GB1357290A - Diffusion into semiconductor material - Google Patents

Diffusion into semiconductor material

Info

Publication number
GB1357290A
GB1357290A GB1223272A GB1223272A GB1357290A GB 1357290 A GB1357290 A GB 1357290A GB 1223272 A GB1223272 A GB 1223272A GB 1223272 A GB1223272 A GB 1223272A GB 1357290 A GB1357290 A GB 1357290A
Authority
GB
United Kingdom
Prior art keywords
diffusion
boron
dopant
silicon wafers
source
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB1223272A
Other languages
English (en)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
International Business Machines Corp
Original Assignee
International Business Machines Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by International Business Machines Corp filed Critical International Business Machines Corp
Publication of GB1357290A publication Critical patent/GB1357290A/en
Expired legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P95/00—Generic processes or apparatus for manufacture or treatments not covered by the other groups of this subclass
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P32/00—Diffusion of dopants within, into or out of wafers, substrates or parts of devices
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S438/00—Semiconductor device manufacturing: process
    • Y10S438/914—Doping
    • Y10S438/92—Controlling diffusion profile by oxidation

Landscapes

  • Crystals, And After-Treatments Of Crystals (AREA)
  • Silicon Compounds (AREA)
  • Formation Of Insulating Films (AREA)
GB1223272A 1971-04-14 1972-03-16 Diffusion into semiconductor material Expired GB1357290A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US13400971A 1971-04-14 1971-04-14

Publications (1)

Publication Number Publication Date
GB1357290A true GB1357290A (en) 1974-06-19

Family

ID=22461342

Family Applications (1)

Application Number Title Priority Date Filing Date
GB1223272A Expired GB1357290A (en) 1971-04-14 1972-03-16 Diffusion into semiconductor material

Country Status (5)

Country Link
US (1) US3770521A (enExample)
JP (1) JPS5310834B1 (enExample)
DE (1) DE2209776C3 (enExample)
FR (1) FR2133571B1 (enExample)
GB (1) GB1357290A (enExample)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2751163C3 (de) * 1977-11-16 1982-02-25 Brown, Boveri & Cie Ag, 6800 Mannheim Verfahren zur Steuerung einer offenen Gallium-Diffusion und Vorrichtung zur Durchführung desselben
US4149915A (en) * 1978-01-27 1979-04-17 International Business Machines Corporation Process for producing defect-free semiconductor devices having overlapping high conductivity impurity regions
US5180690A (en) * 1988-12-14 1993-01-19 Energy Conversion Devices, Inc. Method of forming a layer of doped crystalline semiconductor alloy material

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BE550586A (enExample) * 1955-12-02
US3442725A (en) * 1966-05-05 1969-05-06 Motorola Inc Phosphorus diffusion system
US3477887A (en) * 1966-07-01 1969-11-11 Motorola Inc Gaseous diffusion method
US3484314A (en) * 1967-02-23 1969-12-16 Itt Water vapor control in vapor-solid diffusion of boron
DE1644005A1 (de) * 1967-04-26 1970-09-24 Siemens Ag Verfahren zum Dotieren von Halbleiterkristallen mit Phosphor

Also Published As

Publication number Publication date
US3770521A (en) 1973-11-06
FR2133571A1 (enExample) 1972-12-01
JPS5310834B1 (enExample) 1978-04-17
FR2133571B1 (enExample) 1978-03-03
DE2209776C3 (de) 1981-06-11
DE2209776B2 (de) 1979-12-06
DE2209776A1 (de) 1972-10-19

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Legal Events

Date Code Title Description
PS Patent sealed [section 19, patents act 1949]
PCNP Patent ceased through non-payment of renewal fee