GB1315167A - Production of hollow bodies of semiconductor material - Google Patents
Production of hollow bodies of semiconductor materialInfo
- Publication number
- GB1315167A GB1315167A GB5236670A GB5236670A GB1315167A GB 1315167 A GB1315167 A GB 1315167A GB 5236670 A GB5236670 A GB 5236670A GB 5236670 A GB5236670 A GB 5236670A GB 1315167 A GB1315167 A GB 1315167A
- Authority
- GB
- United Kingdom
- Prior art keywords
- carrier body
- layer
- semi
- plate
- conductor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000004065 semiconductor Substances 0.000 title abstract 6
- 239000000463 material Substances 0.000 title abstract 5
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 abstract 7
- 229910002804 graphite Inorganic materials 0.000 abstract 4
- 239000010439 graphite Substances 0.000 abstract 4
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 abstract 3
- 229910052799 carbon Inorganic materials 0.000 abstract 3
- 229910052710 silicon Inorganic materials 0.000 abstract 3
- 239000010703 silicon Substances 0.000 abstract 3
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 abstract 2
- 238000000151 deposition Methods 0.000 abstract 2
- 239000003795 chemical substances by application Substances 0.000 abstract 1
- SLLGVCUQYRMELA-UHFFFAOYSA-N chlorosilicon Chemical compound Cl[Si] SLLGVCUQYRMELA-UHFFFAOYSA-N 0.000 abstract 1
- 150000001875 compounds Chemical class 0.000 abstract 1
- 238000001816 cooling Methods 0.000 abstract 1
- 230000008021 deposition Effects 0.000 abstract 1
- 229910052732 germanium Inorganic materials 0.000 abstract 1
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 abstract 1
- 239000011521 glass Substances 0.000 abstract 1
- 239000003779 heat-resistant material Substances 0.000 abstract 1
- 229910052739 hydrogen Inorganic materials 0.000 abstract 1
- 239000001257 hydrogen Substances 0.000 abstract 1
- 229910003465 moissanite Inorganic materials 0.000 abstract 1
- 238000007789 sealing Methods 0.000 abstract 1
- 238000000926 separation method Methods 0.000 abstract 1
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 abstract 1
- 229910010271 silicon carbide Inorganic materials 0.000 abstract 1
- 230000003595 spectral effect Effects 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/01—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes on temporary substrates, e.g. substrates subsequently removed by etching
Landscapes
- Chemical & Material Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Silicon Compounds (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
- Chemical Vapour Deposition (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE19702022025 DE2022025C3 (de) | 1970-05-05 | 1970-05-05 | Vorrichtung zum Herstellen eines Hohlkörpers aus Halbleitermaterial |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| GB1315167A true GB1315167A (en) | 1973-04-26 |
Family
ID=5770320
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| GB5236670A Expired GB1315167A (en) | 1970-05-05 | 1970-11-04 | Production of hollow bodies of semiconductor material |
Country Status (10)
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| BE789719A (fr) * | 1972-05-16 | 1973-02-01 | Siemens Ag | Procede et dispositif de fabrication de corps creux en matiere semi-conductrice, en particulier des tubes en silicium |
| DE2618273C3 (de) * | 1976-04-27 | 1984-04-19 | Wacker-Chemitronic Gesellschaft für Elektronik-Grundstoffe mbH, 8263 Burghausen | Verfahren zur Abscheidung von polykristallinem Silicium |
| JPH0166340U (enrdf_load_stackoverflow) * | 1987-10-21 | 1989-04-27 |
-
1970
- 1970-05-05 DE DE19702022025 patent/DE2022025C3/de not_active Expired
- 1970-10-22 AT AT954370A patent/AT306105B/de not_active IP Right Cessation
- 1970-10-22 SE SE1429670A patent/SE368912B/xx unknown
- 1970-10-23 CH CH1566470A patent/CH561079A5/xx not_active IP Right Cessation
- 1970-10-31 IT IT8966570A patent/IT951574B/it active
- 1970-11-04 GB GB5236670A patent/GB1315167A/en not_active Expired
- 1970-11-04 FR FR7039638A patent/FR2092930B2/fr not_active Expired
- 1970-11-05 CS CS745670A patent/CS163774B2/cs unknown
- 1970-11-30 NL NL7017481A patent/NL7017481A/xx unknown
-
1973
- 1973-03-05 JP JP2593773A patent/JPS4918917B1/ja active Pending
Also Published As
| Publication number | Publication date |
|---|---|
| CS163774B2 (enrdf_load_stackoverflow) | 1975-11-07 |
| DE2022025B2 (de) | 1979-06-28 |
| FR2092930B2 (enrdf_load_stackoverflow) | 1973-02-02 |
| AT306105B (de) | 1973-03-26 |
| DE2022025C3 (de) | 1980-03-20 |
| NL7017481A (enrdf_load_stackoverflow) | 1971-11-09 |
| CH561079A5 (enrdf_load_stackoverflow) | 1975-04-30 |
| JPS4918917B1 (enrdf_load_stackoverflow) | 1974-05-14 |
| DE2022025A1 (de) | 1971-11-18 |
| SE368912B (enrdf_load_stackoverflow) | 1974-07-29 |
| IT951574B (it) | 1973-07-10 |
| FR2092930A2 (enrdf_load_stackoverflow) | 1972-01-28 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PS | Patent sealed | ||
| PLNP | Patent lapsed through nonpayment of renewal fees |