GB1382841A - Electrodeposition - Google Patents
ElectrodepositionInfo
- Publication number
- GB1382841A GB1382841A GB1113772A GB1113772A GB1382841A GB 1382841 A GB1382841 A GB 1382841A GB 1113772 A GB1113772 A GB 1113772A GB 1113772 A GB1113772 A GB 1113772A GB 1382841 A GB1382841 A GB 1382841A
- Authority
- GB
- United Kingdom
- Prior art keywords
- carbon atoms
- formula
- free
- compound
- acid
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electroplating And Plating Baths Therefor (AREA)
Abstract
1382841 Electro-plating OXY METAL FINISHING (EUROPE) SA 9 March 1972 [19 March 1971] 11137/72 Heading C7B An aqueous alkaline cyanide-free electroplating solution (e.g. for plating with Cu, Ni, Cd, or Co) includes a sulphur-free organic amino compound together with a sulphonate of Formula I or II as set out below:- wherein A is a single bond between N and S or a linear or branched aliphatic radical containing up to 12 carbon atoms, B is a mono- or poly-cyclic aromatic or cycloaliphatic radical containing from 5 to 14 carbon atoms, R 1 and R 2 are radicals, identical or different, selected from hydrogen and alkyl radicals containing from 1 to 6 carbon atoms, n amd m are each equal to 1, 2 or 3 and each of the interrupted lines represents 1, 2 or 3 valency bands. The sulphur-free organic amino compound may be ethylene diamine, diethylene triamine, tetramethyl, ethylenediamine, triethylene tetramine, triethanolamine, propylene diamine, cyclohexylamine or diamino cyclohexane. The may be added free or as salts with Hcl, H 2 SO 4 , H 3 PO 4 or AcOH. The compound of Formula I may be sulphamic acid of taurine. The compound of Formula II may be sulphanilic acid 1-aminobenzene- 2-sulphonic acid or 2-naphthylamine-4, 8 di-- sulphonic acid. The metal to be deposited may be included in the solution as sulphate,sulphamate, halide or acetate. Chloride may be incorporated in the bath, e.g. as di- or tri-methyamine hydrochloride or butylamine hydrochloride. Specified conditions are a pH of between 7.01 and 14, a temperature between room temperature and 80‹C and use of D.C. or periodically reversed D.C. with the length of the anodic phase not more than 1/6 that of the cathodic phase and with the amplitude of the anodic phase current equal to or less than that of the cathodic phase current.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CH411271A CH523968A (en) | 1971-03-19 | 1971-03-19 | Electrolytic bath for the electroplating of metals |
Publications (1)
Publication Number | Publication Date |
---|---|
GB1382841A true GB1382841A (en) | 1975-02-05 |
Family
ID=4270028
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB1113772A Expired GB1382841A (en) | 1971-03-19 | 1972-03-09 | Electrodeposition |
Country Status (4)
Country | Link |
---|---|
CH (1) | CH523968A (en) |
DE (1) | DE2213216A1 (en) |
FR (1) | FR2130632B1 (en) |
GB (1) | GB1382841A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP1167583A2 (en) * | 2000-06-30 | 2002-01-02 | Ebara Corporation | Copper-plating liquid, plating method and plating apparatus |
CN102242381A (en) * | 2011-06-29 | 2011-11-16 | 杭州阿玛尔科技有限公司 | Alkaline non-cyanide copper plating solution with main coordination agent of methylenediphosphonate |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0860519A1 (en) | 1997-02-12 | 1998-08-26 | LUIGI STOPPANI S.p.A. | Chromium plating from baths catalyzed with alkanedisulfonic-alkanesulfonic compounds with inhibitors such as aminoalkanesulfonic acids and heterocyclic bases |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE1446034B2 (en) * | 1961-06-15 | 1970-09-10 | Riedel 4 Co, 4800 Bielefeld | Acid galvanic copper baths |
-
1971
- 1971-03-19 CH CH411271A patent/CH523968A/en not_active IP Right Cessation
-
1972
- 1972-03-09 GB GB1113772A patent/GB1382841A/en not_active Expired
- 1972-03-13 FR FR7210289A patent/FR2130632B1/fr not_active Expired
- 1972-03-16 DE DE19722213216 patent/DE2213216A1/en active Pending
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP1167583A2 (en) * | 2000-06-30 | 2002-01-02 | Ebara Corporation | Copper-plating liquid, plating method and plating apparatus |
EP1167583A3 (en) * | 2000-06-30 | 2006-05-17 | Ebara Corporation | Copper-plating liquid, plating method and plating apparatus |
CN102242381A (en) * | 2011-06-29 | 2011-11-16 | 杭州阿玛尔科技有限公司 | Alkaline non-cyanide copper plating solution with main coordination agent of methylenediphosphonate |
Also Published As
Publication number | Publication date |
---|---|
CH523968A (en) | 1972-06-15 |
FR2130632A1 (en) | 1972-11-03 |
DE2213216A1 (en) | 1972-09-21 |
FR2130632B1 (en) | 1976-08-06 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PS | Patent sealed | ||
PLNP | Patent lapsed through nonpayment of renewal fees |