GB1339663A - Presensitized water-washable planographic printing plates - Google Patents
Presensitized water-washable planographic printing platesInfo
- Publication number
- GB1339663A GB1339663A GB1557971A GB1557971A GB1339663A GB 1339663 A GB1339663 A GB 1339663A GB 1557971 A GB1557971 A GB 1557971A GB 1557971 A GB1557971 A GB 1557971A GB 1339663 A GB1339663 A GB 1339663A
- Authority
- GB
- United Kingdom
- Prior art keywords
- water
- layer
- coated
- ethanol
- polyvinyl alcohol
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 abstract 4
- 239000004372 Polyvinyl alcohol Substances 0.000 abstract 2
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 abstract 2
- IPCSVZSSVZVIGE-UHFFFAOYSA-N hexadecanoic acid Chemical compound CCCCCCCCCCCCCCCC(O)=O IPCSVZSSVZVIGE-UHFFFAOYSA-N 0.000 abstract 2
- 239000000463 material Substances 0.000 abstract 2
- 229920002451 polyvinyl alcohol Polymers 0.000 abstract 2
- QMMJWQMCMRUYTG-UHFFFAOYSA-N 1,2,4,5-tetrachloro-3-(trifluoromethyl)benzene Chemical compound FC(F)(F)C1=C(Cl)C(Cl)=CC(Cl)=C1Cl QMMJWQMCMRUYTG-UHFFFAOYSA-N 0.000 abstract 1
- 244000215068 Acacia senegal Species 0.000 abstract 1
- 244000068988 Glycine max Species 0.000 abstract 1
- 235000010469 Glycine max Nutrition 0.000 abstract 1
- 229920000084 Gum arabic Polymers 0.000 abstract 1
- 240000006240 Linum usitatissimum Species 0.000 abstract 1
- 235000004431 Linum usitatissimum Nutrition 0.000 abstract 1
- 235000021314 Palmitic acid Nutrition 0.000 abstract 1
- 239000005662 Paraffin oil Substances 0.000 abstract 1
- 229920002125 Sokalan® Polymers 0.000 abstract 1
- 239000000205 acacia gum Substances 0.000 abstract 1
- 235000010489 acacia gum Nutrition 0.000 abstract 1
- 150000001540 azides Chemical class 0.000 abstract 1
- 125000000664 diazo group Chemical group [N-]=[N+]=[*] 0.000 abstract 1
- 150000001989 diazonium salts Chemical class 0.000 abstract 1
- 235000004426 flaxseed Nutrition 0.000 abstract 1
- -1 lauryloxy Chemical group 0.000 abstract 1
- 239000000944 linseed oil Substances 0.000 abstract 1
- WQEPLUUGTLDZJY-UHFFFAOYSA-N n-Pentadecanoic acid Natural products CCCCCCCCCCCCCCC(O)=O WQEPLUUGTLDZJY-UHFFFAOYSA-N 0.000 abstract 1
- 229920002037 poly(vinyl butyral) polymer Polymers 0.000 abstract 1
- 239000004584 polyacrylic acid Substances 0.000 abstract 1
- 229920000728 polyester Polymers 0.000 abstract 1
- 229920001296 polysiloxane Polymers 0.000 abstract 1
- 229920005989 resin Polymers 0.000 abstract 1
- 239000011347 resin Substances 0.000 abstract 1
- 239000002904 solvent Substances 0.000 abstract 1
- 239000000126 substance Substances 0.000 abstract 1
- 239000004408 titanium dioxide Substances 0.000 abstract 1
- 239000003232 water-soluble binding agent Substances 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/016—Diazonium salts or compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/091—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by antireflection means or light filtering or absorbing means, e.g. anti-halation, contrast enhancement
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/092—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by backside coating or layers, by lubricating-slip layers or means, by oxygen barrier layers or by stripping-release layers or means
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Architecture (AREA)
- Structural Engineering (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Printing Plates And Materials Therefor (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
NL7007827A NL7007827A (enrdf_load_stackoverflow) | 1970-05-29 | 1970-05-29 |
Publications (1)
Publication Number | Publication Date |
---|---|
GB1339663A true GB1339663A (en) | 1973-12-05 |
Family
ID=19810192
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB1557971A Expired GB1339663A (en) | 1970-05-29 | 1971-05-18 | Presensitized water-washable planographic printing plates |
Country Status (4)
Country | Link |
---|---|
DE (1) | DE2127080A1 (enrdf_load_stackoverflow) |
FR (1) | FR2090380B1 (enrdf_load_stackoverflow) |
GB (1) | GB1339663A (enrdf_load_stackoverflow) |
NL (1) | NL7007827A (enrdf_load_stackoverflow) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0043716A3 (en) * | 1980-07-04 | 1982-03-24 | Hitachi, Ltd. | Photosensitive composition and pattern forming process using same |
EP0175244A3 (en) * | 1984-09-15 | 1987-01-14 | Hoechst Aktiengesellschaft | Light-sensitive registration material and process for its production |
US4696891A (en) * | 1983-11-08 | 1987-09-29 | Hoechst Aktiengesellschaft | Process for the production of negative relief copies using photosensitive composition having 1,2-quinone diazide and quaternary ammonium compound |
US4725526A (en) * | 1984-08-21 | 1988-02-16 | Hoeschst Aktiengesellschaft | Process for reducing halations using lubricant in the course of irradiating and developing reproduction layers used for preparing printing plates |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4600679A (en) * | 1984-05-25 | 1986-07-15 | W. R. Grace & Co. | Water-developable, negative-working, diazo lithographic printing plate with oleophilic ester overlayer |
DE3736980A1 (de) * | 1987-10-31 | 1989-05-18 | Basf Ag | Mehrschichtiges, flaechenfoermiges, lichtempfindliches aufzeichnungsmaterial |
-
1970
- 1970-05-29 NL NL7007827A patent/NL7007827A/xx unknown
-
1971
- 1971-05-18 GB GB1557971A patent/GB1339663A/en not_active Expired
- 1971-05-28 FR FR7119564A patent/FR2090380B1/fr not_active Expired
- 1971-06-01 DE DE19712127080 patent/DE2127080A1/de active Pending
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0043716A3 (en) * | 1980-07-04 | 1982-03-24 | Hitachi, Ltd. | Photosensitive composition and pattern forming process using same |
US4696891A (en) * | 1983-11-08 | 1987-09-29 | Hoechst Aktiengesellschaft | Process for the production of negative relief copies using photosensitive composition having 1,2-quinone diazide and quaternary ammonium compound |
US4725526A (en) * | 1984-08-21 | 1988-02-16 | Hoeschst Aktiengesellschaft | Process for reducing halations using lubricant in the course of irradiating and developing reproduction layers used for preparing printing plates |
EP0175244A3 (en) * | 1984-09-15 | 1987-01-14 | Hoechst Aktiengesellschaft | Light-sensitive registration material and process for its production |
Also Published As
Publication number | Publication date |
---|---|
NL7007827A (enrdf_load_stackoverflow) | 1971-12-01 |
DE2127080A1 (de) | 1972-12-07 |
FR2090380A1 (enrdf_load_stackoverflow) | 1972-01-14 |
FR2090380B1 (enrdf_load_stackoverflow) | 1973-06-08 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PS | Patent sealed | ||
PCNP | Patent ceased through non-payment of renewal fee |