GB1330932A - Phenolic resin condensation product and light-sensitive compositions containing it - Google Patents
Phenolic resin condensation product and light-sensitive compositions containing itInfo
- Publication number
- GB1330932A GB1330932A GB4324871A GB4324871A GB1330932A GB 1330932 A GB1330932 A GB 1330932A GB 4324871 A GB4324871 A GB 4324871A GB 4324871 A GB4324871 A GB 4324871A GB 1330932 A GB1330932 A GB 1330932A
- Authority
- GB
- United Kingdom
- Prior art keywords
- resin
- hcho
- light
- tetrahydroxy
- prepared
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G8/00—Condensation polymers of aldehydes or ketones with phenols only
- C08G8/28—Chemically modified polycondensates
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/022—Quinonediazides
- G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP8050970A JPS505084B1 (US08124317-20120228-C00026.png) | 1970-09-16 | 1970-09-16 |
Publications (1)
Publication Number | Publication Date |
---|---|
GB1330932A true GB1330932A (en) | 1973-09-19 |
Family
ID=13720268
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB4324871A Expired GB1330932A (en) | 1970-09-16 | 1971-09-16 | Phenolic resin condensation product and light-sensitive compositions containing it |
Country Status (3)
Country | Link |
---|---|
JP (1) | JPS505084B1 (US08124317-20120228-C00026.png) |
DE (1) | DE2146166A1 (US08124317-20120228-C00026.png) |
GB (1) | GB1330932A (US08124317-20120228-C00026.png) |
Cited By (33)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO1981000772A1 (en) * | 1979-09-05 | 1981-03-19 | Minnesota Mining & Mfg | Single sheet color proofing diazo oxide system |
US4306010A (en) * | 1979-06-16 | 1981-12-15 | Konishiroku Photo Industry Co., Ltd. | Photosensitive o-quinone diazide composition and photosensitive lithographic printing plate |
US4306011A (en) * | 1979-06-16 | 1981-12-15 | Konishiroku Photo Industry Co., Ltd. | Photosensitive composite and photosensitive lithographic printing plate |
US4424270A (en) | 1981-01-03 | 1984-01-03 | Hoechst Aktiengesellschaft | Light-sensitive mixture comprising a naphthoquinonediazidesulfonic acid ester and process for preparing said ester |
US4439511A (en) * | 1981-07-14 | 1984-03-27 | Hoechst Aktiengesellschaft | Light-sensitive mixture based on O-naphthoquinone diazide ester of condensate of bisphenol and formaldehyde and light-sensitive copying material prepared therefrom |
US4632900A (en) * | 1984-03-07 | 1986-12-30 | Ciba-Geigy Corporation | Process for the production of images after electrodeposition of positive photoresist on electrically conductive surface |
US4632891A (en) * | 1984-10-04 | 1986-12-30 | Ciba-Geigy Corporation | Process for the production of images |
US4681923A (en) * | 1985-03-02 | 1987-07-21 | Ciba-Geigy Corporation | Modified quinone-diazide group-containing phenolic novolak resins |
US4839253A (en) * | 1984-12-01 | 1989-06-13 | Ciba-Geigy Corporation | Photosensitive and electrodepositable phenolic resin with quinone diazide sulfonyloxy group |
US4873169A (en) * | 1986-08-27 | 1989-10-10 | Hoechst Aktiengesellschaft | Process for the preparation of an o-naphthoquinonediazide sulfonic acid ester and photosensitive mixture containing same |
EP0565006A2 (en) | 1992-04-06 | 1993-10-13 | Fuji Photo Film Co., Ltd. | Method for preparing PS plate |
EP0713143A2 (en) | 1994-11-18 | 1996-05-22 | Fuji Photo Film Co., Ltd. | Photosensitive planographic printing plate |
EP0780730A2 (en) | 1995-12-22 | 1997-06-25 | Fuji Photo Film Co., Ltd. | Positive-type light-sensitive lithographic printing plate |
WO2004035687A1 (en) * | 2002-10-15 | 2004-04-29 | Agfa-Gevaert | Polymer for heat-sensitive lithographic printing plate precursor |
EP1640173A1 (en) | 2004-09-27 | 2006-03-29 | Fuji Photo Film Co., Ltd. | Planographic printing plate precursor |
EP1690685A2 (en) | 2005-02-09 | 2006-08-16 | Fuji Photo Film Co., Ltd. | Planographic printing plate precursor |
