GB1339663A - Presensitized water-washable planographic printing plates - Google Patents

Presensitized water-washable planographic printing plates

Info

Publication number
GB1339663A
GB1339663A GB1557971A GB1557971A GB1339663A GB 1339663 A GB1339663 A GB 1339663A GB 1557971 A GB1557971 A GB 1557971A GB 1557971 A GB1557971 A GB 1557971A GB 1339663 A GB1339663 A GB 1339663A
Authority
GB
United Kingdom
Prior art keywords
water
layer
coated
ethanol
polyvinyl alcohol
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB1557971A
Other languages
English (en)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Production Printing Holding BV
Original Assignee
Oce Van der Grinten NV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Oce Van der Grinten NV filed Critical Oce Van der Grinten NV
Publication of GB1339663A publication Critical patent/GB1339663A/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/016—Diazonium salts or compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/091—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by antireflection means or light filtering or absorbing means, e.g. anti-halation, contrast enhancement
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/092—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by backside coating or layers, by lubricating-slip layers or means, by oxygen barrier layers or by stripping-release layers or means

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Printing Plates And Materials Therefor (AREA)
GB1557971A 1970-05-29 1971-05-18 Presensitized water-washable planographic printing plates Expired GB1339663A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
NL7007827A NL7007827A (es) 1970-05-29 1970-05-29

Publications (1)

Publication Number Publication Date
GB1339663A true GB1339663A (en) 1973-12-05

Family

ID=19810192

Family Applications (1)

Application Number Title Priority Date Filing Date
GB1557971A Expired GB1339663A (en) 1970-05-29 1971-05-18 Presensitized water-washable planographic printing plates

Country Status (4)

Country Link
DE (1) DE2127080A1 (es)
FR (1) FR2090380B1 (es)
GB (1) GB1339663A (es)
NL (1) NL7007827A (es)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0043716A2 (en) * 1980-07-04 1982-01-13 Hitachi, Ltd. Photosensitive composition and pattern forming process using same
EP0175244A2 (de) * 1984-09-15 1986-03-26 Hoechst Aktiengesellschaft Lichtempfindliches Aufzeichnungsmaterial und Verfahren zu seiner Herstellung
US4696891A (en) * 1983-11-08 1987-09-29 Hoechst Aktiengesellschaft Process for the production of negative relief copies using photosensitive composition having 1,2-quinone diazide and quaternary ammonium compound
US4725526A (en) * 1984-08-21 1988-02-16 Hoeschst Aktiengesellschaft Process for reducing halations using lubricant in the course of irradiating and developing reproduction layers used for preparing printing plates

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4600679A (en) * 1984-05-25 1986-07-15 W. R. Grace & Co. Water-developable, negative-working, diazo lithographic printing plate with oleophilic ester overlayer
DE3736980A1 (de) * 1987-10-31 1989-05-18 Basf Ag Mehrschichtiges, flaechenfoermiges, lichtempfindliches aufzeichnungsmaterial

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0043716A2 (en) * 1980-07-04 1982-01-13 Hitachi, Ltd. Photosensitive composition and pattern forming process using same
EP0043716A3 (en) * 1980-07-04 1982-03-24 Hitachi, Ltd. Photosensitive composition and pattern forming process using same
US4696891A (en) * 1983-11-08 1987-09-29 Hoechst Aktiengesellschaft Process for the production of negative relief copies using photosensitive composition having 1,2-quinone diazide and quaternary ammonium compound
US4725526A (en) * 1984-08-21 1988-02-16 Hoeschst Aktiengesellschaft Process for reducing halations using lubricant in the course of irradiating and developing reproduction layers used for preparing printing plates
EP0175244A2 (de) * 1984-09-15 1986-03-26 Hoechst Aktiengesellschaft Lichtempfindliches Aufzeichnungsmaterial und Verfahren zu seiner Herstellung
EP0175244A3 (en) * 1984-09-15 1987-01-14 Hoechst Aktiengesellschaft Light-sensitive registration material and process for its production

Also Published As

Publication number Publication date
NL7007827A (es) 1971-12-01
FR2090380A1 (es) 1972-01-14
DE2127080A1 (de) 1972-12-07
FR2090380B1 (es) 1973-06-08

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Legal Events

Date Code Title Description
PS Patent sealed
PCNP Patent ceased through non-payment of renewal fee