GB1300235A - Preparation and purification of semiconducting gallium compounds - Google Patents
Preparation and purification of semiconducting gallium compoundsInfo
- Publication number
- GB1300235A GB1300235A GB63481/69A GB6348169A GB1300235A GB 1300235 A GB1300235 A GB 1300235A GB 63481/69 A GB63481/69 A GB 63481/69A GB 6348169 A GB6348169 A GB 6348169A GB 1300235 A GB1300235 A GB 1300235A
- Authority
- GB
- United Kingdom
- Prior art keywords
- silicon
- melt
- silica
- reaction
- additive
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B11/00—Single-crystal growth by normal freezing or freezing under temperature gradient, e.g. Bridgman-Stockbarger method
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
- C30B29/10—Inorganic compounds or compositions
- C30B29/40—AIIIBV compounds wherein A is B, Al, Ga, In or Tl and B is N, P, As, Sb or Bi
- C30B29/42—Gallium arsenide
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Crystallography & Structural Chemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
Abstract
1300235 Semi-conducting gallium compounds SUMITOMO ELECTRIC INDUSTRIES Ltd 31 Dec 1969 63481/69 Heading C1A Semi-conducting compounds of gallium such as GaAs, GaP, (Ga, In)As, (Ga, Al)As, Ga(As, P) or (Ga, In)P are obtained in the form of crystals having a low or controlled silicon content by forming a melt containing the constituents of the required compound in a reaction vessel (usually made of silica) which is enclosed in a silica tube, in the presence of a first additive selected from Si, Al, B and compounds of these, other than oxides, and a second additive which reacts with the melt to form a gallous oxide atmosphere and is selected from O 2 , CO 2 , and metal oxides which decompose under the reaction conditions, such as Ga 2 O 3 , As 2 O 3 or AS 2 O 5 , and forming the crystals from the melt. The Ga 2 O oxide atmosphere reacts with the first additive (and any other silicon initially present in the melt) to form an oxide film which protects the melt from contamination by reaction with silica in the reaction vessel and/or tube, even if the Ga 2 O pressure subsequently drops, e.g. due to reaction with Ga or As. If the first additive is silicon or a silicon compound, products having a controlled level of silicon contamination may be produced by selecting the quantities of the two additives so that not enough Ga 2 O is produced to remove all the silicon. Other dopants may also be added to the melt, Sn, Te and Cr being exemplified. In Examples 1 to 6 GaAs is prepared by the "horizontal Bridgeman" technique in the presence of As 2 O 3 and silicon. Fig. 3 shows apparatus which may be used and the temperature profile of the furnace. The silica reaction tube, 9, contains arsenic, 13, at one end while the other, hotter, end contains gallium and silicon in a silica vessel, 14, and some As 2 O 3 . The narrowness of the connecting tube, 11, prevents the Ga 2 O which is formed in the hot zone from diffusing to the cooler zone and condensing. The vessel, 14, also contains a seed crystal of GaAs, 15, on to which the product crystallizes as the furnace is moved slowly to the left. The method of the invention may also be used to purify pre-formed gallium compounds by melting them in the presence of the two additives and re-crystallization: the "zone refining" and "zone levelling" techniques may also be used.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB63481/69A GB1300235A (en) | 1969-12-31 | 1969-12-31 | Preparation and purification of semiconducting gallium compounds |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB63481/69A GB1300235A (en) | 1969-12-31 | 1969-12-31 | Preparation and purification of semiconducting gallium compounds |
Publications (1)
Publication Number | Publication Date |
---|---|
GB1300235A true GB1300235A (en) | 1972-12-20 |
Family
ID=10489061
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB63481/69A Expired GB1300235A (en) | 1969-12-31 | 1969-12-31 | Preparation and purification of semiconducting gallium compounds |
Country Status (1)
Country | Link |
---|---|
GB (1) | GB1300235A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE3234387A1 (en) * | 1981-09-18 | 1983-07-28 | Sumitomo Electric Industries, Ltd., Osaka | METHOD FOR DOPING A GAAS SINGLE CRYSTAL WITH BOR |
DE3815575A1 (en) * | 1987-05-08 | 1988-12-15 | Furukawa Electric Co Ltd | SEMI-INSULATING GAAS SINGLE CRYSTAL WITH CONTROLLED CONCENTRATION OF IMPURITIES AND METHOD FOR THE PRODUCTION THEREOF |
-
1969
- 1969-12-31 GB GB63481/69A patent/GB1300235A/en not_active Expired
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE3234387A1 (en) * | 1981-09-18 | 1983-07-28 | Sumitomo Electric Industries, Ltd., Osaka | METHOD FOR DOPING A GAAS SINGLE CRYSTAL WITH BOR |
DE3815575A1 (en) * | 1987-05-08 | 1988-12-15 | Furukawa Electric Co Ltd | SEMI-INSULATING GAAS SINGLE CRYSTAL WITH CONTROLLED CONCENTRATION OF IMPURITIES AND METHOD FOR THE PRODUCTION THEREOF |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PS | Patent sealed | ||
PE20 | Patent expired after termination of 20 years |