IT951574B - Procedimento per fabbricare corpi cavi di materiali semiconduttore - Google Patents

Procedimento per fabbricare corpi cavi di materiali semiconduttore

Info

Publication number
IT951574B
IT951574B IT8966570A IT8966570A IT951574B IT 951574 B IT951574 B IT 951574B IT 8966570 A IT8966570 A IT 8966570A IT 8966570 A IT8966570 A IT 8966570A IT 951574 B IT951574 B IT 951574B
Authority
IT
Italy
Prior art keywords
procedure
semiconductor materials
hollow bodies
manufacturing hollow
manufacturing
Prior art date
Application number
IT8966570A
Other languages
English (en)
Italian (it)
Original Assignee
Siemens Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Siemens Ag filed Critical Siemens Ag
Application granted granted Critical
Publication of IT951574B publication Critical patent/IT951574B/it

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/01—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes on temporary substrates, e.g. substrates subsequently removed by etching

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Silicon Compounds (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Chemical Vapour Deposition (AREA)
IT8966570A 1970-05-05 1970-10-31 Procedimento per fabbricare corpi cavi di materiali semiconduttore IT951574B (it)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19702022025 DE2022025C3 (de) 1970-05-05 1970-05-05 Vorrichtung zum Herstellen eines Hohlkörpers aus Halbleitermaterial

Publications (1)

Publication Number Publication Date
IT951574B true IT951574B (it) 1973-07-10

Family

ID=5770320

Family Applications (1)

Application Number Title Priority Date Filing Date
IT8966570A IT951574B (it) 1970-05-05 1970-10-31 Procedimento per fabbricare corpi cavi di materiali semiconduttore

Country Status (10)

Country Link
JP (1) JPS4918917B1 (enrdf_load_stackoverflow)
AT (1) AT306105B (enrdf_load_stackoverflow)
CH (1) CH561079A5 (enrdf_load_stackoverflow)
CS (1) CS163774B2 (enrdf_load_stackoverflow)
DE (1) DE2022025C3 (enrdf_load_stackoverflow)
FR (1) FR2092930B2 (enrdf_load_stackoverflow)
GB (1) GB1315167A (enrdf_load_stackoverflow)
IT (1) IT951574B (enrdf_load_stackoverflow)
NL (1) NL7017481A (enrdf_load_stackoverflow)
SE (1) SE368912B (enrdf_load_stackoverflow)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BE789719A (fr) * 1972-05-16 1973-02-01 Siemens Ag Procede et dispositif de fabrication de corps creux en matiere semi-conductrice, en particulier des tubes en silicium
DE2618273C3 (de) * 1976-04-27 1984-04-19 Wacker-Chemitronic Gesellschaft für Elektronik-Grundstoffe mbH, 8263 Burghausen Verfahren zur Abscheidung von polykristallinem Silicium
JPH0166340U (enrdf_load_stackoverflow) * 1987-10-21 1989-04-27

Also Published As

Publication number Publication date
DE2022025A1 (de) 1971-11-18
FR2092930A2 (enrdf_load_stackoverflow) 1972-01-28
NL7017481A (enrdf_load_stackoverflow) 1971-11-09
FR2092930B2 (enrdf_load_stackoverflow) 1973-02-02
DE2022025C3 (de) 1980-03-20
CH561079A5 (enrdf_load_stackoverflow) 1975-04-30
AT306105B (de) 1973-03-26
CS163774B2 (enrdf_load_stackoverflow) 1975-11-07
GB1315167A (en) 1973-04-26
JPS4918917B1 (enrdf_load_stackoverflow) 1974-05-14
DE2022025B2 (de) 1979-06-28
SE368912B (enrdf_load_stackoverflow) 1974-07-29

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