GB1292138A - Method and apparatus for producing thin electrically insulating films by means of ion sputtering - Google Patents

Method and apparatus for producing thin electrically insulating films by means of ion sputtering

Info

Publication number
GB1292138A
GB1292138A GB55038/69A GB5503869A GB1292138A GB 1292138 A GB1292138 A GB 1292138A GB 55038/69 A GB55038/69 A GB 55038/69A GB 5503869 A GB5503869 A GB 5503869A GB 1292138 A GB1292138 A GB 1292138A
Authority
GB
United Kingdom
Prior art keywords
electrically insulating
insulating films
ion sputtering
producing thin
thin electrically
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB55038/69A
Inventor
Otto Fiedler
Christian Weissmantel
Gunter Reisse
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Elektromat VEB
Original Assignee
Elektromat VEB
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority to FR6930468A priority Critical patent/FR2063255A5/fr
Application filed by Elektromat VEB filed Critical Elektromat VEB
Priority to GB55038/69A priority patent/GB1292138A/en
Publication of GB1292138A publication Critical patent/GB1292138A/en
Expired legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/305—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching
    • H01J37/3053—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching for evaporating or etching
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

1292138 Sputtering apparatus ELEKTROMAT VEB 11 Nov 1969 55038/69 Heading C7F In a R. F. sputtering apparatus an electronbeam source 2 is arranged adjacent to the insulating target material b to neutralize the positive charge caused by the ion beam 7. The target support and the electron-beam source may be cooled.
GB55038/69A 1968-11-22 1969-11-11 Method and apparatus for producing thin electrically insulating films by means of ion sputtering Expired GB1292138A (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
FR6930468A FR2063255A5 (en) 1968-11-22 1969-09-08
GB55038/69A GB1292138A (en) 1968-11-22 1969-11-11 Method and apparatus for producing thin electrically insulating films by means of ion sputtering

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DD13616168 1968-11-22
FR6930468A FR2063255A5 (en) 1968-11-22 1969-09-08
GB55038/69A GB1292138A (en) 1968-11-22 1969-11-11 Method and apparatus for producing thin electrically insulating films by means of ion sputtering

Publications (1)

Publication Number Publication Date
GB1292138A true GB1292138A (en) 1972-10-11

Family

ID=33457895

Family Applications (1)

Application Number Title Priority Date Filing Date
GB55038/69A Expired GB1292138A (en) 1968-11-22 1969-11-11 Method and apparatus for producing thin electrically insulating films by means of ion sputtering

Country Status (2)

Country Link
FR (1) FR2063255A5 (en)
GB (1) GB1292138A (en)

Also Published As

Publication number Publication date
FR2063255A5 (en) 1971-07-09

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Legal Events

Date Code Title Description
PS Patent sealed [section 19, patents act 1949]
PLNP Patent lapsed through nonpayment of renewal fees