GB1361272A - Photosensitive polymeric materials and photoresist compositions - Google Patents
Photosensitive polymeric materials and photoresist compositionsInfo
- Publication number
- GB1361272A GB1361272A GB3135571A GB3135571A GB1361272A GB 1361272 A GB1361272 A GB 1361272A GB 3135571 A GB3135571 A GB 3135571A GB 3135571 A GB3135571 A GB 3135571A GB 1361272 A GB1361272 A GB 1361272A
- Authority
- GB
- United Kingdom
- Prior art keywords
- chloride
- light
- cinnamoyl
- sensitive
- alkyl
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000000463 material Substances 0.000 title abstract 3
- 239000000203 mixture Substances 0.000 title 1
- 229920002120 photoresistant polymer Polymers 0.000 title 1
- -1 cinnamoyl Chemical group 0.000 abstract 5
- 125000000217 alkyl group Chemical group 0.000 abstract 4
- 229920005601 base polymer Polymers 0.000 abstract 3
- 239000003795 chemical substances by application Substances 0.000 abstract 3
- 229910052739 hydrogen Inorganic materials 0.000 abstract 3
- 239000001257 hydrogen Substances 0.000 abstract 3
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 abstract 3
- 229920000642 polymer Polymers 0.000 abstract 3
- WQDUMFSSJAZKTM-UHFFFAOYSA-N Sodium methoxide Chemical compound [Na+].[O-]C WQDUMFSSJAZKTM-UHFFFAOYSA-N 0.000 abstract 2
- 125000000753 cycloalkyl group Chemical group 0.000 abstract 2
- 125000001183 hydrocarbyl group Chemical group 0.000 abstract 2
- RLSSMJSEOOYNOY-UHFFFAOYSA-N m-cresol Chemical compound CC1=CC=CC(O)=C1 RLSSMJSEOOYNOY-UHFFFAOYSA-N 0.000 abstract 2
- 229920005989 resin Polymers 0.000 abstract 2
- 239000011347 resin Substances 0.000 abstract 2
- WOGITNXCNOTRLK-VOTSOKGWSA-N (e)-3-phenylprop-2-enoyl chloride Chemical compound ClC(=O)\C=C\C1=CC=CC=C1 WOGITNXCNOTRLK-VOTSOKGWSA-N 0.000 abstract 1
- UJZRIKWTEFFUEJ-UHFFFAOYSA-N 2,3-diphenylprop-2-enoyl chloride Chemical compound C=1C=CC=CC=1C(C(=O)Cl)=CC1=CC=CC=C1 UJZRIKWTEFFUEJ-UHFFFAOYSA-N 0.000 abstract 1
- KXGFMDJXCMQABM-UHFFFAOYSA-N 2-methoxy-6-methylphenol Chemical compound [CH]OC1=CC=CC([CH])=C1O KXGFMDJXCMQABM-UHFFFAOYSA-N 0.000 abstract 1
- ZAUFNZFFWDQKPL-UHFFFAOYSA-N 3-(2-chlorophenyl)prop-2-enoyl chloride Chemical compound ClC(=O)C=CC1=CC=CC=C1Cl ZAUFNZFFWDQKPL-UHFFFAOYSA-N 0.000 abstract 1
- ORIBWNWUGUWUKV-UHFFFAOYSA-N 3-(3-nitrophenyl)prop-2-enoyl chloride Chemical compound [O-][N+](=O)C1=CC=CC(C=CC(Cl)=O)=C1 ORIBWNWUGUWUKV-UHFFFAOYSA-N 0.000 abstract 1
- LINDJVNNFWRJOF-UHFFFAOYSA-N 3-diazo-2-oxonaphthalene-1-sulfonic acid Chemical compound [N+](=[N-])=C1C(C(=C2C=CC=CC2=C1)S(=O)(=O)O)=O LINDJVNNFWRJOF-UHFFFAOYSA-N 0.000 abstract 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 abstract 1
- 229920001800 Shellac Polymers 0.000 abstract 1
- 125000001931 aliphatic group Chemical group 0.000 abstract 1
- 125000004432 carbon atom Chemical group C* 0.000 abstract 1
- 238000006243 chemical reaction Methods 0.000 abstract 1
- 229920001577 copolymer Polymers 0.000 abstract 1
- 238000007334 copolymerization reaction Methods 0.000 abstract 1
- 229940118056 cresol / formaldehyde Drugs 0.000 abstract 1
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 abstract 1
- 150000002431 hydrogen Chemical class 0.000 abstract 1
- 125000004435 hydrogen atom Chemical group [H]* 0.000 abstract 1
- 239000003701 inert diluent Substances 0.000 abstract 1
- 239000000178 monomer Substances 0.000 abstract 1
- UCUUFSAXZMGPGH-UHFFFAOYSA-N penta-1,4-dien-3-one Chemical compound C=CC(=O)C=C UCUUFSAXZMGPGH-UHFFFAOYSA-N 0.000 abstract 1
- 229920001568 phenolic resin Polymers 0.000 abstract 1
