GB1351867A - Semiconductor device and process for its manufacture - Google Patents

Semiconductor device and process for its manufacture

Info

Publication number
GB1351867A
GB1351867A GB2035071A GB2035071A GB1351867A GB 1351867 A GB1351867 A GB 1351867A GB 2035071 A GB2035071 A GB 2035071A GB 2035071 A GB2035071 A GB 2035071A GB 1351867 A GB1351867 A GB 1351867A
Authority
GB
United Kingdom
Prior art keywords
layer
source
junction
semi
base layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB2035071A
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
General Electric Co
Original Assignee
General Electric Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by General Electric Co filed Critical General Electric Co
Publication of GB1351867A publication Critical patent/GB1351867A/en
Expired legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/66Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/68Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
    • H01L29/70Bipolar devices
    • H01L29/72Transistor-type devices, i.e. able to continuously respond to applied control signals
    • H01L29/73Bipolar junction transistors
    • H01L29/732Vertical transistors
    • H01L29/7325Vertical transistors having an emitter-base junction leaving at a main surface and a base-collector junction leaving at a peripheral surface of the body, e.g. mesa planar transistor
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/02Semiconductor bodies ; Multistep manufacturing processes therefor
    • H01L29/36Semiconductor bodies ; Multistep manufacturing processes therefor characterised by the concentration or distribution of impurities in the bulk material
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/66Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/68Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
    • H01L29/70Bipolar devices
    • H01L29/74Thyristor-type devices, e.g. having four-zone regenerative action
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/66Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/86Types of semiconductor device ; Multistep manufacturing processes therefor controllable only by variation of the electric current supplied, or only the electric potential applied, to one or more of the electrodes carrying the current to be rectified, amplified, oscillated or switched
    • H01L29/861Diodes
    • H01L29/872Schottky diodes

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Ceramic Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Thyristors (AREA)

Abstract

1351867 Semi-conductor devices GENERAL ELECTRIC CO 19 April 1971 [26 Jan 1970] 20350/71 Heading H1K A semi-conductor device includes a layer having a reverse graded net impurity concentration i.e. the concentration at a surface of the layer is less than that within the layer. The layer may form the gate controlled base layer of a thyristor, in which case the junction between it and the adjacent emitter layer has the highest reverse voltage blocking capability of any junction in the device. The layer may alternatively form the gate controlled base layer of a gate turn off thyristor, since its series resistance, in the vicinity of its junction with the other base layer, is low. Using the layer as a base layer in a transistor results in improved gain at low currents. Finally it may be employed as a barrier interface layer between the metal and remainder of the semi-conductive material in a Schottky barrier diode. Here it reduces the forward conduction drop at low current densities, while retaining the reverse voltage blocking capacity of a uniformly high resistivity layer. The layer may be formed epitaxially, the deposited material including a suitable amount of dopant to achieve the desired impurity profile. Alternatively a source substrate including an impurity with a desired profile, achieved by diffusion, may be used, the source and device substrate being heated together, the source to a higher temperature, whereupon on the introduction of iodine vapour the source material including the dopant is transferred to the device substrate, so that a doping profile which is a mirror image of that of the source may be achieved in the layer.
GB2035071A 1970-01-26 1971-04-19 Semiconductor device and process for its manufacture Expired GB1351867A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US580570A 1970-01-26 1970-01-26

Publications (1)

Publication Number Publication Date
GB1351867A true GB1351867A (en) 1974-05-01

Family

ID=21717842

Family Applications (1)

Application Number Title Priority Date Filing Date
GB2035071A Expired GB1351867A (en) 1970-01-26 1971-04-19 Semiconductor device and process for its manufacture

Country Status (4)

Country Link
DE (1) DE2103389A1 (en)
FR (1) FR2077621B1 (en)
GB (1) GB1351867A (en)
SE (1) SE372375B (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2135118A (en) * 1983-02-09 1984-08-22 Westinghouse Brake & Signal Thyristors
US4605451A (en) * 1984-08-08 1986-08-12 Westinghouse Brake And Signal Company Limited Process for making thyristor devices
US8772140B2 (en) 2009-07-15 2014-07-08 Infineon Technologies Ag Production method for a unipolar semiconductor component and semiconductor device

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL259236A (en) * 1959-12-30
FR1297586A (en) * 1960-09-20 1962-06-29 Western Electric Co Semiconductor device and manufacturing method
NL275313A (en) * 1961-05-10
FR1515661A (en) * 1966-03-28 1968-03-01 Ass Elect Ind Improvements in semiconductor device manufacturing processes and products obtained

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2135118A (en) * 1983-02-09 1984-08-22 Westinghouse Brake & Signal Thyristors
EP0171474B1 (en) * 1983-02-09 1989-05-24 Westinghouse Brake And Signal Holdings Limited A method for producing a thyristor device
US4605451A (en) * 1984-08-08 1986-08-12 Westinghouse Brake And Signal Company Limited Process for making thyristor devices
US8772140B2 (en) 2009-07-15 2014-07-08 Infineon Technologies Ag Production method for a unipolar semiconductor component and semiconductor device

Also Published As

Publication number Publication date
FR2077621A1 (en) 1971-10-29
SE372375B (en) 1974-12-16
DE2103389A1 (en) 1971-08-05
FR2077621B1 (en) 1973-11-23

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Legal Events

Date Code Title Description
PS Patent sealed
PLNP Patent lapsed through nonpayment of renewal fees