GB1382841A - Electrodeposition - Google Patents

Electrodeposition

Info

Publication number
GB1382841A
GB1382841A GB1113772A GB1113772A GB1382841A GB 1382841 A GB1382841 A GB 1382841A GB 1113772 A GB1113772 A GB 1113772A GB 1113772 A GB1113772 A GB 1113772A GB 1382841 A GB1382841 A GB 1382841A
Authority
GB
United Kingdom
Prior art keywords
carbon atoms
formula
free
compound
acid
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB1113772A
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
OXY METAL FINISHING EUROP SA
Original Assignee
OXY METAL FINISHING EUROP SA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by OXY METAL FINISHING EUROP SA filed Critical OXY METAL FINISHING EUROP SA
Publication of GB1382841A publication Critical patent/GB1382841A/en
Expired legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00Electroplating: Baths therefor
    • C25D3/02Electroplating: Baths therefor from solutions

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electroplating And Plating Baths Therefor (AREA)

Abstract

1382841 Electro-plating OXY METAL FINISHING (EUROPE) SA 9 March 1972 [19 March 1971] 11137/72 Heading C7B An aqueous alkaline cyanide-free electroplating solution (e.g. for plating with Cu, Ni, Cd, or Co) includes a sulphur-free organic amino compound together with a sulphonate of Formula I or II as set out below:- wherein A is a single bond between N and S or a linear or branched aliphatic radical containing up to 12 carbon atoms, B is a mono- or poly-cyclic aromatic or cycloaliphatic radical containing from 5 to 14 carbon atoms, R 1 and R 2 are radicals, identical or different, selected from hydrogen and alkyl radicals containing from 1 to 6 carbon atoms, n amd m are each equal to 1, 2 or 3 and each of the interrupted lines represents 1, 2 or 3 valency bands. The sulphur-free organic amino compound may be ethylene diamine, diethylene triamine, tetramethyl, ethylenediamine, triethylene tetramine, triethanolamine, propylene diamine, cyclohexylamine or diamino cyclohexane. The may be added free or as salts with Hcl, H 2 SO 4 , H 3 PO 4 or AcOH. The compound of Formula I may be sulphamic acid of taurine. The compound of Formula II may be sulphanilic acid 1-aminobenzene- 2-sulphonic acid or 2-naphthylamine-4, 8 di-- sulphonic acid. The metal to be deposited may be included in the solution as sulphate,sulphamate, halide or acetate. Chloride may be incorporated in the bath, e.g. as di- or tri-methyamine hydrochloride or butylamine hydrochloride. Specified conditions are a pH of between 7.01 and 14, a temperature between room temperature and 80‹C and use of D.C. or periodically reversed D.C. with the length of the anodic phase not more than 1/6 that of the cathodic phase and with the amplitude of the anodic phase current equal to or less than that of the cathodic phase current.
GB1113772A 1971-03-19 1972-03-09 Electrodeposition Expired GB1382841A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CH411271A CH523968A (en) 1971-03-19 1971-03-19 Electrolytic bath for the electroplating of metals

Publications (1)

Publication Number Publication Date
GB1382841A true GB1382841A (en) 1975-02-05

Family

ID=4270028

Family Applications (1)

Application Number Title Priority Date Filing Date
GB1113772A Expired GB1382841A (en) 1971-03-19 1972-03-09 Electrodeposition

Country Status (4)

Country Link
CH (1) CH523968A (en)
DE (1) DE2213216A1 (en)
FR (1) FR2130632B1 (en)
GB (1) GB1382841A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1167583A2 (en) * 2000-06-30 2002-01-02 Ebara Corporation Copper-plating liquid, plating method and plating apparatus
CN102242381A (en) * 2011-06-29 2011-11-16 杭州阿玛尔科技有限公司 Alkaline non-cyanide copper plating solution with main coordination agent of methylenediphosphonate

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0860519A1 (en) 1997-02-12 1998-08-26 LUIGI STOPPANI S.p.A. Chromium plating from baths catalyzed with alkanedisulfonic-alkanesulfonic compounds with inhibitors such as aminoalkanesulfonic acids and heterocyclic bases

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1446034B2 (en) * 1961-06-15 1970-09-10 Riedel 4 Co, 4800 Bielefeld Acid galvanic copper baths

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1167583A2 (en) * 2000-06-30 2002-01-02 Ebara Corporation Copper-plating liquid, plating method and plating apparatus
EP1167583A3 (en) * 2000-06-30 2006-05-17 Ebara Corporation Copper-plating liquid, plating method and plating apparatus
CN102242381A (en) * 2011-06-29 2011-11-16 杭州阿玛尔科技有限公司 Alkaline non-cyanide copper plating solution with main coordination agent of methylenediphosphonate

Also Published As

Publication number Publication date
CH523968A (en) 1972-06-15
FR2130632A1 (en) 1972-11-03
DE2213216A1 (en) 1972-09-21
FR2130632B1 (en) 1976-08-06

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Legal Events

Date Code Title Description
PS Patent sealed
PLNP Patent lapsed through nonpayment of renewal fees