GB1326794A - Stored charge device - Google Patents

Stored charge device

Info

Publication number
GB1326794A
GB1326794A GB3866670A GB3866670A GB1326794A GB 1326794 A GB1326794 A GB 1326794A GB 3866670 A GB3866670 A GB 3866670A GB 3866670 A GB3866670 A GB 3866670A GB 1326794 A GB1326794 A GB 1326794A
Authority
GB
United Kingdom
Prior art keywords
insulant
charge
film
metal
deposited
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB3866670A
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
California Institute of Technology CalTech
Original Assignee
California Institute of Technology CalTech
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by California Institute of Technology CalTech filed Critical California Institute of Technology CalTech
Publication of GB1326794A publication Critical patent/GB1326794A/en
Expired legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H03ELECTRONIC CIRCUITRY
    • H03KPULSE TECHNIQUE
    • H03K3/00Circuits for generating electric pulses; Monostable, bistable or multistable circuits
    • H03K3/02Generators characterised by the type of circuit or by the means used for producing pulses
    • H03K3/353Generators characterised by the type of circuit or by the means used for producing pulses by the use, as active elements, of field-effect transistors with internal or external positive feedback
    • H03K3/356Bistable circuits
    • H03K3/356008Bistable circuits ensuring a predetermined initial state when the supply voltage has been applied; storing the actual state when the supply voltage fails
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C11/00Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor
    • G11C11/21Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements
    • G11C11/34Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements using semiconductor devices
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C16/00Erasable programmable read-only memories
    • G11C16/02Erasable programmable read-only memories electrically programmable
    • G11C16/04Erasable programmable read-only memories electrically programmable using variable threshold transistors, e.g. FAMOS
    • G11C16/0466Erasable programmable read-only memories electrically programmable using variable threshold transistors, e.g. FAMOS comprising cells with charge storage in an insulating layer, e.g. metal-nitride-oxide-silicon [MNOS], silicon-oxide-nitride-oxide-silicon [SONOS]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/02Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
    • H01L27/12Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/66Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/68Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
    • H01L29/76Unipolar devices, e.g. field effect transistors
    • H01L29/772Field effect transistors
    • H01L29/78Field effect transistors with field effect produced by an insulated gate
    • H01L29/788Field effect transistors with field effect produced by an insulated gate with floating gate
    • H01L29/7881Programmable transistors with only two possible levels of programmation
    • H01L29/7884Programmable transistors with only two possible levels of programmation charging by hot carrier injection
    • H01L29/7885Hot carrier injection from the channel

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Computer Hardware Design (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Ceramic Engineering (AREA)
  • Non-Volatile Memory (AREA)
  • Read Only Memory (AREA)
  • Solid State Image Pick-Up Elements (AREA)
  • Transforming Light Signals Into Electric Signals (AREA)
  • Semiconductor Memories (AREA)

Abstract

1326794 Charge storage memory devices CALIFORNIA INSTITUTE OF TECHNOLOGY 11 Aug 1970 [11 Aug 1969] 38666/70 Heading H1M In a charge storage memory device a metal film 42 is deposited on an insulant substrate 40 and carries a first insulant film 44 of e.g. the oxide or nitride of the metal on which a metal e.g. Al film 46 is deposited. The latter is buried in an insulant film 48, e.g. of the metal oxide or nitride on which an outer metal electrode 50 is deposited; the insulant films 44, 48, not being identical but differing in substance and barrier energy to exhibit differential conductance in dependence on high fields with the thicker insulant having the smaller energy barrier (Fig. 1). Film 46 introduces a deep energy well trapping a large charge with high capture probability, and high voltage pulses between 42 and 50 add or remove electrons on negative or positive polarities, which electrons are retained due to insulant films 44, 48. The buried layer 46 may consist of a discontinuous layer assisting the rapid introduction of charge. The device operates as a two terminal memory. A random recess memory comprises an array of storage devices connected at the intersections of X wires 68 and Y wires 66 to X and Y access switches 62, 64 associated with a pulse generator 67 and a current detector 69 (Fig. 2) the array being deposited on a single insulant substrate with the lower electrode comprising the Y strip conductors overlain by oxidized or nitrided layers, a circular metal layer at intersections, a second insulant layer oxidized or nitrited thereon, and a strip conductor overlaying the insulant (Fig. 3, not shown). For write-in a pulse is applied of sufficient potential for the electrons to traverse the insulant and enter or leave the energy well formed by the buried metal layer so as to store a negative or positive charge; the pulse being derived from a generator between the appropriate X and Y access switches to affect the device situated at intersection while leaving other devices unaffected. For partially destructive readout either polarity pulse is applicable with lesser amplitude and the resultant current flow sensed by current detector 69 in series with the pulse generator; the flow amplitude being dependent (Fig. 4, not shown) on the polarity and charge previously stored. For non destructive readout; the array may be scanned by an optical or electron beam respectively effecting internal photoemission over the insulant film barrier light dependent on the stored charge and controlling the photoernission readout current, or sensing the stored charge surface potential for detection as in a scanning electron microscope.
GB3866670A 1969-08-11 1970-08-11 Stored charge device Expired GB1326794A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US84905769A 1969-08-11 1969-08-11