EP1705004A1 (en) | 2005-03-22 | 2006-09-27 | Fuji Photo Film Co., Ltd. | Planographic printing plate precursor |
EP1925447A1 (en) | 2002-09-17 | 2008-05-28 | FUJIFILM Corporation | Image forming material |
EP2036721A1 (en) | 2000-11-30 | 2009-03-18 | FUJIFILM Corporation | Planographic printing plate precursor |
EP2042305A2 (en) | 2007-09-28 | 2009-04-01 | FUJIFILM Corporation | Planographic printing plate precursor |
EP2042308A2 (en) | 2007-09-27 | 2009-04-01 | FUJIFILM Corporation | Planographic printing plate precursor |
EP2042306A2 (en) | 2007-09-28 | 2009-04-01 | FUJIFILM Corporation | Planographic printing plate precursor and method of producing a copolymer used therein |
EP2042340A2 (en) | 2007-09-27 | 2009-04-01 | Fujifilm Corporation | Lithographic printing plate surface protective agent and platemaking method for lithographic printing plate |
EP2042310A2 (en) | 2007-09-27 | 2009-04-01 | FUJIFILM Corporation | Planographic printing plate precursor |
WO2009063824A1 (ja) | 2007-11-14 | 2009-05-22 | Fujifilm Corporation | 塗布膜の乾燥方法及び平版印刷版原版の製造方法 |
EP2105690A2 (en) | 2008-03-26 | 2009-09-30 | Fujifilm Corporation | Method and apparatus for drying |
EP2106907A2 (en) | 2008-04-02 | 2009-10-07 | FUJIFILM Corporation | Planographic printing plate precursor |
EP2161129A2 (en) | 2008-09-09 | 2010-03-10 | Fujifilm Corporation | Photosensitive lithographic printing plate precursor for infrared laser |
EP2236293A2 (en) | 2009-03-31 | 2010-10-06 | FUJIFILM Corporation | Lithographic printing plate precursor |
WO2011037005A1 (ja) | 2009-09-24 | 2011-03-31 | 富士フイルム株式会社 | 平版印刷版原版 |
EP2381312A2 (en) | 2000-08-25 | 2011-10-26 | Fujifilm Corporation | Alkaline liquid developer for lithographic printing plate and method for preparing lithographic printing plate |
EP2641738A2 (en) | 2012-03-23 | 2013-09-25 | Fujifilm Corporation | Method of producing planographic printing plate and planographic printing plate |
EP2644379A1 (en) | 2012-03-30 | 2013-10-02 | FUJIFILM Corporation | Method of producing a planographic printing plate |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CA2015721A1 (en) * | 1989-05-12 | 1990-11-12 | Karen Ann Graziano | Method of using highly branched novolaks in photoresists |
DE3935876A1 (de) * | 1989-10-27 | 1991-05-02 | Basf Ag | Strahlungsempfindliches gemisch |
WO2008114766A1 (ja) * | 2007-03-12 | 2008-09-25 | Tohto Kasei Co., Ltd. | 新規多価ヒドロキシ化合物、該化合物の製造方法、該化合物を用いたエポキシ樹脂並びにエポキシ樹脂組成物及びその硬化物 |
CN109476575A (zh) * | 2016-07-21 | 2019-03-15 | 三菱瓦斯化学株式会社 | 化合物、树脂、组合物以及抗蚀图案形成方法及电路图案形成方法 |
-
1970
- 1970-09-16 JP JP8050970A patent/JPS505084B1/ja active Pending
-
1971
- 1971-09-15 DE DE19712146166 patent/DE2146166A1/de active Pending
- 1971-09-16 GB GB4324871A patent/GB1330932A/en not_active Expired
Cited By (35)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4306010A (en) * | 1979-06-16 | 1981-12-15 | Konishiroku Photo Industry Co., Ltd. | Photosensitive o-quinone diazide composition and photosensitive lithographic printing plate |
US4306011A (en) * | 1979-06-16 | 1981-12-15 | Konishiroku Photo Industry Co., Ltd. | Photosensitive composite and photosensitive lithographic printing plate |
WO1981000772A1 (en) * | 1979-09-05 | 1981-03-19 | Minnesota Mining & Mfg | Single sheet color proofing diazo oxide system |
US4260673A (en) * | 1979-09-05 | 1981-04-07 | Minnesota Mining And Manufacturing Company | Single sheet color proofing system |
US4424270A (en) | 1981-01-03 | 1984-01-03 | Hoechst Aktiengesellschaft | Light-sensitive mixture comprising a naphthoquinonediazidesulfonic acid ester and process for preparing said ester |
US4555469A (en) * | 1981-01-03 | 1985-11-26 | Hoechst Aktiengesellschaft | Process of preparing light-sensitive naphthoquinonediazidesulfonic acid ester |
US4439511A (en) * | 1981-07-14 | 1984-03-27 | Hoechst Aktiengesellschaft | Light-sensitive mixture based on O-naphthoquinone diazide ester of condensate of bisphenol and formaldehyde and light-sensitive copying material prepared therefrom |