- 230000000379 polymerizing effect Effects 0.000 abstract 1
- 239000004208 shellac Substances 0.000 abstract 1
- ZLGIYFNHBLSMPS-ATJNOEHPSA-N shellac Chemical compound OCCCCCC(O)C(O)CCCCCCCC(O)=O.C1C23[C@H](C(O)=O)CCC2[C@](C)(CO)[C@@H]1C(C(O)=O)=C[C@@H]3O ZLGIYFNHBLSMPS-ATJNOEHPSA-N 0.000 abstract 1
- 229940113147 shellac Drugs 0.000 abstract 1
- 235000013874 shellac Nutrition 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
- G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F8/00—Chemical modification by after-treatment
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/022—Quinonediazides
- G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/128—Radiation-activated cross-linking agent containing
Landscapes
- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Medicinal Chemistry (AREA)
- Health & Medical Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Materials For Photolithography (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US6856770A | 1970-08-31 | 1970-08-31 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| GB1361272A true GB1361272A (en) | 1974-07-24 |
Family
ID=22083371
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| GB3135571A Expired GB1361272A (en) | 1970-08-31 | 1971-07-05 | Photosensitive polymeric materials and photoresist compositions |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US3644118A (https=) |
| JP (1) | JPS5234965B1 (https=) |
| DE (1) | DE2143430A1 (https=) |
| FR (1) | FR2103623B1 (https=) |
| GB (1) | GB1361272A (https=) |
Families Citing this family (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3885963A (en) * | 1972-04-18 | 1975-05-27 | Xerox Corp | Light activating imaging process |
| JPS5024641B2 (https=) * | 1972-10-17 | 1975-08-18 | ||
| US3859099A (en) * | 1972-12-22 | 1975-01-07 | Eastman Kodak Co | Positive plate incorporating diazoquinone |
| US4123279A (en) * | 1974-03-25 | 1978-10-31 | Fuji Photo Film Co., Ltd. | Light-sensitive o-quinonediazide containing planographic printing plate |
| US3986874A (en) * | 1974-10-23 | 1976-10-19 | Xerox Corporation | Driographic imaging method |
| JPS60167219A (ja) * | 1984-02-09 | 1985-08-30 | ソ−ド株式会社 | 水銀スイツチ |
| EP0199303B1 (en) * | 1985-04-18 | 1992-06-24 | Oki Electric Industry Company, Limited | Method of forming a photoresist pattern |
| JPS6210104A (ja) * | 1985-07-05 | 1987-01-19 | Nitto Boseki Co Ltd | 新規な感光性樹脂の製造方法 |
| US4758497A (en) * | 1985-08-22 | 1988-07-19 | Polychrome Corporation | Photosensitive naphthoquinone diazide sulfonyl ester compounds for the fabrication of lithographic plates and photosensitive sheet construction with the compounds |
| KR101222947B1 (ko) | 2005-06-30 | 2013-01-17 | 엘지디스플레이 주식회사 | 인쇄용 용제, 및 그를 이용한 인쇄용 패턴 조성물 및 패턴 형성방법 |
-
1970
- 1970-08-31 US US68567A patent/US3644118A/en not_active Expired - Lifetime
-
1971
- 1971-06-22 FR FR7123173A patent/FR2103623B1/fr not_active Expired
- 1971-07-05 GB GB3135571A patent/GB1361272A/en not_active Expired
- 1971-08-16 JP JP46061711A patent/JPS5234965B1/ja active Pending
- 1971-08-30 DE DE19712143430 patent/DE2143430A1/de active Pending
Also Published As
| Publication number | Publication date |
|---|---|
| FR2103623B1 (https=) | 1974-04-12 |
| JPS5234965B1 (https=) | 1977-09-06 |
| DE2143430A1 (de) | 1972-03-09 |
| US3644118A (en) | 1972-02-22 |
| FR2103623A1 (https=) | 1972-04-14 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PS | Patent sealed [section 19, patents act 1949] | ||
| PCNP | Patent ceased through non-payment of renewal fee |