GB1300624A - Charged particle beam apparatus having means to observe a stereo-image of a specimen - Google Patents

Charged particle beam apparatus having means to observe a stereo-image of a specimen

Info

Publication number
GB1300624A
GB1300624A GB1640570A GB1640570A GB1300624A GB 1300624 A GB1300624 A GB 1300624A GB 1640570 A GB1640570 A GB 1640570A GB 1640570 A GB1640570 A GB 1640570A GB 1300624 A GB1300624 A GB 1300624A
Authority
GB
United Kingdom
Prior art keywords
apertures
deflection means
diaphragm
lens
specimen
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB1640570A
Inventor
Hiroshi Okano
Shigeyuki Hosoki
Kazuaki Kamijo
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Publication of GB1300624A publication Critical patent/GB1300624A/en
Expired legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
    • H01J37/147—Arrangements for directing or deflecting the discharge along a desired path
    • H01J37/1478—Beam tilting means, i.e. for stereoscopy or for beam channelling

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)

Abstract

1300624 Electron microscopes HITACHI Ltd 7 April 1970 [9 April 1969] 16405/70 Heading H1D In an electron microscope the angle of incidence of the beam on the target may be varied to enable stereoscopic images to be obtained. In Fig. 5 the beam is focused by a lens 3 on a specimen 6 over until it is scanned by a coil 5, and passes through one of two apertures in a diaphragm 10 according to the position of an adjustable shutter 11; the apertures are on either side of the axis so that the angle of incidence of the beam is different for the two apertures, and if desired a third aperture may be disposed on the axis for use when stereo pictures are not required. In a modification, Fig. 6 (not shown), the beam is divided into two by an electrode (12), the two beams passing respectively to two apertures in a diaphragm and one of the beams being deflected away to an inoperative position by a deflection means (13, 14). This arrangement allows high speed scanning and direct display of the two images in different colours on a colour picture tube. In another arrangement, Fig. 7 (not shown) a magnetic deflection means is provided in the image plane preceding the lens 3 and energized to give two alternate paths for the beam through the lens. In a modification, Fig. 8 (not shown), the deflection means is preceded by a diaphragm and is located after the image plane; in this case the scanning coil 5 must be supplied with a waveform inverse to that supplied to the deflection means to compensate for the displacement of the beam. This waveform may be synchronized with the scanning wave (Fig. 9, not shown) but this is not essential.
GB1640570A 1969-04-09 1970-04-07 Charged particle beam apparatus having means to observe a stereo-image of a specimen Expired GB1300624A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2683869A JPS4912269B1 (en) 1969-04-09 1969-04-09

Publications (1)

Publication Number Publication Date
GB1300624A true GB1300624A (en) 1972-12-20

Family

ID=12204393

Family Applications (1)

Application Number Title Priority Date Filing Date
GB1640570A Expired GB1300624A (en) 1969-04-09 1970-04-07 Charged particle beam apparatus having means to observe a stereo-image of a specimen

Country Status (2)

Country Link
JP (1) JPS4912269B1 (en)
GB (1) GB1300624A (en)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1980002771A1 (en) * 1979-06-04 1980-12-11 Npo Burevestnik Electron-optical system
EP0261866A2 (en) * 1986-09-24 1988-03-30 Nixon, William Charles, Dr. Improvements in and relating to charged particle beam scanning apparatus
GB2221567A (en) * 1988-07-25 1990-02-07 Hitachi Ltd Scanning electron microscope
GB2236015A (en) * 1986-09-24 1991-03-20 Nixon William C Charged particle beam scanning apparatus
EP1045425A2 (en) * 1999-04-15 2000-10-18 ICT Integrated Circuit Testing GmbH Charged particle beam column
EP1045426A3 (en) * 1999-04-15 2002-07-03 ICT Integrated Circuit Testing GmbH Deflection unit in a charged particle beam device

Cited By (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1980002771A1 (en) * 1979-06-04 1980-12-11 Npo Burevestnik Electron-optical system
GB2236015B (en) * 1986-09-24 1991-06-19 Breton Bernard C Improvements in and relating to charged particle beam scanning apparatus
EP0261866A3 (en) * 1986-09-24 1990-05-16 Nixon, William Charles, Dr. Improvements in and relating to charged particle beam scanning apparatus
GB2236015A (en) * 1986-09-24 1991-03-20 Nixon William C Charged particle beam scanning apparatus
EP0261866A2 (en) * 1986-09-24 1988-03-30 Nixon, William Charles, Dr. Improvements in and relating to charged particle beam scanning apparatus
EP0564008A2 (en) * 1986-09-24 1993-10-06 William Charles Nixon Improvements in and relating to charged particle beam scanning apparatus
EP0564008A3 (en) * 1986-09-24 1993-12-29 Nixon William C Improvements in and relating to charged particle beam scanning apparatus
GB2221567A (en) * 1988-07-25 1990-02-07 Hitachi Ltd Scanning electron microscope
US4983832A (en) * 1988-07-25 1991-01-08 Hitachi, Ltd. Scanning electron microscope
GB2221567B (en) * 1988-07-25 1992-11-11 Hitachi Ltd Scanning electron microscope
EP1045425A2 (en) * 1999-04-15 2000-10-18 ICT Integrated Circuit Testing GmbH Charged particle beam column
EP1045426A3 (en) * 1999-04-15 2002-07-03 ICT Integrated Circuit Testing GmbH Deflection unit in a charged particle beam device
EP1045425A3 (en) * 1999-04-15 2003-03-05 ICT Integrated Circuit Testing GmbH Charged particle beam column with chromatic aberration compensation
US6614026B1 (en) 1999-04-15 2003-09-02 Applied Materials, Inc. Charged particle beam column

Also Published As

Publication number Publication date
JPS4912269B1 (en) 1974-03-23

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Legal Events

Date Code Title Description
PS Patent sealed
PCNP Patent ceased through non-payment of renewal fee