Corp
Original Assignee
Fuji Photo Film Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Photo Film Co Ltd filed Critical Fuji Photo Film Co Ltd
Publication of GB1392076A publication Critical patent/GB1392076A/en
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F20/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
    • C08F20/02—Monocarboxylic acids having less than ten carbon atoms, Derivatives thereof
    • C08F20/10—Esters
    • C08F20/26—Esters containing oxygen in addition to the carboxy oxygen
    • C08F20/30—Esters containing oxygen in addition to the carboxy oxygen containing aromatic rings in the alcohol moiety
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F20/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
    • C08F20/02—Monocarboxylic acids having less than ten carbon atoms, Derivatives thereof
    • C08F20/10—Esters
    • C08F20/34—Esters containing nitrogen, e.g. N,N-dimethylaminoethyl (meth)acrylate
    • C08F20/36—Esters containing nitrogen, e.g. N,N-dimethylaminoethyl (meth)acrylate containing oxygen in addition to the carboxy oxygen, e.g. 2-N-morpholinoethyl (meth)acrylate or 2-isocyanatoethyl (meth)acrylate
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer

Landscapes

  • Chemical & Material Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Polymers & Plastics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Polymerisation Methods In General (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Furan Compounds (AREA)
GB2791772A 1971-06-15 1972-06-14 Photosensitive polymers and elements Expired GB1392076A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP46042748A JPS51481B1 (https=) 1971-06-15 1971-06-15

Publications (1)

Publication Number Publication Date
GB1392076A true GB1392076A (en) 1975-04-23

Family

ID=12644621

Family Applications (1)

Application Number Title Priority Date Filing Date
GB2791772A Expired GB1392076A (en) 1971-06-15 1972-06-14 Photosensitive polymers and elements

Country Status (5)

Country Link
JP (1) JPS51481B1 (https=)
CA (1) CA958273A (https=)
DE (1) DE2229302A1 (https=)
FR (1) FR2141902A1 (https=)
GB (1) GB1392076A (https=)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5153095A (en) * 1988-09-21 1992-10-06 Fuji Photo Film Co., Ltd. Light-sensitive photopolymerizable composition containing polymer with ethylenic unsaturation in the side chain
CN101613276B (zh) * 2009-06-23 2012-12-26 苏州苏大欧罗新材料科技有限公司 彩色滤光片用彩色光阻剂
KR102939388B1 (ko) 2021-03-30 2026-03-13 도소 가부시키가이샤 불소계 수지, 조성물, 광 가교물, 및 그것을 구비한 전자 디바이스

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7271283B2 (en) * 2003-08-29 2007-09-18 General Electric Company High refractive index, UV-curable monomers and coating compositions prepared therefrom

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5153095A (en) * 1988-09-21 1992-10-06 Fuji Photo Film Co., Ltd. Light-sensitive photopolymerizable composition containing polymer with ethylenic unsaturation in the side chain
CN101613276B (zh) * 2009-06-23 2012-12-26 苏州苏大欧罗新材料科技有限公司 彩色滤光片用彩色光阻剂
KR102939388B1 (ko) 2021-03-30 2026-03-13 도소 가부시키가이샤 불소계 수지, 조성물, 광 가교물, 및 그것을 구비한 전자 디바이스

Also Published As

Publication number Publication date
FR2141902A1 (https=) 1973-01-26
DE2229302A1 (de) 1973-01-11
CA958273A (en) 1974-11-26
JPS51481B1 (https=) 1976-01-08

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Legal Events

Date Code Title Description
PS Patent sealed
PCNP Patent ceased through non-payment of renewal fee