GB1291441A - Methods of coating substrates with photoresists - Google Patents

Methods of coating substrates with photoresists

Info

Publication number
GB1291441A
GB1291441A GB4862569A GB4862569A GB1291441A GB 1291441 A GB1291441 A GB 1291441A GB 4862569 A GB4862569 A GB 4862569A GB 4862569 A GB4862569 A GB 4862569A GB 1291441 A GB1291441 A GB 1291441A
Authority
GB
United Kingdom
Prior art keywords
compound
oct
solvent
mixture
electron beam
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB4862569A
Inventor
Barret Broyde
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
AT&T Corp
Original Assignee
Western Electric Co Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Western Electric Co Inc filed Critical Western Electric Co Inc
Publication of GB1291441A publication Critical patent/GB1291441A/en
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F1/00—Etching metallic material by chemical means
    • C23F1/02—Local etching
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Inorganic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Materials For Photolithography (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)

Abstract

1291441 Electron beam irradiation apparatus WESTERN ELECTRIC CO Inc 3 Oct 1969 [3 Oct 1968] 48625/69 Heading H1D In a photo-resist process for coating a pattern on a substrate using an electron beam as the hardening radiation, the sensitivity of the photoresist material to electron bombardment is improved by adding to it an organometallic compound or a compound which readily dissociates into free radicals, the metal being from Groups III to V of atomic number greater than 30, the compound amounting to up to 5% and preferably 0À1 to 2% by weight of the photoresist solution; suitable materials on dibutyltin maleate, hexaphenyldilead, tetracyclohexyltin, triphenylbismuth, triphenylstilbene, triphenylarsine, cyclopentadienylthallium, and divinyldibutyltin. The latter may comprise benzil, benzophenone, or 1,4-diphenyl-1,3-butadiene forming preferably about 1% and not more than 5% of the solution. The photoresist material may be a polyvinyl cinnamate in a solvent comprising a mixture of chlorobenzene and cyclohexone, or alternatively a polymerized isoprene dimer in a solvent comprising a mixture of ethylbenzene, mixed xylenes and methylcellosolve.
GB4862569A 1968-10-03 1969-10-03 Methods of coating substrates with photoresists Expired GB1291441A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US76486668A 1968-10-03 1968-10-03
US76486768A 1968-10-03 1968-10-03

Publications (1)

Publication Number Publication Date
GB1291441A true GB1291441A (en) 1972-10-04

Family

ID=27117530

Family Applications (1)

Application Number Title Priority Date Filing Date
GB4862569A Expired GB1291441A (en) 1968-10-03 1969-10-03 Methods of coating substrates with photoresists

Country Status (5)

Country Link
BE (1) BE739834A (en)
DE (1) DE1949502C3 (en)
GB (1) GB1291441A (en)
NL (1) NL6915006A (en)
SE (1) SE361366B (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2459156A1 (en) * 1974-04-22 1975-11-06 Ibm METHOD OF MANUFACTURING A PHOTO LACQUER MASK ON A SEMICONDUCTOR SUBSTRATE
EP3177966B1 (en) * 2014-08-06 2019-03-13 The University of Manchester Electron beam resist composition
US11143961B1 (en) * 2015-09-30 2021-10-12 The University Of Manchester Resist composition
CN113568271A (en) * 2020-07-02 2021-10-29 台湾积体电路制造股份有限公司 Method of manufacturing semiconductor device and pattern forming method

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2459156A1 (en) * 1974-04-22 1975-11-06 Ibm METHOD OF MANUFACTURING A PHOTO LACQUER MASK ON A SEMICONDUCTOR SUBSTRATE
EP3177966B1 (en) * 2014-08-06 2019-03-13 The University of Manchester Electron beam resist composition
US10234764B2 (en) 2014-08-06 2019-03-19 The University Of Manchester Electron beam resist composition
EP3561596A1 (en) * 2014-08-06 2019-10-30 The University Of Manchester Antiscattering resist composition and method for performing lithography
US10613441B2 (en) 2014-08-06 2020-04-07 The University Of Manchester Electron beam resist composition
US11143961B1 (en) * 2015-09-30 2021-10-12 The University Of Manchester Resist composition
CN113568271A (en) * 2020-07-02 2021-10-29 台湾积体电路制造股份有限公司 Method of manufacturing semiconductor device and pattern forming method

Also Published As

Publication number Publication date
DE1949502B2 (en) 1974-05-30
SE361366B (en) 1973-10-29
BE739834A (en) 1970-03-16
NL6915006A (en) 1970-04-07
DE1949502C3 (en) 1975-01-16
DE1949502A1 (en) 1970-04-09

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Legal Events

Date Code Title Description
PS Patent sealed
PLNP Patent lapsed through nonpayment of renewal fees