GB1318098A - Apparatus for producing a fucused electron beam - Google Patents

Apparatus for producing a fucused electron beam

Info

Publication number
GB1318098A
GB1318098A GB3712170A GB3712170A GB1318098A GB 1318098 A GB1318098 A GB 1318098A GB 3712170 A GB3712170 A GB 3712170A GB 3712170 A GB3712170 A GB 3712170A GB 1318098 A GB1318098 A GB 1318098A
Authority
GB
United Kingdom
Prior art keywords
storage
substrate
lens
focus lens
electron beam
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB3712170A
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
General Electric Co
Original Assignee
General Electric Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by General Electric Co filed Critical General Electric Co
Publication of GB1318098A publication Critical patent/GB1318098A/en
Expired legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/302—Controlling tubes by external information, e.g. programme control
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11C—STATIC STORES
    • G11C13/00—Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00
    • G11C13/04—Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00 using optical elements ; using other beam accessed elements, e.g. electron or ion beam
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11C—STATIC STORES
    • G11C13/00—Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00
    • G11C13/04—Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00 using optical elements ; using other beam accessed elements, e.g. electron or ion beam
    • G11C13/048—Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00 using optical elements ; using other beam accessed elements, e.g. electron or ion beam using other optical storage elements
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J1/00—Details of electrodes, of magnetic control means, of screens, or of the mounting or spacing thereof, common to two or more basic types of discharge tubes or lamps
    • H01J1/02—Main electrodes
    • H01J1/13—Solid thermionic cathodes
    • H01J1/15—Cathodes heated directly by an electric current
    • H01J1/16—Cathodes heated directly by an electric current characterised by the shape
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J31/00—Cathode ray tubes; Electron beam tubes
    • H01J31/08—Cathode ray tubes; Electron beam tubes having a screen on or from which an image or pattern is formed, picked up, converted, or stored
    • H01J31/58—Tubes for storage of image or information pattern or for conversion of definition of television or like images, i.e. having electrical input and electrical output
    • H01J31/60—Tubes for storage of image or information pattern or for conversion of definition of television or like images, i.e. having electrical input and electrical output having means for deflecting, either selectively or sequentially, an electron ray on to separate surface elements of the screen
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
    • H01J37/06—Electron sources; Electron guns
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
    • H01J37/06—Electron sources; Electron guns
    • H01J37/063—Geometrical arrangement of electrodes for beam-forming
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
    • H01J37/06—Electron sources; Electron guns
    • H01J37/073—Electron guns using field emission, photo emission, or secondary emission electron sources
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/06—Sources
    • H01J2237/063—Electron sources
    • H01J2237/06308—Thermionic sources
    • H01J2237/06316—Schottky emission

Abstract

1318098 Electron beam storage tube GENERAL ELECTRIC CO 31 July 1970 [6 Aug 1969] 37121/70 Heading G4A [Also in Division H1] An electron beam storage system for permanently storing data at a density exceeding 10<SP>9</SP> bits/cm<SP>2</SP>, comprises a cathode 50, Fig. 6, having an extremely small emissive surface, electrodes 8 and 9 for providing a hemispherical electric field about the emissive surfaces with a gradiet high enough to produce a high density emission current of about 1000 A/cm<SP>2</SP> which is formed into a divergent beam; a first focus lens 10A for producing a parallel beam; a second focus lens 10B for converging the beam at a spot of about 0À1 microns diameter on the storage medium 1; deflection means 11 for deflecting the beam over the storage surface; and modulation means such as the deflection coil 12 for modulating the beam intensity. Spherical aberration in the focusing system is reduced by locating the cathode at the focal point of the first lens 10A and the storage surface at the focal point of the second lens 10B, and an astigmator coil 64 is located in the vicinity of a beam limiting aperture 58. Two pairs of centering coils 65 mounted on the wall 66 of the continuously-evacuated chamber adjust the beam to pass through the centre of the second focus lens. The storage target may comprise strips of a selenium-arsenic alloy deposited on a p-i-n substrate (Figs. 2 and 3, not shown). The beam impinges on the edges of the strips and evaporates the alloy if it is at maximum intensity, so that the data may be recorded as a pattern of indentations on both edges of each strip. For reading, the pattern the beam is operated at low intensity and the output is taken either from the electrons which pass through the indentations to the substrate. Alternatively the substrate may be of glass and the output is derived by secondary emission or by reflection from the target to a detector positioned above the storage surface. The beam can be deflected over a data block area, and 44,000 data blocks may be provided on a substrate which is movable from outside the envelope to bring a desired data block into position (Fig. 10, not shown).
GB3712170A 1969-08-06 1970-07-31 Apparatus for producing a fucused electron beam Expired GB1318098A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US00847972A US3846660A (en) 1969-08-06 1969-08-06 Electron beam generating system with collimated focusing means

