GB1358510A - Enhancement-type complementary mis semiconductor device - Google Patents

Enhancement-type complementary mis semiconductor device

Info

Publication number
GB1358510A
GB1358510A GB5388272A GB5388272A GB1358510A GB 1358510 A GB1358510 A GB 1358510A GB 5388272 A GB5388272 A GB 5388272A GB 5388272 A GB5388272 A GB 5388272A GB 1358510 A GB1358510 A GB 1358510A
Authority
GB
United Kingdom
Prior art keywords
oxide layer
diffused
gate
layer
channel device
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB5388272A
Other languages
English (en)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Suwa Seikosha KK
Original Assignee
Suwa Seikosha KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Suwa Seikosha KK filed Critical Suwa Seikosha KK
Publication of GB1358510A publication Critical patent/GB1358510A/en
Expired legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D84/00Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
    • H10D84/80Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D12/00 or H10D30/00, e.g. integration of IGFETs
    • H10D84/82Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D12/00 or H10D30/00, e.g. integration of IGFETs of only field-effect components
    • H10D84/83Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D12/00 or H10D30/00, e.g. integration of IGFETs of only field-effect components of only insulated-gate FETs [IGFET]
    • H10D84/85Complementary IGFETs, e.g. CMOS
    • H10D84/858Complementary IGFETs, e.g. CMOS comprising a P-type well but not an N-type well
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D99/00Subject matter not provided for in other groups of this subclass

Landscapes

  • Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)
  • Insulated Gate Type Field-Effect Transistor (AREA)
  • Thin Film Transistor (AREA)
GB5388272A 1971-11-25 1972-11-22 Enhancement-type complementary mis semiconductor device Expired GB1358510A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP46094705A JPS4859783A (enrdf_load_stackoverflow) 1971-11-25 1971-11-25

Publications (1)

Publication Number Publication Date
GB1358510A true GB1358510A (en) 1974-07-03

Family

ID=14117566

Family Applications (1)

Application Number Title Priority Date Filing Date
GB5388272A Expired GB1358510A (en) 1971-11-25 1972-11-22 Enhancement-type complementary mis semiconductor device

Country Status (3)

Country Link
JP (1) JPS4859783A (enrdf_load_stackoverflow)
DE (1) DE2255150A1 (enrdf_load_stackoverflow)
GB (1) GB1358510A (enrdf_load_stackoverflow)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS50159271A (enrdf_load_stackoverflow) * 1974-06-12 1975-12-23
US3983620A (en) * 1975-05-08 1976-10-05 National Semiconductor Corporation Self-aligned CMOS process for bulk silicon and insulating substrate device
JPS5870567A (ja) * 1981-10-22 1983-04-27 Nippon Denso Co Ltd 半導体装置の製造方法

Also Published As

Publication number Publication date
JPS4859783A (enrdf_load_stackoverflow) 1973-08-22
DE2255150A1 (de) 1973-06-07

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Legal Events

Date Code Title Description
PS Patent sealed [section 19, patents act 1949]
PE20 Patent expired after termination of 20 years