Publications (1)

Publication Number Publication Date
GB1326794A true GB1326794A (en) 1973-08-15

Family

ID=25304961

Family Applications (2)

Application Number Title Priority Date Filing Date
GB1907570A Expired GB1329220A (en) 1969-08-11 1970-04-21 Stored charge device
GB3866670A Expired GB1326794A (en) 1969-08-11 1970-08-11 Stored charge device

Family Applications Before (1)

Application Number Title Priority Date Filing Date
GB1907570A Expired GB1329220A (en) 1969-08-11 1970-04-21 Stored charge device

Country Status (4)

Country Link
JP (1) JPS4936786B1 (en)
DE (1) DE2039955A1 (en)
FR (1) FR2058205A1 (en)
GB (2) GB1329220A (en)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3624618A (en) * 1967-12-14 1971-11-30 Sperry Rand Corp A high-speed memory array using variable threshold transistors
DE2125681C2 (en) * 1971-05-24 1982-05-13 Sperry Corp., 10104 New York, N.Y. Memory with reduced write-on time - by using bipolar rectangular wave as gate signal for FETs
ES404185A1 (en) * 1971-07-06 1975-06-01 Ibm A cellular disposal of casual access accorded by electric load. (Machine-translation by Google Translate, not legally binding)
JPS50140737U (en) * 1974-05-07 1975-11-19
DE2736715C2 (en) * 1976-08-16 1985-03-14 Ncr Corp., Dayton, Ohio Random access storage device
EP0159601A3 (en) * 1984-04-10 1987-08-19 Hartwig Wolfgang Prof.Dr. Thim Logic circuit arrangement with appropriately constructed field-effect transistors
DE69523287D1 (en) * 1995-03-03 2001-11-22 St Microelectronics Srl Electrically programmable and erasable non-volatile memory cell and FLASH and EEPROM type memory arrays
US7602069B2 (en) 2004-03-31 2009-10-13 Universität Duisburg-Essen Micro electronic component with electrically accessible metallic clusters

Also Published As

Publication number Publication date
DE2039955A1 (en) 1971-02-25
GB1329220A (en) 1973-09-05
JPS4936786B1 (en) 1974-10-03
FR2058205A1 (en) 1971-05-28

Similar Documents

Publication Publication Date Title
US3972059A (en) Dielectric diode, fabrication thereof, and charge store memory therewith
US3906296A (en) Stored charge transistor
US3439214A (en) Beam-junction scan converter
US3676715A (en) Semiconductor apparatus for image sensing and dynamic storage
JP3950179B2 (en) Tunnel diode
US3781574A (en) Coherent sampled readout circuit and signal processor for a charge coupled device array
US3805062A (en) Method and apparatus for sensing radiation and providing electrical readout
US3864722A (en) Radiation sensing arrays
GB1326794A (en) Stored charge device
Simmons et al. New thin-film resistive memory
US3590337A (en) Plural dielectric layered electrically alterable non-destructive readout memory element
US3407394A (en) Selenium trapping memory
US3877058A (en) Radiation charge transfer memory device
US3859642A (en) Random access memory array of hysteresis loop capacitors
US4000418A (en) Apparatus for storing and retrieving analog and digital signals
US3935446A (en) Apparatus for sensing radiation and providing electrical readout
US3886530A (en) Signal storage device
JPH0262948B2 (en)
US4387402A (en) Charge injection imaging device for faithful (dynamic) scene representation
US3706891A (en) A. c. stable storage cell
US3447043A (en) Tunnel cathode in matrix form with integral storage feature
US3906544A (en) Semiconductor imaging detector device
US3506971A (en) Apparatus for electrostatically storing signal representations
US3604988A (en) Semiconductor memory apparatus with a multilayer insulator contacting the semiconductor
US3693003A (en) Storage target for an electron-beam addressed read, write and erase memory

Legal Events

Date Code Title Description
PS Patent sealed
PLNP Patent lapsed through nonpayment of renewal fees