Publications (1)

Publication Number Publication Date
GB1318098A true GB1318098A (en) 1973-05-23

Family

ID=25301990

Family Applications (1)

Application Number Title Priority Date Filing Date
GB3712170A Expired GB1318098A (en) 1969-08-06 1970-07-31 Apparatus for producing a fucused electron beam

Country Status (6)

Country Link
US (1) US3846660A (en)
JP (1) JPS5126774B1 (en)
DE (1) DE2038756A1 (en)
FR (1) FR2057016B1 (en)
GB (1) GB1318098A (en)
NL (1) NL7011606A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2141578A (en) * 1983-06-15 1984-12-19 American Telephone & Telegraph Electron emission apparatus
DE202014011373U1 (en) 2013-10-11 2019-10-31 Reaction Engines Limited heat exchangers

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4500791A (en) * 1980-06-07 1985-02-19 Dr. -Ing. Rudolf Hell Gmbh High stability electron beam generator for processing material
DE3328172A1 (en) * 1983-08-04 1985-02-14 Leybold-Heraeus GmbH, 5000 Köln ELECTRON BEAM CANNON
US6288995B1 (en) 1997-09-30 2001-09-11 Jerry W. Bohn Non-mechanical recording and retrieval apparatus
WO2005045822A1 (en) * 2003-10-29 2005-05-19 Jerry Bohn Non-mechanical recording and retrieval apparatus
JP6666629B2 (en) * 2016-12-27 2020-03-18 株式会社日立ハイテク Aberration corrector and electron microscope
US11508591B2 (en) 2021-02-08 2022-11-22 Kla Corporation High resolution electron beam apparatus with dual-aperture schemes

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CH220324A (en) * 1939-07-22 1942-03-31 Fides Gmbh Electron microscope.
US2356535A (en) * 1940-08-31 1944-08-22 Ruska Ernst Electronic lens
US3287735A (en) * 1962-08-28 1966-11-22 Gen Electric Radiant energy apparatus
NL299458A (en) * 1962-10-19 1900-01-01
US3374386A (en) * 1964-11-02 1968-03-19 Field Emission Corp Field emission cathode having tungsten miller indices 100 plane coated with zirconium, hafnium or magnesium on oxygen binder
US3466615A (en) * 1966-04-29 1969-09-09 Ibm Read only memory including first and second conductive layers for producing binary signals
US3599181A (en) * 1967-12-07 1971-08-10 Atomic Energy Authority Uk Solid state computer memory device

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2141578A (en) * 1983-06-15 1984-12-19 American Telephone & Telegraph Electron emission apparatus
DE202014011373U1 (en) 2013-10-11 2019-10-31 Reaction Engines Limited heat exchangers

Also Published As

Publication number Publication date
US3846660A (en) 1974-11-05
NL7011606A (en) 1971-02-09
FR2057016A1 (en) 1971-05-07
JPS5126774B1 (en) 1976-08-09
FR2057016B1 (en) 1976-09-03
DE2038756A1 (en) 1971-02-18

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Legal Events

Date Code Title Description
PS Patent sealed [section 19, patents act 1949]
PLNP Patent lapsed through nonpayment of renewal fees