US4632900A (en) * | 1984-03-07 | 1986-12-30 | Ciba-Geigy Corporation | Process for the production of images after electrodeposition of positive photoresist on electrically conductive surface |
US4632891A (en) * | 1984-10-04 | 1986-12-30 | Ciba-Geigy Corporation | Process for the production of images |
US4839253A (en) * | 1984-12-01 | 1989-06-13 | Ciba-Geigy Corporation | Photosensitive and electrodepositable phenolic resin with quinone diazide sulfonyloxy group |
US4681923A (en) * | 1985-03-02 | 1987-07-21 | Ciba-Geigy Corporation | Modified quinone-diazide group-containing phenolic novolak resins |
US4873169A (en) * | 1986-08-27 | 1989-10-10 | Hoechst Aktiengesellschaft | Process for the preparation of an o-naphthoquinonediazide sulfonic acid ester and photosensitive mixture containing same |
EP0565006A2 (en) | 1992-04-06 | 1993-10-13 | Fuji Photo Film Co., Ltd. | Method for preparing PS plate |
EP0713143A2 (en) | 1994-11-18 | 1996-05-22 | Fuji Photo Film Co., Ltd. | Photosensitive planographic printing plate |
EP0780730A2 (en) | 1995-12-22 | 1997-06-25 | Fuji Photo Film Co., Ltd. | Positive-type light-sensitive lithographic printing plate |
EP2381312A2 (en) | 2000-08-25 | 2011-10-26 | Fujifilm Corporation | Alkaline liquid developer for lithographic printing plate and method for preparing lithographic printing plate |
EP2036721A1 (en) | 2000-11-30 | 2009-03-18 | FUJIFILM Corporation | Planographic printing plate precursor |
EP1925447A1 (en) | 2002-09-17 | 2008-05-28 | FUJIFILM Corporation | Image forming material |
WO2004035687A1 (en) * | 2002-10-15 | 2004-04-29 | Agfa-Gevaert | Polymer for heat-sensitive lithographic printing plate precursor |
EP1640173A1 (en) | 2004-09-27 | 2006-03-29 | Fuji Photo Film Co., Ltd. | Planographic printing plate precursor |
EP1690685A2 (en) | 2005-02-09 | 2006-08-16 | Fuji Photo Film Co., Ltd. | Planographic printing plate precursor |
EP1705004A1 (en) | 2005-03-22 | 2006-09-27 | Fuji Photo Film Co., Ltd. | Planographic printing plate precursor |
EP2042308A2 (en) | 2007-09-27 | 2009-04-01 | FUJIFILM Corporation | Planographic printing plate precursor |
EP2042340A2 (en) | 2007-09-27 | 2009-04-01 | Fujifilm Corporation | Lithographic printing plate surface protective agent and platemaking method for lithographic printing plate |
EP2042310A2 (en) | 2007-09-27 | 2009-04-01 | FUJIFILM Corporation | Planographic printing plate precursor |
EP2042305A2 (en) | 2007-09-28 | 2009-04-01 | FUJIFILM Corporation | Planographic printing plate precursor |
EP2042306A2 (en) | 2007-09-28 | 2009-04-01 | FUJIFILM Corporation | Planographic printing plate precursor and method of producing a copolymer used therein |
WO2009063824A1 (ja) | 2007-11-14 | 2009-05-22 | Fujifilm Corporation | 塗布膜の乾燥方法及び平版印刷版原版の製造方法 |
EP2105690A2 (en) | 2008-03-26 | 2009-09-30 | Fujifilm Corporation | Method and apparatus for drying |
EP2106907A2 (en) | 2008-04-02 | 2009-10-07 | FUJIFILM Corporation | Planographic printing plate precursor |
EP2161129A2 (en) | 2008-09-09 | 2010-03-10 | Fujifilm Corporation | Photosensitive lithographic printing plate precursor for infrared laser |
EP2236293A2 (en) | 2009-03-31 | 2010-10-06 | FUJIFILM Corporation | Lithographic printing plate precursor |
WO2011037005A1 (ja) | 2009-09-24 | 2011-03-31 | 富士フイルム株式会社 | 平版印刷版原版 |
EP2641738A2 (en) | 2012-03-23 | 2013-09-25 | Fujifilm Corporation | Method of producing planographic printing plate and planographic printing plate |
EP2644379A1 (en) | 2012-03-30 | 2013-10-02 | FUJIFILM Corporation | Method of producing a planographic printing plate |
Also Published As
Publication number | Publication date |
---|---|
JPS505084B1 (US08124317-20120228-C00026.png) | 1975-02-28 |
DE2146166A1 (de) | 1972-03-23 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PS | Patent sealed | ||
PLNP | Patent lapsed through nonpayment of renewal fees |